An anti-exposure device for uniformity sheet inspection

Abstract

The utility model provides a kind of anti-exposure equipment for uniform glue piece inspection, including projection light source, optical filter component, first lens group, second lens group and object table. Object table is used to place the uniform glue piece to be measured, the projection light of projection light source obtains filter light after the light of set wave band range is absorbed by optical filter component, filter light is as incident light by first lens group and is incident to the uniform glue piece to be measured of object table, the reflected light of uniform glue piece to be measured passes through first lens group again and enters second lens group, will not cause local exposure operation to uniform glue piece in the process of inspecting uniform glue piece, and then solve the problem that local exposure occurs in the process of inspecting uniform glue piece and affects subsequent exposure, development, etching and other operations in grating master process, to solve the problem that local exposure occurs in the process of inspecting uniform glue piece and affects the transfer operation of diffractive optical waveguide using grating master.

Description

Technical Field

[0001] This invention belongs to the field of diffractive waveguide fabrication technology, specifically relating to an anti-exposure device for spin film inspection. Background Technology

[0002] With the development of information technology, augmented reality (AR) technology has become increasingly mature and is being applied more and more widely in education, healthcare, entertainment, industry and other sectors.

[0003] Augmented reality (AR) technology can be implemented through many hardware platforms, among which wearable AR devices, namely AR glasses, offer the most immersive experience. Currently, mature AR glasses technologies mainly fall into four categories: prism, birdbath, freeform surface, off-axis holographic lens, and diffractive waveguide. Among these, the diffractive waveguide solution has become the mainstream technology for AR glasses due to its thinness and mass production feasibility.

[0004] The existing methods for fabricating diffractive waveguides are generally as follows:

[0005] 1. Prepare the grating master.

[0006] Specifically,

[0007] A grating mask is prepared on a master substrate: a layer of photoresist of a certain thickness is spin-coated onto the surface of the master substrate to obtain a master substrate (i.e., a spin-coated film) with a photoresist mask; the master substrate with the photoresist mask is exposed, and the photoresist mask on the master substrate is modulated by the periodic bright and dark stripes of the exposure light field, which changes the properties of the photoresist mask, thus obtaining a photoresist mask with altered properties on the master substrate; the photoresist mask with altered properties on the master substrate is developed to obtain a grating mask on the master substrate.

[0008] The grating is fabricated on the master substrate using a grating mask: the grating structure (i.e., the master grating) is etched on the area of ​​the master substrate not covered by the grating mask using an ion beam etching machine, thereby preparing the grating master.

[0009] 2. The grating structure of the grating master is transferred to the soft film substrate using a nanoimprinting process to obtain a soft film with an inverse grating structure.

[0010] Specifically, an imprinting adhesive is uniformly spin-coated onto the grating master plate, and a soft film substrate is bonded to the grating master plate. Pressure is applied to fill the grating structure of the grating master plate with the imprinting adhesive, resulting in an inverse structure of the grating structure on the imprinting adhesive. The grating structure is then cured and demolded using ultraviolet light, and the imprinting adhesive with the inverse structure of the grating structure is transferred to the soft film substrate to obtain a soft film with the inverse structure of the grating structure.

[0011] 3. The inverse structure of the grating structure on the soft film is transferred onto the optical wafer using a nanoimprinting process to obtain an optical wafer with a grating structure.

[0012] Specifically, a mold adhesive is spin-coated onto an optical wafer, and a soft film with an inverse grating structure is bonded to the mold adhesive on the optical wafer. Pressure is applied to fill the inverse grating structure of the soft film with the mold adhesive, thus obtaining a grating structure on the mold adhesive. Ultraviolet light is used for curing and demolding to separate the soft film with the inverse grating structure from the mold adhesive with the grating structure, resulting in an optical wafer with a grating structure.

[0013] 4. The optical wafer is laser-cut according to the required shape, and then the cut optical wafers are stacked and edge-sealed to obtain the diffractive waveguide product.

[0014] In the aforementioned grating master fabrication process, the spin coat needs to be inspected for appearance indicators such as dirt, bubbles, point defects, line defects, color difference, and adhesive thickness. Existing inspection equipment can cause localized exposure of the spin coat during inspection, which can affect subsequent exposure, development, and etching operations during grating master fabrication, thus impacting the fabrication process of nanoimprint diffraction waveguides using the grating master. Utility Model Content

[0015] In order to overcome the shortcomings of the prior art, this utility model provides an anti-exposure device for film spinneret inspection.

