A trough-type device for removing crystals from robotic arm hooks.

Abstract

This utility model discloses a trough-type device for removing crystals from robotic arm hooks, including a mounting base. A two-axis moving assembly is mounted on the mounting base to move the cleaning tank horizontally and vertically. A mounting plate is mounted on the output end of the two-axis moving assembly, and several cleaning tanks for cleaning the crystals on the robotic arm hooks are mounted on the mounting plate. This utility model features cleaning tanks. When it is necessary to clean the crystals on the robotic arm hooks, the two-axis moving assembly first lowers the cleaning tank to a set position, then adds hot water at 60℃-70℃ into the cleaning tank. The two-axis moving assembly then moves the cleaning tank to below the robotic arm hook, where the robotic arm places the hook into the cleaning tank to clean the crystals.

Description

Technical Field

[0001] This disclosure belongs to the field of photovoltaic texturing silicon crystal cell cleaning technology, specifically relating to a trough-type device for removing crystals from robotic arm hooks. Background Technology

[0002] The process flow of single crystal texturing includes: receiving materials from the warehouse → inserting wafers → pre-cleaning → rinsing → texturing → rinsing → post-cleaning → rinsing → acid washing → rinsing → hot water slow extraction dehydration → hot drying → unloading → next process (boron expansion).

[0003] 1. Pre-cleaning (NaOH+H2O2) removes the mechanical damage layer and impurities adhering to the silicon wafer surface, reducing surface recombination centers;

[0004] Si+NaOH+H2O=Na2SiO3+2H2↑;

[0005] 2. Texturing (NaOH + IPA + other additives): A textured surface is formed on the silicon wafer, which increases the absorption of sunlight, reduces reflection, increases the PN junction area, increases the short-circuit current (Isc), and ultimately improves the photoelectric conversion efficiency of the battery.

[0006] Si+NaOH+H2O=Na2SiO3+2H2↑;

[0007] 3. Post-cleaning (NaOH+H2O2) removes residual organic matter, ensuring the cleanliness of the silicon wafer surface, thereby improving the battery conversion efficiency to a certain extent.

[0008] Si+NaOH+H2O=Na2SiO3+2H2↑;

[0009] 4. Pickling (HF+HCl) removes and neutralizes residual NaOH, removes the oxide layer on the surface, making the silicon wafer surface more hydrophobic and forming a silicon complex H2SiF6.

[0010] HCl + NaOH = NaCl + H2O;

[0011] SiO2 + 6HF = H2SiF6 + 2H2O.

[0012] During the texturing process, due to the use of various chemicals, crystals will be produced on the machine. These crystals can easily cause equipment malfunctions on the covers of the pre-cleaning tank, texturing tank, and post-cleaning tank, as well as at the exhaust vents above these tanks, especially on the robotic arm hooks. These crystals must be removed regularly, but they are difficult to clean completely.

[0013] Analysis suggests that the formation of these crystals is essentially due to the supersaturation precipitation and deposition of chemicals carried out by the robotic arm's jacquard basket, byproducts of the texturing reaction on the surface of the tank, and deposition at the pipe inlet by hot alkali negative pressure ventilation. The following is a systematic analysis of the causes:

[0014] Its core chemical reaction is the anisotropic corrosion of silicon in a hot alkaline solution:

[0015] Si+NaOH+H2O=Na2SiO3+2H2↑ or Si+KOH+H2O=K2SiO3+2H2↑;

[0016] Sodium silicate (Na2SiO3) or potassium silicate (K2SiO3) byproducts are the main source of crystallization, followed by sodium carbonate (Na2CO3) produced by the chemical reaction of NaOH with CO2 in the air;

[0017] 2NaOH + CO2 = Na2CO3 + H2O.

[0018] As moisture evaporates, the liquid medicine is exposed to the atmosphere and cools, becoming supersaturated and precipitating out, forming white crystals on the tank cover and robotic arm hook.

