A range-extending device for a wafer transfer robot
Patent Information
- Application Number
- CN202522071441.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-09-25
- Publication Date
- 2026-10-30
- Estimated Expiration
- 2035-09-25
AI Technical Summary
[0007]本申请提供了一种应用于晶圆转运机械手的增程装置,以解决现有晶圆转运机械手中转运臂竖向运动空间受限的技术问题
[0021]1.本申请的增程装置通过升降立柱相对安装立柱的上下运动与安装立柱相对增程组件的上下运动的双重竖向调节结构,能够在不过多影响升降立柱顶端转运臂安装位的下放高度基础上,增强升降立柱的竖向运动高度范围,从而增强转运臂安装位可到达的竖向高度。具体地,当需要对接高度较高的工艺设备晶圆端口时,驱动单元可驱动安装立柱相对增程座向上运动,同时升降立柱同步相对安装立柱向上运动,两者运动行程叠加能使转运臂安装位稳定抵达更高对接高度,完成对高位置晶圆的精准转运;而面对车间内高度较低的工艺设备晶圆端口时,仅需通过驱动单元驱动安装立柱相对增程座向下运动,即可带动升降立柱及转运臂安装位同步下移,且因升降立柱仍可相对安装立柱向下运动至与相对安装立柱较低的状态,转运臂安装位的最低高度能稳定控制在适配低位端口的合理范围,可顺利完成对薄膜沉积设备等低位工艺设备的晶圆对接,有效覆盖车间内多类型低位设备的转运需求。
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Figure CN224924187U_ABST
Abstract
Description
Technical Field
[0001] This application belongs to the field of robotic arm technology, specifically relating to a range extender device applied to a wafer transfer robotic arm. Background Technology
[0002] In the semiconductor manufacturing industry, wafer transfer robots are the core equipment for achieving automated wafer transport, and are widely used in wafer handling operations between semiconductor process equipment such as lithography machines, etching machines, and thin film deposition equipment. To meet the wafer loading and unloading needs of process equipment with different heights, transfer robots are usually equipped with a height-adjustable transfer arm structure. By adjusting the vertical height of the transfer arm, precise docking and transfer of wafers between wafer ports of different equipment can be achieved.
[0003] Existing wafer transfer robots typically employ a two-stage lifting design: a mounting column and a lifting column. The mounting column is fixed to the robot's base, the lifting column can move vertically relative to the mounting column, and the transfer arm is directly mounted on a mounting position at the top of the lifting column. The height of the transfer arm mounting position is adjusted by the vertical movement of the lifting column relative to the mounting column. However, this traditional structure has significant technical limitations in practical applications and struggles to meet the ever-increasing demands of semiconductor manufacturing for the operating range of transfer robots.
[0004] On the one hand, the limited vertical travel of the transfer arm mounting position results in insufficient lateral coverage space. Since the movement of the lifting column depends entirely on the vertical travel provided by the mounting column, and is constrained by the overall structural dimensions of the robot, especially the height of the mounting column which cannot be increased indefinitely (otherwise it would affect equipment stability and workshop layout), the maximum extension height of the lifting column is strictly limited, thus preventing the transfer arm mounting position from reaching its maximum height. When facing wafer ports of high-rise process equipment, the transfer arm cannot reach the designated position due to insufficient vertical travel, requiring adjustments to the overall robot placement or the addition of an auxiliary lifting platform to complete the operation. This not only reduces transfer efficiency but also increases equipment debugging complexity and production costs.
[0005] On the other hand, attempting to increase the vertical height by extending the travel of the mounting column limits the minimum height of the transfer arm mounting position. Some technical solutions address this insufficient vertical travel by extending the vertical height of the mounting column to increase the maximum movement height of the lifting column relative to the mounting column, thus increasing the travel of the lifting column. However, since the lifting column can only slide down to a position flush with the top of the mounting column, the height of the transfer arm mounting position is not lower than the top height of the mounting column. Therefore, the minimum height of the transfer arm mounting position is determined by the top height of the mounting column; increasing the height of the mounting column directly raises the minimum height of the transfer arm mounting position. When facing wafer ports of low-height process equipment (such as the low-position ports of some thin-film deposition equipment), the transfer arm cannot descend to the docking position due to its excessively high minimum height. This makes the robot unsuitable for such equipment, significantly narrowing its applicability and making it difficult to meet the compatible transfer needs of various types and heights of process equipment in semiconductor workshops.
