Adsorption platform for LDI photoetching machine

Abstract

The utility model provides a kind of adsorption platform for LDI photoetching machine, belong to PCB board production equipment field, including adsorption subassembly and adjusting assembly;Adsorption subassembly includes adsorption support frame;The utility model: four around installation of base surface has supporting leg, when the servo motor cylinder of supporting leg surface installation is promoted lift platform, lift platform is slid along the slider of supporting leg inboard by the slide rail of side plate surface installation, so that lift platform is stably lifted relative to base, to realize lifting adjustment by lift platform driving adsorption support frame, adsorption support frame lifting drives the PCB board of surface adsorption to carry out the adjustment of distance relative to photoetching machine, satisfy the photoetching processing of PCB board of different thickness size, servo motor cylinder has accurate control adjustment, realizes lifting displacement control under the cooperation of displacement sensor installed in the middle of one end of lift platform, so that reduce adjustment error.

Description

Technical Field

[0001] This utility model relates to the field of PCB board production equipment, specifically an adsorption platform for an LDI lithography machine. Background Technology

[0002] LDI (Liquid Crystal Laser Distributed) is a key technology in PCB manufacturing that replaces traditional film contact exposure. It uses a computer-controlled ultraviolet laser beam to directly image the substrate coated with photoresist. During the production of thin / small PCBs using the ink and patterning processes of the inner and outer layers, the wet and dry processing steps in the preceding stages cause varying degrees of expansion, contraction, and strain in the PCB, resulting in warping, twisting, and buckling. Simultaneously, if the PCB is too small to cover the entire exposure stage, the vacuum suction force will be insufficient, causing the edges of the PCB to curl up. This warping leads to inconsistent exposure focal planes, ultimately resulting in poor PCB exposure. Defects and flaws affect product quality. One application, CN202022800529.5, describes an adsorption platform for PCB boards used in lithography machines. In this platform, the diameter of the eccentric hole on the side of the pressure bar is larger than that on the other side, effectively increasing the force-bearing area of ​​the PCB board and enhancing the adsorption force of the adsorption panel. After the PCB board is placed on the adsorption panel, the pressure bar drive module drives the pressure bar assembly to press the PCB board onto the adsorption panel. The pressure bar assembly presses the edges, effectively preventing PCB board edge warping and resulting in poor exposure, thus improving product yield. However, this device still requires improvement during use: it lacks a height adjustment structure. When the PCB board is too close to the lithography machine, over-focusing leads to "pattern distortion"; when too far, under-focusing leads to "pattern blurring." Therefore, adjusting the distance between the PCB board and the lithography machine according to the PCB board thickness can ensure high quality and efficiency in LDI lithography. Utility Model Content

[0003] The purpose of this invention is to provide an adsorption platform for LDI lithography machines to solve the problems mentioned in the background art.

[0004] To achieve the above objectives, this utility model provides the following technical solution: an adsorption platform for an LDI lithography machine, comprising an adsorption component and an adjustment component; The adsorption component includes an adsorption support frame, the interior of which has several crisscrossing airflow channels, the surface of which has several connecting holes that communicate with the airflow channels, the surface of which has several protrusions connected around the connecting holes, the interior of which has a suction plate installed on the surface of the protrusions, the surface of which has several suction holes, and the bottom two sides of which are connected to a vacuum suction mechanism. The adjustment assembly includes a base located at the bottom of the adsorption support frame, with legs installed around the surface of the base and sliders fixedly installed inside the legs. A lifting platform is installed at the bottom of the adsorption support frame, with side plates installed at both ends of the bottom of the lifting platform. Slide rails are fixedly installed on both sides of the surface of the side plates and are slidably installed inside the sliders. Servo electric cylinders are installed on the surface of the legs, and the extension and retraction ends of the servo electric cylinders are connected to both ends of the bottom of the lifting platform.

[0005] As a preferred embodiment of the present invention: the vacuum suction mechanism includes vacuum covers installed on both sides of the bottom of the adsorption support frame, the bottom of the adsorption support frame is provided with a guide hole communicating with the airflow channel, the vacuum cover is covered on the surface of the guide hole, a vacuum generator is installed at the bottom of the vacuum cover, and a positive pressure valve is also provided on one side of the bottom of the vacuum cover.