[0019] In summary, the crystals on the tank cover and the robotic arm are mainly sodium silicate and sodium carbonate.

[0020] Negative effects of crystallization:

[0021] 1. Decreased tank performance:

[0022] ① Scale buildup on heating elements → reduced heat transfer efficiency → increased energy consumption and uneven temperature;

[0023] ②Pipe blockage → decreased circulation flow → deterioration of flocking uniformity;

[0024] 2. Contaminated bath solution and silicon wafers:

[0025] ① The flaking scale contaminates the solution, causing bright spots and scratches on the silicon wafer surface;

[0026] ② Metal ion dissolution catalyzes abnormal corrosion;

[0027] 3. Frequent malfunctions of the robotic arm hook:

[0028] ① The hook is prone to jamming, causing the robotic arm to crush the silicon wafers and lose the basket;

[0029] ② The rim protection signal and the rim rejection signal are malfunctioning;

[0030] 4. Increased maintenance costs: Frequent shutdowns for cleaning are required, shortening the equipment's lifespan.

[0031] Chinese Patent Publication No. CN119702609A discloses an anti-crystallization device for the exhaust valve of a Topcon battery cell texturing machine. This device solves the problem that the spray device would obstruct the airflow channel inside the exhaust pipe when it is not in operation. Through the setting of a cleaning device and a connecting device, the large water pressure causes the curved pipe to drive the rotating nozzle to rotate, which sprays and cleans the inner wall of the valve body comprehensively and evenly. Under the action of the connecting device, the rotation of the nozzle drives the T-shaped frame to move up and down. The movement of the T-shaped frame drives the arc plate connected to the fixed frame to move, so that the cleaning cotton on the arc plate performs a secondary cleaning on the inner wall of the valve body, effectively removing crystals, ensuring the normal operation of the valve core, and extending the service life of the equipment.

[0032] Chinese Patent Publication No. CN108054117A discloses a method for cleaning crystals in a silicon wafer polishing machine, belonging to the field of silicon wafer processing equipment cleaning technology. The method includes the following steps: Step 1: Before starting the mechanical cleaning components, stop the polishing machine and drain any remaining polishing fluid. Step 2: Control the blade displacement using a telescopic cylinder, bringing the rotating scraper and vibrating brush head close to the area where polishing fluid crystals adhere. Step 3: Perform mechanical cleaning, starting the rotating scraper to initially scrape away large areas of crystals; simultaneously, activate the vibrating brush head to further refine the surface after scraping, removing residual crystal particles. Step 4: After mechanical cleaning, rinse the surface and then use hot air to dry the surface of the equipment components. This method quickly and thoroughly removes crystals without disassembling the main components of the equipment, ensuring stable operation of the silicon wafer polishing machine and improving production efficiency and silicon wafer polishing quality.

[0033] The aforementioned patents are intended to address the issue of preventing crystallization inside the exhaust pipe above the texturing machine of photovoltaic equipment, and to address the issue of using a scraper to physically remove crystals from a polishing machine of semiconductor equipment, followed by rinsing and drying the equipment components with hot air.

[0034] Therefore, there is an urgent need for a trough-type device for removing crystals from robotic arm hooks. This device can remove crystals from robotic arm hooks, prevent hook jamming, reduce robotic arm basket crushing, reduce silicon wafer crushing, and reduce the failure of robotic arm basket dropping and basket crushing signals. It can also reduce the contamination of the chemical solution between tanks by the robotic arm carrying crystals, thereby reducing equipment failure rate, reducing maintenance costs, and increasing the service life of equipment components. Utility Model Content

[0035] The purpose of this disclosure is to provide a trough-type device for removing crystals from robotic arm hooks, thereby solving the problems mentioned in the background art. The trough-type device for removing crystals from robotic arm hooks provided by this disclosure has the advantages of reducing contamination of the chemical solution between tanks due to crystals carried by the robotic arm, reducing equipment failure rate, reducing maintenance costs, and increasing the service life of equipment components.