[0006] In summary, the existing lifting structure of wafer transfer robots has a limited operating range due to the conflict between "vertical stroke lifting" and "minimum height control," making it difficult to adapt to the wafer transfer needs of multi-height and multi-type process equipment in semiconductor manufacturing. Utility Model Content
[0007] This application provides a range extender for a wafer transfer robot to solve the technical problem of limited vertical movement space of the transfer arm in existing wafer transfer robots.
[0008] The technical solution adopted in this application is as follows:
[0009] An extension device for a wafer transfer robot includes a mounting column and a lifting column mounted on the mounting column. The top of the lifting column is provided with a transfer arm mounting position for mounting a transfer arm. The lifting column can move up and down relative to the mounting column to drive the transfer arm mounting position to move up and down. The extension device also includes an extension component, which includes an extension base and a drive unit. The mounting column is mounted on the extension base, and the drive unit can drive the mounting column to move up and down relative to the extension base.
[0010] The range extender device described in this application also includes the following additional technical features:
[0011] The range extender is provided with a lifting cavity extending in a vertical direction. The range extender assembly also includes a lifting seat. The mounting column is installed on the lifting seat. The drive unit drives the lifting seat to move up and down along the lifting cavity so as to drive the mounting column to move up and down along the lifting cavity.
[0012] The mounting column has a bearing surface at its top, the transfer arm mounting position is located above the bearing surface, the lifting cavity has an opening at its top, and the mounting column has a first limit position at the bottom of the lifting cavity and a second limit position at the top of the lifting cavity. When the mounting column is at the first limit position, the bearing surface is not lower than the opening.
[0013] The range extender includes a base plate, a back plate, a side plate, and a front panel. The base plate, the back plate, the side plate, and the front panel cooperate to form the lifting cavity. The front panel and the side plate are detachably connected. The drive unit includes a drive component and a transmission mechanism. The drive component is installed on the side of the back plate away from the lifting cavity. The drive component drives the lifting seat to move up and down through the transmission mechanism.
[0014] The bottom of the lifting seat is provided with a first cable routing groove, which includes a cable outlet facing the side of the panel. The first cable routing groove is used to run the pipeline and guide the pipeline to extend out from the cable outlet to connect with the mounting column.
[0015] The range extender also includes a cable chain assembly mounted on the back plate, the cable chain assembly being hollow to form a second cable routing groove communicating with the first cable routing groove.
[0016] The side plate is provided with multiple weight-reducing holes at intervals along the vertical direction.
[0017] The range extender is provided with a guide rail located in the lifting cavity, and the lifting seat is provided with a guide groove adapted to the guide rail. The lifting seat slides up and down relative to the range extender through the sliding cooperation between the guide rail and the guide groove.
[0018] The lifting platform includes a horizontally extending support plate, reinforcing side plates installed on opposite sides of the support plate, and a reinforcing rear plate located between the two reinforcing side plates. The mounting column is installed on the support plate.
[0019] The mounting column is hollow to form a sliding cavity, and the lifting column is at least partially located in the sliding cavity and can slide up and down along the sliding cavity.
[0020] Due to the adoption of the above technical solution, the beneficial effects achieved by this application are as follows:
[0021] 1. The range extender of this application has a dual vertical adjustment structure of the up-and-down movement of the lifting column relative to the mounting column and the up-and-down movement of the mounting column relative to the range extender component. This structure can enhance the vertical movement range of the lifting column without significantly affecting the lowering height of the transfer arm mounting position at the top of the lifting column, thereby increasing the vertical height that the transfer arm mounting position can reach. Specifically, when docking with wafer ports of process equipment with higher heights, the drive unit can drive the mounting column to move upward relative to the extension base, while the lifting column moves upward relative to the mounting column simultaneously. The combined stroke of both movements allows the transfer arm mounting position to stably reach a higher docking height, completing the precise transfer of high-position wafers. When dealing with wafer ports of process equipment with lower heights in the workshop, the drive unit only needs to drive the mounting column to move downward relative to the extension base, which will cause the lifting column and transfer arm mounting position to move downward simultaneously. Since the lifting column can still move downward relative to the mounting column to a position lower than the mounting column, the minimum height of the transfer arm mounting position can be stably controlled within a reasonable range to adapt to low-position ports. This allows for smooth wafer docking with low-position process equipment such as thin film deposition equipment, effectively covering the transfer needs of various types of low-position equipment in the workshop.