[0016] This utility model is achieved through the following technical solution:

[0017] This utility model provides an anti-exposure device for film washing inspection, including a projection light source, a filter component, a first lens group, a second lens group, and a stage;

[0018] The stage is used to place the uniform film to be tested.

[0019] The filter component absorbs light within a set wavelength range;

[0020] The projected light from the projection light source is filtered by the light filtering component. The filtered light is incident on the uniform film to be tested on the stage through the first lens group. The reflected light from the uniform film to be tested passes through the first lens group again and enters the second lens group.

[0021] Furthermore, the wavelength range of the projected light from the projection light source matches the wavelength range of visible light.

[0022] Furthermore, the filtering component is a filter.

[0023] Furthermore, the first lens group employs an objective lens.

[0024] Furthermore, the second lens group is an eyepiece.

[0025] Furthermore, the wavelength range of light absorbed by the filter component is the visible light band with a wavelength within 600nm.

[0026] Compared with the prior art, the technical solution of this utility model has the following beneficial effects:

[0027] This invention provides an anti-exposure device for spin coat inspection, comprising a projection light source, a filter component, a first lens group, a second lens group, and a stage. The stage is used to place the spin coat to be tested, and the filter component is used. The projected light from the projection light source is filtered after the filter component absorbs light within a set wavelength range. This filtered light passes through the first lens group as incident light onto the spin coat on the stage. The reflected light from the spin coat passes through the first lens group again and enters the second lens group. This prevents localized exposure of the spin coat during inspection, thus solving the problem of localized exposure affecting subsequent exposure, development, and etching operations in the grating master process. This also solves the problem of localized exposure affecting the transfer of diffractive waveguides using the grating master. Attached Figure Description

[0028] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0029] Figure 1 A schematic diagram of the overall structure of the anti-exposure device for film spinner inspection provided by this utility model;

[0030] Figure 2 A partially enlarged schematic diagram of the filter component installed on the second support rod;

[0031] Figure 3 This is a schematic diagram of the optical path transmission during the testing process of the anti-exposure device for spinner inspection provided by this utility model.

[0032] Among them, 1-base, 2-1-first support rod, 2-2-second support rod, 3-moving component, 4-projection light source, 5-filter component, 6-first lens group, 7-second lens group, 8-stage, 9-first through hole, 10-second through hole, 11-third through hole. Detailed Implementation

[0033] The technical solution of this utility model will be clearly and completely described below with reference to its embodiments. Obviously, the described embodiments are only some embodiments of this utility model, and not all embodiments. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of this utility model.

[0034] In this document, the terms "first," "second," and other similar words are not intended to imply any order, quantity, or importance, but are merely used to distinguish different elements. The terms "one," "a," and other similar words are not intended to indicate the existence of only one of the stated things, but rather that the description refers only to one of the stated things, which may have one or more. The terms "comprising," "including," and other similar words are intended to indicate a logical relationship, not a spatial relationship. For example, "A includes B" means that logically B belongs to A, not that spatially B is located inside A. Furthermore, the meanings of the terms "comprising," "including," and other similar words should be considered open-ended, not closed. For example, "A includes B" means that B belongs to A, but B does not necessarily constitute all of A; A may also include other elements such as C, D, and E.

[0035] In this document, the terms "embodiment," "this embodiment," "preferred embodiment," and "one embodiment" do not imply that the description applies only to one specific embodiment, but rather that such description may also be applicable to one or more other embodiments. Those skilled in the art will understand that any description made herein relating to one embodiment can be substituted, combined, or otherwise incorporated with the descriptions in one or more other embodiments. Such substitutions, combinations, or other incorporations resulting in new embodiments are readily conceived by those skilled in the art and fall within the protection scope of this utility model.

[0036] In the context of this article, “multiple” means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0037] like Figure 1 As shown, this utility model provides an anti-exposure device for film spinning inspection, including a base 1, a support frame, a moving component 3, a projection light source 4, a filter component 5, a first lens group 6, a second lens group 7, and a stage 8.

[0038] A movable component 3 is installed inside the top surface of the base 1, and a stage 8 is installed at the top of the movable component 3. The movable component 3 can drive the stage 8 to move laterally and longitudinally. The stage 8 is used to place the uniform film to be tested. Existing components can be used for the movable component.