[0036] To achieve the above objectives, this disclosure provides the following technical solution: a trough-type device for removing crystals from robotic arm hooks, comprising a mounting base, on which a two-axis moving assembly for driving the cleaning tank to move in the horizontal and vertical directions is mounted, and a mounting plate is mounted on the output end of the two-axis moving assembly, and a plurality of cleaning tanks for cleaning the crystals from the robotic arm hooks are mounted on the mounting plate.

[0037] In order to clean and remove the crystals on the robotic arm hook, the cleaning tank is further filled with hot water at a temperature of 60℃-70℃.

[0038] To further facilitate the mounting of this device on the felting top plate, the mounting base is L-shaped.

[0039] To facilitate the vertical and horizontal movement of the cleaning tank, the two-axis moving assembly further includes a lifting cylinder mounted on a mounting base. A translation cylinder is connected to the output end of the lifting cylinder, and the output end of the translation cylinder is connected to the mounting plate.

[0040] To facilitate the drainage of water from the cleaning tank after cleaning is completed, a drain pipe is further connected to the bottom of the cleaning tank.

[0041] To facilitate the rapid drainage of water from all the cleaning tanks, all drain pipes are connected together via a manifold. A water outlet pipe is connected to the manifold, and a control valve is installed on the water outlet pipe.

[0042] In order to improve the efficiency of crystal removal by bubbling into the cleaning tank during the crystal removal process of the robotic arm hook, a bubbling tube is connected to the bottom of the cleaning tank, and a bubbling head is installed inside the cleaning tank at the upper end of the bubbling tube.

[0043] To connect all the bubbling tubes together for synchronized bubbling, several bubbling tubes are further connected by an air-gathering tube. One end of the air-gathering tube is a sealed structure, and the other end is an air inlet.

[0044] To ensure the cleanliness of the cleaning tank when cleaning is not required, a cover plate is provided above the cleaning tank, and the side of the cover plate is connected to the cleaning tank by hinges.

[0045] Compared with the prior art, the beneficial effects of this disclosure are:

[0046] 1. This disclosure includes a cleaning tank. When it is necessary to clean the crystals on the robotic arm hook, the two-axis moving assembly first lowers the cleaning tank to the set position, then adds hot water at 60℃-70℃ into the cleaning tank, and then the two-axis moving assembly moves the cleaning tank to the bottom of the robotic arm hook. The robotic arm then places the hook into the cleaning tank to clean the crystals.

[0047] 2. This disclosure can remove crystals on the hook of the robotic arm, avoid hook jamming, reduce the pressure on the robotic arm basket, reduce the problem of crushing silicon wafers and the failure of the robotic arm basket dropping and pressure signals, reduce the contamination of the liquid between the tanks by the robotic arm carrying crystals, reduce the equipment failure rate, reduce maintenance costs, and improve the service life of equipment components.

[0048] 3. After the robotic arm hook is cleaned, the two-axis moving assembly drives the cleaning tank to return to its original position, so as not to interfere with the normal operation of the robotic arm hook.

[0049] 4. The bottom of the cleaning tank disclosed herein is connected to a bubbling tube, and a bubbling head located at the upper end of the bubbling tube is installed inside the cleaning tank. During the crystal removal process of the robotic arm hook, bubbles are blown into the cleaning tank through the bubbling tube, thereby improving the efficiency of crystal removal.

[0050] 5. The cleaning tank of this invention is provided with a cover plate on the top. The side of the cover plate is connected to the cleaning tank by a hinge. When cleaning is not required, the cleaning tank can be covered by the cover plate to ensure the cleanliness of the cleaning tank. Attached Figure Description

[0051] Figure 1 This is a schematic diagram of the structure disclosed herein.

[0052] Figure 2 This is a schematic diagram of the cleaning tank of this disclosure.