[0022] Furthermore, the extension unit enhances the vertical height switching speed of the transfer arm mounting position. The movement of the lifting column relative to the mounting column and the movement of the mounting column relative to the extension base can be synchronized, enabling rapid height switching of the transfer arm mounting position. Taking the transfer of wafers from an etching machine at a lower height to a lithography machine at a higher height as an example, when the wafer is removed from the port of the lower-height etching machine, the mounting column is at a lower position relative to the extension base. The lifting column is then adjusted to match the height of the etching machine port. Subsequently, the drive unit drives the mounting column to move upward relative to the extension base, while the lifting column is further fine-tuned according to the height of the lithography machine port. This allows for rapid transfer of the wafer to the lithography machine port without requiring adjustments to the overall structure of the robot. This significantly improves the robot's operational flexibility in multi-device, multi-height scenarios, meeting the complex wafer transfer process requirements within semiconductor workshops.
[0023] Furthermore, the connection structure between the mounting column and the range extender, and the coordination between the lifting column and the mounting column, can form a stable dual support system during actual operation. When the transfer arm carries the wafer for vertical height adjustment, the movement of the mounting column relative to the range extender provides stable basic adjustment support, while the movement of the lifting column relative to the mounting column enables precise height fine-tuning. The coordinated work of the two can effectively reduce the swaying or offset problems that may occur with a single lifting structure, ensuring that the transfer arm can maintain a stable state at different height positions, guaranteeing the safety of the wafer during the transfer process, reducing the risk of wafer damage due to structural instability, and meeting the stringent requirements of semiconductor manufacturing for equipment reliability.
[0024] 2. By incorporating a vertically extending lifting cavity within the range extender and using the lifting seat as a transitional connection between the mounting column and the range extender, a stable bearing platform is provided for the mounting column, thereby improving the overall operational reliability of the range extender. When the drive unit drives the lifting seat to move up and down along the lifting cavity, the inner wall of the lifting cavity can limit the lateral displacement of the lifting seat during movement, effectively restricting its lateral offset and reducing the probability of the mounting column causing the transfer arm mounting position to deviate from the preset trajectory due to shaking. This guiding effect is particularly important at the wafer ports of lithography machines, where the docking precision requirements are extremely high. This ensures that the mounting column drives the transfer arm mounting position to move smoothly up and down, reducing the probability of wafer misalignment due to offset and ensuring the accuracy of wafer loading and unloading. Simultaneously, as an intermediate carrier, the lifting seat can evenly distribute the load, including the weight of the mounting column itself, the weight of the lifting column, the weight of the transfer arm, and the weight of the wafer, onto the inner wall of the lifting cavity of the range extender, reducing the probability of localized stress concentration when the mounting column directly connects to the range extender and minimizing direct impact on the range extender. Attached Figure Description
[0025] The accompanying drawings, which are included to provide a further understanding of this application and form part of this application, illustrate exemplary embodiments and are used to explain this application, but do not constitute an undue limitation of this application. In the drawings:
[0026] Figure 1 This is a schematic diagram of the range extender device according to one embodiment of this application;
[0027] Figure 2 This is a schematic diagram of the structure of a range extender portion according to one embodiment of this application. Figure 1 ;
[0028] Figure 3 for Figure 2 Enlarged view of part A;
[0029] Figure 4 This is a schematic diagram of the structure of a range extender portion according to one embodiment of this application. Figure 2 ;
[0030] Figure 5 This is a schematic diagram of the structure of the range extender component according to one embodiment of this application;
[0031] Figure 6 for Figure 5 Enlarged view of part A;
[0032] Figure 7 This is a front view of a portion of the range extender component structure according to one embodiment of this application.
[0033] List of components and reference numerals:
[0034] 1. Installation column; 11. Bearing surface; 12. Wiring port;
[0035] 2 lifting columns, 21 transfer arm mounting positions;
[0036] 3 Range extender seat, 31 Lifting chamber, 311 Opening, 32 Base plate, 33 Side plate, 331 Weight reduction hole, 34 Back plate, 35 Front panel;
[0037] 4 lifting seat, 41 load-bearing plate, 42 reinforced side plate, 43 reinforced rear plate;
[0038] 5. Drive components;
[0039] 6. Transmission mechanism, 61. Driving pulley, 62. Driven pulley, 63. Transmission belt, 64. Lead screw;
[0040] 7 First cable tray, 71 Cable outlet;
[0041] 8 cable chain assembly, 81 second cable routing channel;
[0042] 9. Guide rails. Detailed Implementation
[0043] To more clearly illustrate the overall concept of this application, a detailed explanation is provided below with reference to the accompanying drawings.