[0006] As a preferred embodiment of this utility model: the bottom of the base is provided with a linear module, the base is installed on the top of the linear module, limit blocks are installed on both sides of the bottom of the base, and guide rails are provided on both sides of the bottom of the base, and the limit blocks slide on the surface of the guide rails.

[0007] As a preferred embodiment of this utility model, a displacement sensor is also installed at the middle of one end of the lifting platform.

[0008] As a preferred embodiment of this utility model, a scale is fixedly installed on both adjacent sides of the top of the adsorption support frame.

[0009] As a preferred embodiment of this utility model: a protective bracket is fixedly installed on one side of the adsorption support frame, and a level is installed in the hollow part of the middle of the protective bracket.

[0010] Compared with the prior art, the beneficial effects of this utility model are: (1) Support legs are installed around the surface of the base. When the servo electric cylinder installed on the surface of the support legs pushes the lifting platform, the lifting platform slides along the slider on the inner side of the support legs through the slide rail installed on the side plate, so that the lifting platform is stably raised and lowered relative to the base. Thus, the lifting platform drives the adsorption support frame to achieve lifting adjustment. The lifting and lowering of the adsorption support frame drives the PCB board adsorbed on the surface to adjust the distance relative to the photolithography machine, so as to meet the photolithography processing of PCB boards of different thicknesses and sizes. The servo electric cylinder has precise control adjustment. With the cooperation of the displacement sensor installed in the middle of one end of the lifting platform, the lifting displacement control is realized, so as to reduce the adjustment error. (2) The adsorption support frame has crisscrossing airflow channels inside. The adsorption support frame has connecting holes on its surface that connect with the airflow channels. The adsorption support frame has protrusions around the connecting holes on its surface. The suction plate is installed on the surface of the protrusions and connects with the airflow channels through the suction holes on the surface. When the vacuum suction mechanism on both sides of the bottom of the adsorption support frame is working, a vacuum environment is formed inside the adsorption support frame, which makes it easy to suction and fix the PCB board placed on the surface of the suction plate. Attached Figure Description

[0011] Figure 1 This is a schematic diagram of the overall structure of this utility model; Figure 2 This is a schematic diagram of the adsorption component structure of this utility model; Figure 3 This is a schematic diagram of the adjustment component structure of this utility model; Figure 4 This is a schematic diagram of the installation structure of the linear module of this utility model.

[0012] In the diagram: 1. Adsorption component; 101. Adsorption support frame; 102. Airflow channel; 103. Connecting hole; 104. Protrusion; 105. Suction plate; 106. Suction hole; 107. Vacuum suction mechanism; 1071. Vacuum hood; 1072. Guide hole; 1073. Vacuum generator; 1074. Positive pressure valve; 2. Adjustment component; 21. Base; 22. Support leg; 23. Slider; 24. Lifting platform; 25. Side plate; 26. Guide rail; 27. Servo electric cylinder; 3. Linear module; 4. Limit block; 5. Guide rail; 6. Displacement sensor; 7. Scale; 8. Protective bracket; 9. Level. Detailed Implementation

[0013] To make the objectives, technical solutions, and advantages of the embodiments of this utility model clearer, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this utility model, not all embodiments. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this utility model.

[0014] Please see Figures 1-4 An adsorption platform for an LDI lithography machine includes: an adsorption component 1 and an adjustment component 2; Please see Figure 1 , Figure 2 The adsorption component 1 includes an adsorption support frame 101. The adsorption support frame 101 has several crisscrossing airflow channels 102 inside. The surface of the adsorption support frame 101 has several connecting holes 103, which are connected to the airflow channels 102. The surface of the adsorption support frame 101 is connected to several protrusions 104 around the connecting holes 103. The adsorption support frame 101 is equipped with a suction plate 105 on the surface of the protrusions 104 inside the adsorption support frame 101. The surface of the suction plate 105 has several suction holes 106. Vacuum suction mechanisms 107 are connected to the bottom two sides of the adsorption support frame 101.