[0053] Figure 3 This is a schematic diagram of the structure after the cover plate of this disclosure has been removed.

[0054] In the diagram: 1. Mounting base; 2. Lifting cylinder; 3. Translation cylinder; 4. Cover plate; 5. Cleaning tank; 6. Mounting plate; 7. Drain pipe; 8. Bubble pipe; 9. Water outlet pipe; 10. Manifold; 11. Air manifold. Detailed Implementation

[0055] The technical solutions of the embodiments of this disclosure will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this disclosure, and not all embodiments. Based on the embodiments of this disclosure, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of this disclosure.

[0056] In the description of this disclosure, unless otherwise expressly specified and limited, the terms "connected," "linked," and "fixed" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this disclosure based on the specific circumstances.

[0057] In this disclosure, unless otherwise expressly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature directly below or diagonally below the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0058] In the description of this disclosure, the terms "upper," "lower," "right," "left," etc., refer to the orientation or positional relationship shown in the accompanying drawings, and are used only for ease of description and simplification of operation. They do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this disclosure. Furthermore, the terms "first" and "second" are used only for descriptive distinction and have no special meaning.

[0059] Example 1

[0060] Please see Figures 1-3 This embodiment provides the following technical solution: a trough-type device for removing crystals from robotic arm hooks, including a mounting base 1, which is an L-shaped structure for mounting the device on a felting top plate. The mounting base 1 is equipped with a two-axis moving assembly for driving the cleaning tank 5 to move horizontally and vertically. A mounting plate 6 is installed on the output end of the two-axis moving assembly. A cleaning tank 5, corresponding one-to-one with the robotic arm hook, is installed on the mounting plate 6 for cleaning the robotic arm hooks for crystallization. The cleaning tank 5 is filled with hot water at a temperature of 60℃-70℃.

[0061] By adopting the above technical solution, this disclosure provides a cleaning tank 5. When it is necessary to clean the crystals on the robotic arm hook, the two-axis moving assembly first lowers the cleaning tank 5 to a set position, then adds hot water at 60℃-70℃ into the cleaning tank 5. The two-axis moving assembly then moves the cleaning tank 5 to below the robotic arm hook, and the robotic arm places the hook into the cleaning tank 5 to clean the crystals. This disclosure can remove crystals from the robotic arm hook, avoiding hook jamming, reducing robotic arm basket pressure, reducing silicon wafer crushing, and minimizing the failure of robotic arm basket loss and pressure signals. It also reduces contamination of the solution by the robotic arm carrying crystals between tanks, lowering equipment failure rates, reducing maintenance costs, and increasing the service life of equipment components. After cleaning the robotic arm hook, the two-axis moving assembly drives the cleaning tank 5 back to its original position, thus not interfering with the normal operation of the robotic arm hook.

[0062] Example 2

[0063] Please see Figures 1-3 This embodiment provides the following technical solution: a trough-type device for removing crystals from robotic arm hooks, including a mounting base 1, which is an L-shaped structure for mounting the device on a felting top plate. The mounting base 1 is equipped with a two-axis moving assembly for driving the cleaning tank 5 to move horizontally and vertically. A mounting plate 6 is installed on the output end of the two-axis moving assembly. A cleaning tank 5, corresponding one-to-one with the robotic arm hook, is installed on the mounting plate 6 for cleaning the robotic arm hooks for crystallization. The cleaning tank 5 is filled with hot water at a temperature of 60℃-70℃.

[0064] Specifically, the two-axis moving assembly includes a lifting cylinder 2, which is mounted on the mounting base 1. A translation cylinder 3 is connected to the output end of the lifting cylinder 2, and the output end of the translation cylinder 3 is connected to the mounting plate 6. Both the lifting cylinder 2 and the translation cylinder 3 are sold by Airtac.

[0065] By adopting the above technical solution, the lifting cylinder 2 drives the cleaning tank 5 to move up and down, and the translation cylinder 3 drives the cleaning tank 5 to move horizontally.