[0044] Many specific details are set forth in the following description to provide a thorough understanding of this application. However, this application may also be implemented in other ways different from those described herein. Therefore, the scope of protection of this application is not limited to the specific embodiments disclosed below. It should be noted that, unless otherwise specified, the embodiments of this application and the features thereof can be combined with each other.
[0045] Furthermore, it should be understood in the description of this application that the terms "top", "bottom", "inner", "outer", "axial", "radial", "circumferential", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application.
[0046] In this application, unless otherwise expressly specified and limited, the terms "installation," "connection," "linking," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection, an electrical connection, or a communication connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances.
[0047] In this application, unless otherwise expressly specified and limited, the "above" or "below" of the second feature can mean that the first and second features are in direct contact, or that the first and second features are in indirect contact through an intermediate medium. In the description of this specification, references to terms such as "an embodiment," "some embodiments," "example," "specific example," or "some examples," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of this application. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described can be combined in any suitable manner in one or more embodiments or examples.
[0048] like Figures 1 to 7 As shown, a range extender for a wafer transfer robot includes a mounting column 1 and a lifting column 2 mounted on the mounting column 1. The top of the lifting column 2 is provided with a transfer arm mounting position 21 for mounting a transfer arm. The lifting column 2 can move up and down relative to the mounting column 1 to drive the transfer arm mounting position 21 to move up and down. The range extender also includes a range extender assembly, which includes a range extender base 3 and a drive unit. The mounting column 1 is mounted on the range extender base 3, and the drive unit can drive the mounting column 1 to move up and down relative to the range extender base 3.
[0049] The range extender of this application, through a dual vertical adjustment structure of the up-and-down movement of the lifting column 2 relative to the mounting column 1 and the up-and-down movement of the mounting column 1 relative to the range extender component, can enhance the vertical movement range of the lifting column 2 without excessively affecting the lowering height of the transfer arm mounting position 21 at the top of the lifting column 2, thereby increasing the vertical height that the transfer arm mounting position 21 can reach. Specifically, when docking with wafer ports of process equipment with higher heights is required, the drive unit can drive the mounting column 1 to move upward relative to the extension base 3, while the lifting column 2 moves upward relative to the mounting column 1 simultaneously. The combined stroke of both movements allows the transfer arm mounting position 21 to stably reach a higher docking height, completing the precise transfer of high-position wafers. When dealing with wafer ports of process equipment with lower heights in the workshop, the drive unit only needs to drive the mounting column 1 to move downward relative to the extension base 3, which will drive the lifting column 2 and the transfer arm mounting position 21 to move downward simultaneously. Since the lifting column 2 can still move downward relative to the mounting column 1 to a state lower than the mounting column 1, the minimum height of the transfer arm mounting position 21 can be stably controlled within a reasonable range to adapt to low-position ports, which can smoothly complete wafer docking with low-position process equipment such as thin film deposition equipment, effectively covering the transfer needs of various types of low-position equipment in the workshop.
[0050] Furthermore, the extension component enhances the vertical height switching speed of the transfer arm mounting position 21. The movement of the lifting column 2 relative to the mounting column 1 and the movement of the mounting column 1 relative to the extension base 3 can be synchronized, thereby achieving rapid height switching of the transfer arm mounting position 21. Taking the transfer of wafers from the etching machine at a lower height to the lithography machine at a higher height as an example, when the wafer is taken out from the port of the lower-height etching machine, the mounting column 1 is at a lower position relative to the extension base 3. The lifting column 2 is adjusted to match the height of the etching machine port. Subsequently, the drive unit drives the mounting column 1 to move upward relative to the extension base 3. At the same time, the lifting column 2 is further fine-tuned according to the height of the lithography machine port, which can quickly transfer the wafer to the lithography machine port without adjusting the overall structure of the robot. This significantly improves the operational flexibility of the robot in multi-device and multi-height scenarios, meeting the needs of complex wafer transfer processes in semiconductor workshops.
[0051] Furthermore, the connection structure between the mounting column 1 and the extension base 3, and the coordination between the lifting column 2 and the mounting column 1, can form a stable dual support system during actual operation. When the transfer arm carries the wafer for vertical height adjustment, the movement of the mounting column 1 relative to the extension base 3 can provide stable basic adjustment support, while the movement of the lifting column 2 relative to the mounting column 1 can achieve precise height fine-tuning. The coordinated work of the two can effectively reduce the swaying or offset problems that may occur with a single lifting structure, ensuring that the transfer arm can maintain a stable state at different height positions, ensuring the safety of the wafer during the transfer process, reducing the risk of wafer damage due to structural instability, and meeting the stringent requirements of semiconductor manufacturing for equipment reliability.