[0015] In practical use: The adsorption support frame 101 has crisscrossing airflow channels 102 inside, and the surface of the adsorption support frame 101 has connecting holes 103 that communicate with the airflow channels 102. The surface of the adsorption support frame 101 has protrusions 104 around the connecting holes 103. The suction plate 105 is installed on the surface of the protrusions 104 and communicates with the airflow channels 102 through the suction holes 106 on the surface. When the vacuum suction mechanism 107 on both sides of the bottom of the adsorption support frame 101 is working, a vacuum environment is formed inside the adsorption support frame 101, which makes it easy to suction and fix the PCB board placed on the surface of the suction plate 105.

[0016] Please see Figure 3 The adjustment component 2 includes a base 21 located at the bottom of the adsorption support frame 101. Support legs 22 are installed around the surface of the base 21. A slider 23 is fixedly installed inside the support legs 22. A lifting platform 24 is installed at the bottom of the adsorption support frame 101. Side plates 25 are installed at both ends of the bottom of the lifting platform 24. Slide rails 26 are fixedly installed on both sides of the surface of the side plates 25. The slide rails 26 are slidably installed inside the slider 23. A servo electric cylinder 27 is installed on the surface of the support legs 22. The telescopic ends of the servo electric cylinder 27 are connected to both ends of the bottom of the lifting platform 24. A displacement sensor 6 is also installed in the middle of one end of the lifting platform 24.

[0017] In practical use: Support legs 22 are installed around the surface of the base 21. When the servo electric cylinder 27 installed on the surface of the support legs 22 pushes the lifting platform 24, the lifting platform 24 slides along the slider 23 on the inner side of the support legs 22 via the slide rail 26 installed on the surface of the side plate 25, so that the lifting platform 24 is stably raised and lowered relative to the base 21. Thus, the lifting platform 24 drives the adsorption support frame 101 to achieve lifting and adjustment. The lifting and lowering of the adsorption support frame 101 drives the PCB board adsorbed on the surface to adjust the distance relative to the photolithography machine, which meets the photolithography processing of PCB boards of different thicknesses and sizes. The servo electric cylinder 27 has precise control and adjustment. With the cooperation of the displacement sensor 6 installed in the middle of one end of the lifting platform 24, the lifting displacement control is realized, thereby reducing adjustment errors.

[0018] Please see Figure 2 The vacuum suction mechanism 107 includes a vacuum cover 1071 installed on both sides of the bottom of the adsorption support frame 101. The bottom of the adsorption support frame 101 is provided with a guide hole 1072 communicating with the airflow channel 102. The vacuum cover 1071 covers the surface of the guide hole 1072. A vacuum generator 1073 is installed at the bottom of the vacuum cover 1071. A positive pressure valve 1074 is also provided on one side of the bottom of the vacuum cover 1071.

[0019] In practical use: Vacuum covers 1071 are installed on both sides of the bottom of the adsorption support frame 101. The vacuum covers 1071 cover the surface of the guide hole 1072 at the bottom of the adsorption support frame 101, which is connected to the airflow channel 102. When the vacuum generator 1073 is working, the airflow channel 102 is evacuated through the guide hole 1072, so as to generate an adsorption force on the surface of the suction plate 105. When the photolithography structure is completed, the positive pressure valve 1074 is opened to allow the external airflow to enter the airflow channel 102, so that the surface of the suction plate 105 does not have an adsorption force, making it easy to remove the photolithographically completed PCB board.

[0020] Please see Figure 4 The bottom of the base 21 is provided with a linear module 3, the base 21 is installed on the top of the linear module 3, the bottom sides of the base 21 are provided with limit blocks 4, the bottom sides of the base 21 are provided with guide rails 5, and the limit blocks 4 slide on the surface of the guide rails 5.

[0021] In practical use: A linear module 3 is installed at the bottom of the base 21. When the linear module 3 moves the base 21, the base 21 slides along the guide rail 5 through the limiting blocks 4 on both sides of the bottom, which facilitates the adsorption component 1 to move the PCB board back and forth between the loading position and the photolithography position.

[0022] Please see Figure 1 A scale 7 is fixedly installed on both adjacent sides of the top of the adsorption support frame 101.

[0023] In practical use: The top two adjacent sides of the adsorption support frame 101 are equipped with scales 7 for measuring the placement dimensions of the PCB board.