[0039] A support frame is provided on the top edge of the base 1. The support frame includes, for example, a first support rod 2-1 and a second support rod 2-2. One end of the first support rod 2-1 is connected to one end of the second support rod 2-2, and the first support rod 2-1 and the second support rod 2-2 are perpendicular to each other. The other end of the first support rod 2-1 is connected to the top edge of the base 1, and the other end of the second support rod 2-2 is connected to the light receiving end of the first lens group 6. The first light emitting end of the first lens group 6 faces the stage 8, and the second light emitting end of the first lens group 6 is connected to the light receiving end of the second lens group 7.

[0040] The filter element 5 is disposed between the projection light source 4 and the first lens group 6. For example, Figure 2 As shown, the second support rod 2-2 has a first through hole 9 extending through its body in a direction perpendicular to the first support rod. The end of the first through hole 9 furthest from the first lens group is the light receiving end and is connected to the light emitting end of the projection light source. The end of the first through hole closer to the first lens group is the light emitting end and is connected to the light receiving end of the first lens group. A second through hole 10 is formed on the top wall of the first through hole 9, and a third through hole 11 is formed on the bottom wall of the first through hole 9. The third through hole 11 and the second through hole 10 are in the same vertical line direction. The filter component 5 is secured inside the second support rod through the second through hole 10 and the third through hole 11.

[0041] like Figure 3 As shown, the projected light from the projection light source is filtered by a light-filtering component to obtain filtered light. The filtered light enters the light-receiving end of the first lens group and then passes through the first light-emitting end of the first lens group as incident light onto the uniform film to be tested on the stage. The reflected light from the uniform film to be tested passes through the second light-emitting end of the first lens group and enters the light-receiving end of the second lens group. The human eye can inspect the uniform film to be tested for appearance indicators such as dirt, bubbles, point defects, line defects, color difference, and film thickness through the light-emitting end of the second lens group.

[0042] The wavelength range of the projected light from the projection light source matches the wavelength range of visible light. The filter component absorbs light within a set wavelength range, specifically the visible light band with wavelengths within 600nm. When the filter component absorbs light within the visible light band with wavelengths within 600nm, the filtered light obtained after the projected light from the projection light source passes through the filter component and is incident on the test uniform film on the stage via the first light-emitting end of the first lens group. This prevents localized exposure of the test uniform film, thus solving the problem of localized exposure affecting subsequent exposure, development, and etching operations in the grating master process, and consequently resolving the issue of localized exposure affecting the transfer of diffractive waveguides using the grating master.

[0043] For example, the above-mentioned filtering component can be an existing filter.

[0044] For example, the first lens group described above may be an existing objective lens, and the second lens group described above may be an existing eyepiece.

[0045] The above embodiments are only used to illustrate the technical solution of this utility model and are not intended to limit it. Although the utility model has been described in detail with reference to the above embodiments, those skilled in the art can still make modifications or equivalent substitutions to the specific implementation of this utility model. Any modifications or equivalent substitutions that do not depart from the spirit and scope of this utility model are within the protection scope of the claims of this utility model pending approval.

Claims

1. An anti-exposure device for inspecting film spinnerets, characterized in that, It includes a projection light source, a filter component, a first lens group, a second lens group, and a stage; The stage is used to place the uniform film to be tested. The filter component absorbs light within a set wavelength range; The projected light from the projection light source is filtered by the light filtering component. The filtered light is incident on the uniform film to be tested on the stage through the first lens group. The reflected light from the uniform film to be tested passes through the first lens group again and enters the second lens group.

2. The anti-exposure device for film spinneret inspection according to claim 1, characterized in that, The wavelength range of the projected light from the projection light source matches the wavelength range of visible light.

3. The anti-exposure device for film spinner inspection according to claim 1, characterized in that, The filtering component is a filter.

4. The anti-exposure device for film spinner inspection according to claim 1, characterized in that, The first lens group is an objective lens.

5. The anti-exposure device for film spinner inspection according to claim 1, characterized in that, The second lens group is an eyepiece.

6. The anti-exposure device for film spinner inspection according to claim 1, characterized in that, The light-absorbing component absorbs light in the visible light band with a wavelength within 600nm.

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