[0052] Specifically, the mounting column 1 is equipped with a drive mechanism, which drives the lifting column 2 to slide relative to the mounting column 1. That is, the movement of the lifting column 2 relative to the mounting column 1 driven by the drive mechanism and the movement of the mounting column 1 relative to the range extender 3 driven by the drive unit are independently controlled, and the two can be carried out simultaneously or independently.
[0053] As a preferred embodiment of this application, such as Figure 2 , Figure 3 As shown, the range extender 3 is provided with a lifting cavity 31 extending in the vertical direction. The range extender also includes a lifting seat 4. The mounting column 1 is installed on the lifting seat 4. The drive unit drives the lifting seat 4 to move up and down along the lifting cavity 31 so as to drive the mounting column 1 to move up and down along the lifting cavity 31.
[0054] By setting a vertically extending lifting cavity 31 within the range extender 3 and introducing a lifting seat 4 as a transitional connection between the mounting column 1 and the range extender 3, a stable bearing platform is provided for the mounting column 1, thereby improving the overall operational reliability of the range extender. When the drive unit drives the lifting seat 4 to move up and down along the lifting cavity 31, the inner wall of the lifting cavity 31 can limit the lateral displacement of the lifting seat 4 around its perimeter, effectively restricting the lateral displacement of the lifting seat 4 during movement. This reduces the probability that the mounting column 1 will deviate from the preset trajectory due to shaking. Especially at the wafer port of a lithography machine with extremely high docking precision requirements, this guiding effect ensures that the mounting column 1 drives the transfer arm mounting position 21 to move up and down smoothly, reducing the probability of misalignment between the wafer and the port due to displacement, and ensuring the accuracy of wafer loading and unloading. Meanwhile, the lifting base 4, as an intermediate carrier, can evenly distribute the loads, including the weight of the mounting column 1 itself, the weight of the lifting column 2, the weight of the transfer arm, and the weight of the wafer, to the inner wall of the lifting cavity 31 of the range extender 3, thereby reducing the probability of local stress concentration when the mounting column 1 is directly connected to the range extender 3 and reducing the direct impact on the range extender 3.
[0055] In addition, the lifting cavity 31 allows for spatial overlap between the mounting column 1 and the range extender 3, making full use of the internal space of the range extender 3. The range extender 3 can provide some shielding and protection for the mounting column 1, while also contributing to the miniaturization of the range extender device.
[0056] Preferably, the mounting column 1 is provided with a base, and the base and the lifting seat 4 are detachably connected by bolts.
[0057] As a preferred embodiment of this implementation, such as Figure 1 , Figure 2 As shown, the top of the mounting column 1 is provided with a bearing surface 11, the transfer arm mounting position 21 is located above the bearing surface 11, the top of the lifting cavity 31 has an opening 311, the mounting column 1 has a first limit position at the bottom of the lifting cavity 31 and a second limit position at the top of the lifting cavity 31, when the mounting column 1 is at the first limit position, the bearing surface 11 is not lower than the opening 311.
[0058] The term "transfer arm mounting position 21 is located above the bearing surface 11" means that no matter how the lifting column 2 moves up and down relative to the mounting column 1, the transfer arm mounting position 21 is always located above the bearing surface 11. Therefore, the transfer arm installed on the transfer arm mounting position 21 is always located above the bearing surface 11.
[0059] When the mounting column 1 is at its first extreme position at the bottom of the lifting cavity 31, the bearing surface 11 is not lower than the opening 311 at the top of the lifting cavity 31. This design fundamentally avoids collision interference between the transfer arm mounted on the lifting column 2 and the range extender 3 when the lifting column 2 moves downward relative to the mounting column 1. Since the transfer arm mounting position 21 is located above the bearing surface 11, and the bearing surface 11 is not lower than the opening 311 of the lifting cavity 31, the transfer arm mounting position 21 is always located above the opening 311 of the lifting cavity 31. Therefore, even if the lifting column 2 moves to its lowest position, that is, when the mounting column 1 moves to its first extreme position, and the lifting column 2 moves to its lowest point relative to the mounting column 1, the transfer arm mounting position 21 is still located above the opening 311 of the lifting cavity 31, facilitating the transfer arm's transfer operation. In addition, the clear setting of the first and second extreme positions can also provide a clear travel reference for the device's control system, preventing the mounting column 1 from exceeding the safe range due to excessive movement, and ensuring that the transfer arm can operate stably in docking scenarios at different heights.