[0066] Specifically, a drain pipe 7 is connected to the bottom of the cleaning tank 5, and a control valve is installed on the drain pipe 7.

[0067] By adopting the above technical solution, water inside the cleaning tank 5 is drained after cleaning is completed.

[0068] Example 3

[0069] The difference between this embodiment and embodiment 2 is that, specifically, all the drain pipes 7 are connected by a manifold 10. A water outlet pipe 9 is connected to the manifold 10, and a control valve is installed on the water outlet pipe 9.

[0070] By adopting the above technical solution, all the drain pipes 7 are connected together through the manifold 10, which facilitates the rapid drainage of water from all the cleaning tanks 5.

[0071] Example 4

[0072] Please see Figures 1-3 This embodiment provides the following technical solution: a trough-type device for removing crystals from robotic arm hooks, including a mounting base 1, which is an L-shaped structure for mounting the device on a felting top plate. The mounting base 1 is equipped with a two-axis moving assembly for driving the cleaning tank 5 to move horizontally and vertically. A mounting plate 6 is installed on the output end of the two-axis moving assembly. A cleaning tank 5, corresponding one-to-one with the robotic arm hook, is installed on the mounting plate 6 for cleaning the robotic arm hooks for crystallization. The cleaning tank 5 is filled with hot water at a temperature of 60℃-70℃.

[0073] Specifically, the bottom of the cleaning tank 5 is connected to a bubbling tube 8, and the inside of the cleaning tank 5 is equipped with a bubbling head located at the upper end of the bubbling tube 8.

[0074] By adopting the above technical solution, during the crystal removal process of the robotic arm hook, bubbling is performed in the cleaning tank 5 through the bubbling tube 8, thereby improving the efficiency of crystal removal.

[0075] Specifically, all the bubble tubes 8 are connected by a gas manifold 11. One end of the gas manifold 11 is a sealed structure, and the other end of the gas manifold 11 is an air inlet.

[0076] By adopting the above technical solution, all the bubble tubes 8 are connected together through the air manifold 11, which facilitates synchronous bubble formation.

[0077] Example 5

[0078] Please see Figures 1-3 This embodiment provides the following technical solution: a trough-type device for removing crystals from robotic arm hooks, including a mounting base 1, which is an L-shaped structure for mounting the device on a felting top plate. The mounting base 1 is equipped with a two-axis moving assembly for driving the cleaning tank 5 to move horizontally and vertically. A mounting plate 6 is installed on the output end of the two-axis moving assembly. A cleaning tank 5, corresponding one-to-one with the robotic arm hook, is installed on the mounting plate 6 for cleaning the robotic arm hooks for crystallization. The cleaning tank 5 is filled with hot water at a temperature of 60℃-70℃.

[0079] Specifically, a cover plate 4 is provided above the cleaning tank 5, which covers all the cleaning tanks 5. The side of the cover plate 4 is connected to the cleaning tank 5 by a hinge.

[0080] By adopting the above technical solution, when cleaning is not required, the cleaning tank 5 can be covered by the cover plate 4 to ensure the cleanliness of the cleaning tank 5.

[0081] The steps involved in this disclosure are as follows:

[0082] 1. When it is necessary to clean and remove the crystals on the robotic arm hook, the lifting cylinder 2 drives the cleaning tank 5 to descend to the set position, which is confirmed during equipment debugging. Hot water at 60℃-70℃ is added to the cleaning tank 5, and then the translation cylinder 3 drives the cleaning tank 5 to move below the robotic arm hook.

[0083] 2. The robotic arm places the hook into the cleaning tank 5, and at the same time, bubbles are blown into the cleaning tank 5 through the bubble tube 8 to clean the crystals;

[0084] 3. After cleaning, the robotic arm raises the hook, the translation cylinder 3 drives the cleaning tank 5 to retract, the control valve on the water outlet pipe 9 is opened to drain the water in the cleaning tank 5, and then the cover plate 4 is put on.