[0024] Please see Figure 1 A protective bracket 8 is fixedly installed on one side of the adsorption support frame 101, and a level 9 is installed in the hollow part of the middle of the protective bracket 8.

[0025] In practical use: A protective bracket 8 is installed on one side of the adsorption support frame 101, and a level 9 is installed in the hollow part of the middle of the protective bracket 8 to detect whether the adsorption support frame 101 is in a horizontal state.

[0026] Support legs 22 are installed around the surface of the base 21. When the servo electric cylinder 27 installed on the surface of the support legs 22 pushes the lifting platform 24, the lifting platform 24 slides along the slider 23 on the inner side of the support legs 22 via the slide rail 26 installed on the surface of the side plate 25, so that the lifting platform 24 is stably raised and lowered relative to the base 21. Thus, the lifting platform 24 drives the adsorption support frame 101 to achieve lifting and adjustment. The lifting and lowering of the adsorption support frame 101 drives the PCB board adsorbed on the surface to adjust the distance relative to the photolithography machine, which meets the photolithography processing of PCB boards of different thicknesses and sizes. The servo electric cylinder 27 has precise control and adjustment. With the cooperation of the displacement sensor 6 installed in the middle of one end of the lifting platform 24, the lifting displacement control is realized, thereby reducing adjustment error.

[0027] The contents not described in detail in this description are existing technologies known to those skilled in the art. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or make equivalent substitutions for some of the technical features. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the protection scope of the present invention.

Claims

1. An adsorption platform for an LDI lithography machine, characterized in that, include: An adsorption assembly (1) includes an adsorption support frame (101). The adsorption support frame (101) has several crisscrossing airflow channels (102) inside. The adsorption support frame (101) has several connecting holes (103) on its surface. The connecting holes (103) are connected to the airflow channels (102). The adsorption support frame (101) has several protrusions (104) around the connecting holes (103) on its surface. The adsorption support frame (101) has suction plates (105) installed on the surface of the protrusions (104) inside the adsorption support frame (101). The surface of the suction plates (105) has several suction holes (106). Vacuum suction mechanisms (107) are connected to the bottom two sides of the adsorption support frame (101). Adjustment component (2), the adjustment component (2) includes a base (21) set at the bottom of the adsorption support frame (101), the base (21) is equipped with support feet (22) around its surface, the support feet (22) are fixedly installed with sliders (23) inside the support feet (22), the bottom of the adsorption support frame (101) is equipped with a lifting platform (24), the bottom ends of the lifting platform (24) are equipped with side plates (25), the sides of the side plates (25) are fixedly installed with slide rails (26), the slide rails (26) are slidably installed inside the sliders (23), the surface of the support feet (22) is equipped with servo electric cylinders (27), the extension end of the servo electric cylinders (27) is connected to the bottom ends of the lifting platform (24).

2. The adsorption platform for an LDI lithography machine according to claim 1, characterized in that: The vacuum suction mechanism (107) includes a vacuum cover (1071) installed on both sides of the bottom of the adsorption support frame (101). The bottom of the adsorption support frame (101) is provided with a guide hole (1072) communicating with the airflow channel (102). The vacuum cover (1071) covers the surface of the guide hole (1072). A vacuum generator (1073) is installed at the bottom of the vacuum cover (1071). A positive pressure valve (1074) is also provided on one side of the bottom of the vacuum cover (1071).

3. The adsorption platform for an LDI lithography machine according to claim 1, characterized in that: The base (21) has a linear module (3) at its bottom. The base (21) is mounted on top of the linear module (3). Limiting blocks (4) are installed on both sides of the bottom of the base (21). Guide rails (5) are provided on both sides of the bottom of the base (21). The limiting blocks (4) slide on the surface of the guide rails (5).

4. The adsorption platform for an LDI lithography machine according to claim 1, characterized in that: A displacement sensor (6) is also installed at the middle of one end of the lifting platform (24).

5. The adsorption platform for an LDI lithography machine according to claim 1, characterized in that: A scale (7) is fixedly installed on both adjacent sides of the top of the adsorption support frame (101).

6. The adsorption platform for an LDI lithography machine according to claim 1, characterized in that: A protective bracket (8) is fixedly installed on one side of the adsorption support frame (101), and a level (9) is installed in the hollow part of the middle of the protective bracket (8).

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