[0060] As another preferred embodiment of this implementation, such as Figures 1 to 6 As shown, the range extender 3 includes a base plate 32, a back plate 34, a side plate 33, and a front panel 35. The base plate 32, back plate 34, side plate 33, and front panel 35 cooperate to form a lifting cavity 31. The front panel 35 and the side plate 33 are detachably connected. The drive unit includes a drive component 5 and a transmission mechanism 6. The drive component 5 is installed on the side of the back plate 34 away from the lifting cavity 31. The drive component 5 drives the lifting seat 4 to move up and down through the transmission mechanism 6.
[0061] Specifically, the transmission mechanism 6 includes a combination structure of a pulley assembly and a ball screw pair. The pulley assembly includes a driving pulley 61, a driven pulley 62, and a transmission belt 63 sleeved on the driving pulley 61 and the driven pulley 62. The driving component 5 is a servo motor. The output shaft of the servo motor drives the driving pulley 61 to rotate. The driving pulley 61 drives the driven pulley 62 to rotate through the transmission belt 63. The lead screw 64 in the ball screw pair is mounted on the bearing seat of the lifting cavity 31 through a bearing. The nut in the ball screw pair is connected to the lifting seat 4 through a connecting block. The driven pulley 62 drives the lead screw 64 to rotate, thereby driving the nut to move up and down, thus realizing the up and down movement of the lifting seat 4.
[0062] The split-type structure design of the range extender 3 makes equipment maintenance more efficient. When the lifting seat 4 or transmission mechanism 6 in the lifting chamber 31 malfunctions or requires regular maintenance, the operator does not need to disassemble the entire range extender 3. They only need to remove the panel 35, which is detachably connected to the side plate 33, to observe the internal space of the lifting chamber 31 and maintain or replace the components inside the lifting chamber 31. In addition, installing the drive unit 5 on the side of the back plate 34 away from the lifting chamber 31 can separate the drive unit 5 from the other components inside the lifting chamber 31, providing an independent working environment for the internal components of the lifting chamber 31 and avoiding mutual interference between the drive unit 5 and the internal components of the lifting chamber 31. This helps to optimize the structural design of the range extender.
[0063] As a preferred example in this embodiment, such as Figure 3 As shown, the bottom of the lifting seat 4 is provided with a first cable tray 7. The first cable tray 7 includes a cable outlet 71 facing the side of the panel 35. The first cable tray 7 is used to run the pipeline and guide the pipeline to extend out from the cable outlet 71 to connect with the mounting column 1.
[0064] By setting a first cable tray 7 with a cable outlet 71 in a specific direction at the bottom of the lifting base 4, a standardized cable storage channel is constructed. This not only avoids cable tangling and wear during movement but also improves maintenance convenience and ensures the stability of power supply and signal transmission for the device. The cables include power cables and signal cables that provide power and signal transmission to the mounting column 1 and the lifting column 2. The power cables may include electrical wires. The first cable tray 7 can centrally store all cables. The cables pass through the first cable tray 7 and extend from the cable outlet 71 facing the panel 35 to connect to the mounting column 1. The cables are protected by the first cable tray 7 throughout their entire length, preventing friction with the inner wall of the lifting cavity 31 or other components of the lifting base 4, and preventing tangling due to changes in the direction of movement. Meanwhile, the design of the outlet 71 facing the panel 35 also improves maintenance convenience: when staff disassemble the panel 35 for inspection, they can directly observe the connection status of the pipeline from the outlet 71, quickly determining whether there are any problems such as looseness or damage in the pipeline, without having to go deep into the lifting cavity 31 for inspection. For example, if the connection between the pipeline and the mounting column 1 is found to be loose, the joint can be quickly tightened through the opening 311 of the panel 35, greatly reducing the difficulty of maintenance. This standardized pipeline design can significantly reduce the risk of pipeline failure, ensure the continuous and stable power supply and signal transmission of the device, and ensure that the movement response of the lifting column 2 and the mounting column 1 is timely and accurate, preventing delays or failures in the height adjustment of the transfer arm mounting position 21 due to pipeline problems.
[0065] Preferably, the first cable tray 7 is located at the middle of the bottom of the lifting base 4 and is formed by multiple splicing plates and the lifting base 4. The mounting column 1 has a wiring port 12 on the side facing the panel 35 for connecting to the pipeline extending from the first cable tray 7.
[0066] As a preferred method in this example, such as Figure 4 As shown, the range extender also includes a cable chain assembly 8 mounted on the back plate 34. The cable chain assembly 8 is hollow inside to form a second cable routing groove 81 that communicates with the first cable routing groove 7.