[0085] 4. The lifting cylinder 2 drives the cleaning tank 5 to return to its original position, ready for the next cleaning operation.

[0086] In summary, this disclosure includes a cleaning tank 5. When cleaning crystals on the robotic arm hook is required, the two-axis moving assembly first lowers the cleaning tank 5 to a set position, then adds hot water at 60℃-70℃ into the cleaning tank 5. The two-axis moving assembly then moves the cleaning tank 5 to below the robotic arm hook, and the robotic arm places the hook into the cleaning tank 5 to clean the crystals. This disclosure can remove crystals from the robotic arm hook, preventing hook jamming, reducing robotic arm basket pressure, minimizing silicon wafer crushing, and reducing the failure of robotic arm basket loss and pressure signals. It also reduces contamination of the solution between tanks due to crystals carried by the robotic arm, lowering equipment failure rates, reducing maintenance costs, and increasing the service life of equipment components. After cleaning the robotic arm hook, the two-axis moving assembly returns the cleaning tank 5 to its original position, thus not interfering with the normal operation of the robotic arm hook. The bottom of the cleaning tank 5 disclosed herein is connected to a bubbling tube 8, and a bubbling head located at the upper end of the bubbling tube 8 is installed inside the cleaning tank 5. During the crystal removal process of the robotic arm hook, bubbles are blown into the cleaning tank 5 through the bubbling tube 8, thereby improving the efficiency of crystal removal. A cover plate 4 is provided on the top of the cleaning tank 5, and the side of the cover plate 4 is connected to the cleaning tank 5 by a hinge. When cleaning is not required, the cover plate 4 can be used to cover the cleaning tank 5 to ensure the cleanliness of the cleaning tank 5.

[0087] Although embodiments of the present disclosure have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present disclosure, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A device for removing crystallization from a hook of a slot removal robot arm, characterized by: It includes a mounting base, on which a two-axis moving assembly is installed to drive the cleaning tank to move horizontally and vertically. A mounting plate is installed on the output end of the two-axis moving assembly, and several cleaning tanks for crystallizing and cleaning the robotic arm hook are installed on the mounting plate.

2. The device for removing crystals from a robotic arm hook according to claim 1, characterized in that: The cleaning tank is filled with hot water at a temperature of 60℃-70℃.

3. The device for removing crystals from a robotic arm hook using a trough-type method according to claim 1, characterized in that: The mounting base has an L-shaped structure.

4. The device for removing crystals from a robotic arm hook using a trough-type structure according to claim 1, characterized in that: The two-axis moving assembly includes a lifting cylinder, which is mounted on a mounting base. A translation cylinder is connected to the output end of the lifting cylinder, and the output end of the translation cylinder is connected to the mounting plate.

5. The device for removing crystals from a robotic arm hook according to claim 1, characterized in that: A drain pipe is connected to the bottom of the cleaning tank.

6. The device for removing crystals from a robotic arm hook using a trough-type method according to claim 5, characterized in that: Several of the drain pipes are connected by a manifold.

7. The device for removing crystals from a robotic arm hook using a trough-type structure according to claim 6, characterized in that: The manifold is connected to a water outlet pipe, and a control valve is installed on the water outlet pipe.

8. The device for removing crystals from a robotic arm hook using a trough-type structure according to claim 1, characterized in that: The bottom of the cleaning tank is connected to a bubbling tube, and a bubbling head located at the upper end of the bubbling tube is installed inside the cleaning tank.

9. The device for removing crystals from a robotic arm hook according to claim 8, characterized in that: Several of the bubble tubes are connected by an air-gathering pipe, one end of which is a sealed structure and the other end of which is an air inlet.

10. The device for removing crystals from a robotic arm hook according to claim 1, characterized in that: The cleaning tank is equipped with a cover plate on top, and the side of the cover plate is connected to the cleaning tank by a hinge.

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