[0067] By adding a cable chain assembly 8 connected to the first cable tray 7 on the back plate 34, the first cable tray 7 and the second cable tray 81 cooperate to form a protective channel for the pipeline. This not only adapts to the movement and extension requirements of the lifting seat 4, but also reduces external contamination to a certain extent, further improving the service life of the pipeline and the operational stability of the device. In actual use, when the lifting seat 4 moves up and down along the lifting cavity 31, the pipeline connecting the mounting column 1 and the external equipment needs to extend and retract accordingly. If relying solely on the first cable tray 7, the pipeline will still be exposed after extending out of the first cable tray 7, and will be stretched and bent with the movement of the lifting seat 4. However, after the second cable tray 81 inside the cable chain assembly 8 is connected to the first cable tray 7, the pipeline extending out of the first cable tray 7 can be hidden inside the cable chain assembly 8. The cable chain assembly 8 can extend and retract synchronously with the movement of the lifting seat 4, and guide the pipeline to bend and stretch smoothly through its own chain link structure, greatly reducing the probability of excessive bending or stretching deformation of the pipeline.
[0068] As another preferred example under this embodiment, such as Figure 2 As shown, the side plate 33 is provided with a plurality of weight-reducing holes 331 at intervals along the vertical direction.
[0069] By setting multiple weight-reducing holes 331 at intervals along the vertical direction on the side plate 33, a lightweight design of the range extender 3 is achieved without sacrificing the structural strength of the side plate 33, while also improving heat dissipation performance. From a heat dissipation perspective, the spaced weight-reducing holes 331 increase the heat dissipation area of the side plate 33 and form an air convection channel. When the range extender is running, the sliding of the lifting seat 4 in the lifting cavity 31 generates frictional heat, and the power transmitted by the drive unit also generates some heat. If this heat accumulates in the lifting cavity 31, it may affect the lubrication performance of the slide rail or the stability of the pipeline. The weight-reducing holes 331 allow the heat in the lifting cavity 31 to be quickly dissipated out of the lifting cavity 31, exchanged with the side plate 33, and transferred to the outside, reducing the probability of heat accumulation in the lifting cavity 31.
[0070] As another preferred embodiment of this implementation, such as Figure 7 As shown, the range extender 3 is provided with a guide rail 9 located in the lifting cavity 31, and the lifting seat 4 is provided with a guide groove adapted to the guide rail 9. The lifting seat 4 slides up and down relative to the range extender 3 through the sliding cooperation between the guide rail 9 and the guide groove.
[0071] The design of the guide rail 9 and guide groove significantly improves the stability and precision of the lifting seat 4's movement, while reducing frictional wear and extending component lifespan. During the movement of the lifting seat 4, the guide groove slides precisely along the trajectory of the guide rail 9, preventing lateral deviation and ensuring smooth lifting and lowering of the mounting column 1. This provides stability for the height adjustment accuracy of the transfer arm mounting position 21. Simultaneously, this sliding engagement optimizes friction performance, reducing the frictional resistance of the lifting seat 4 relative to the range extender 3. This not only reduces the power consumption of the drive unit but also lowers the wear rate of the contact surfaces, reducing the maintenance costs of the range extender.
[0072] Preferably, there are two guide rails 9 arranged at intervals in the lifting cavity 31, and two guide grooves that cooperate with the two guide rails 9 respectively.
[0073] As another preferred embodiment of this implementation, such as Figure 3 , Figure 7 As shown, the lifting platform 4 includes a support plate 41 extending in the horizontal direction, reinforcing side plates 42 installed on opposite sides of the support plate 41, and a reinforcing rear plate 43 located between the two reinforcing side plates 42. The mounting column 1 is installed on the support plate 41.
[0074] The reinforcing side plates 42 on both sides of the bearing plate 41 and the reinforcing rear plate 43 in the middle can form an I-shaped support structure, which distributes the vertical load on the bearing plate 41 to the reinforcing side plates 42 and the reinforcing rear plate 43, and then transfers it to the range extender 3, effectively preventing the bearing plate 41 from bending due to uneven force.
[0075] In a preferred embodiment of this application, the mounting column 1 is hollow to form a sliding cavity, and the lifting column 2 is at least partially located in the sliding cavity and can slide up and down along the sliding cavity.
[0076] By designing the mounting column 1 as a hollow structure, a sliding cavity is formed for the movement of the lifting column 2, achieving concealed installation of the lifting column 2. This saves space, provides comprehensive protection for the lifting column 2, and improves the accuracy of its movement. In semiconductor workshops, equipment layouts are typically compact, and robotic arms need to move in multiple directions within limited space. If the lifting column 2 were completely exposed outside the mounting column 1, it would significantly increase the lateral space occupied by the device, potentially leading to collisions with surrounding equipment. The sliding cavity design allows the lifting column 2 to be at least partially located inside the mounting column 1, with only its top extending out to connect to the transfer arm, better suited to the compact layout requirements of workshops. Simultaneously, the inner wall of the sliding cavity provides surrounding protection for the lifting column 2, reducing the probability of it being damaged by external collisions or dust contamination during movement. In addition, the sliding cavity can provide precise guidance for the vertical movement of the lifting column 2, ensuring that the lifting column 2 slides smoothly along the axis of the sliding cavity and avoiding tilting or deviation of the lifting column 2. For example, when the lifting column 2 is rapidly raised and lowered to adjust its height, the guiding effect of the sliding cavity can ensure that the lifting column 2 drives the transfer arm mounting position 21 to move in the vertical direction, and will not cause misalignment between the wafer and the equipment port due to deviation, thus ensuring the stability and safety of wafer transfer.
[0077] For any parts not mentioned in this application, existing technologies may be used or referenced.
[0078] The various embodiments in this specification are described in a progressive manner. The same or similar parts between the various embodiments can be referred to each other. Each embodiment focuses on describing the differences from other embodiments.
[0079] The above description is merely an embodiment of this application and is not intended to limit the scope of this application. Various modifications and variations can be made to this application by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the scope of the claims of this application.
Claims
1. A range extender for use in a wafer transfer robot, characterized in that, It includes a mounting column and a lifting column installed on the mounting column. The top of the lifting column is provided with a transfer arm mounting position for installing a transfer arm. The lifting column can move up and down relative to the mounting column to drive the transfer arm mounting position to move up and down. The range extender also includes a range extender assembly, which includes a range extender base and a drive unit. The mounting column is mounted on the range extender base, and the drive unit is capable of driving the mounting column to move up and down relative to the range extender base.
2. The range extender according to claim 1, characterized in that, The range extender is provided with a lifting cavity extending in a vertical direction. The range extender assembly also includes a lifting seat. The mounting column is installed on the lifting seat. The drive unit drives the lifting seat to move up and down along the lifting cavity so as to drive the mounting column to move up and down along the lifting cavity.
3. The range extender according to claim 2, characterized in that, The mounting column has a bearing surface at its top, the transfer arm mounting position is located above the bearing surface, the lifting cavity has an opening at its top, the mounting column has a first limit position at the bottom of the lifting cavity and a second limit position at the top of the lifting cavity, the mounting column is located at the first limit position, and the bearing surface is not lower than the opening.
4. The range extender according to claim 2, characterized in that, The range extender includes a base plate, a back plate, a side plate, and a front panel. The base plate, the back plate, the side plate, and the front panel cooperate to form the lifting cavity. The front panel and the side plate are detachably connected. The drive unit includes a drive component and a transmission mechanism. The drive component is installed on the side of the back plate away from the lifting cavity. The drive component drives the lifting seat to move up and down through the transmission mechanism.
5. The range extender according to claim 4, characterized in that, The bottom of the lifting seat is provided with a first cable routing groove, which includes a cable outlet facing the side of the panel. The first cable routing groove is used to run the pipeline and guide the pipeline to extend out from the cable outlet to connect with the mounting column.
6. The range extender according to claim 5, characterized in that, The range extender also includes a cable chain assembly mounted on the back plate, the cable chain assembly being hollow to form a second cable routing groove communicating with the first cable routing groove.
7. The range extender according to claim 4, characterized in that, The side plate is provided with multiple weight-reducing holes at intervals along the vertical direction.
8. The range extender according to claim 2, characterized in that, The range extender is provided with a guide rail located in the lifting cavity, and the lifting seat is provided with a guide groove adapted to the guide rail. The lifting seat slides up and down relative to the range extender through the sliding cooperation between the guide rail and the guide groove.
9. The range extender according to claim 2, characterized in that, The lifting platform includes a horizontally extending support plate, reinforcing side plates installed on opposite sides of the support plate, and a reinforcing rear plate located between the two reinforcing side plates. The mounting column is installed on the support plate.
10. The range extender according to claim 1, characterized in that, The mounting column is hollow to form a sliding cavity, and the lifting column is at least partially located in the sliding cavity and can slide up and down along the sliding cavity.
