A carrier and optical inspection device for testing the surface of epitaxial wafers.
By designing a carrier with adjustable limiting structure and hollow structure, the problem of unstable epitaxial wafer fixation was solved, enabling high-precision testing and low-cost production, and improving the accuracy and efficiency of test results.
Patent Information
- Application Number
- CN202522621904.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-12-10
- Publication Date
- 2026-11-06
- Estimated Expiration
- 2035-12-10
AI Technical Summary
In the prior art, the epitaxial wafer is unstable during the testing process, resulting in poor accuracy and repeatability of the test results, and it is difficult to be compatible with epitaxial wafers of different sizes.
A carrier was designed, including a base and an adjustable limiting structure. The adjustable limiting structure is set on both sides of the fixing groove, and high-precision fixing is achieved in conjunction with the limiting component to adapt to epitaxial sheets of different sizes. A hollow structure is set at the bottom of the base to reduce dust interference, and PTFE material is used to reduce the risk of pollution.
This technology enables high-precision and reliable fixation of epitaxial wafers, improves the repeatability and accuracy of testing, reduces production costs, enhances the compatibility and ease of operation of the carrier, and reduces the risk of testing errors and sample damage.
Smart Images

Figure CN224939861U_ABST
Abstract
Description
Technical Field
[0001] This utility model belongs to the field of semiconductor testing tooling technology, specifically relating to a carrier and optical inspection equipment for testing the surface of epitaxial wafers. Background Technology
[0002] Mercury cadmium telluride (HgTeCd) is an ideal material for infrared detectors due to its tunable bandgap. Accurate characterization of its surface flatness is crucial for controlling material uniformity and obtaining high-performance HgTeCd epitaxial wafers. White light profilometers are commonly used to test the surface morphology of epitaxial wafers; however, in practice, how to fix the epitaxial wafer to ensure its stability and accuracy during testing remains a challenge.
[0003] Currently, the following methods are commonly used for fixing the epitaxial wafer: 1) Manual fixing: Relying on manual operation, the epitaxial wafer is fixed to the test platform using a clamping device or directly by hand. This method is prone to problems such as inaccurate positioning, movement, or tilting of the epitaxial wafer, affecting the accuracy and repeatability of the test results. 2) Simple clamps: Traditional mechanical clamps are used to fix the epitaxial wafer to the platform. Although this method provides a certain degree of fixation, it is easily affected by external vibration, thermal stress, or operational errors, leading to instability of the epitaxial wafer and poor repeatability of the test results. 3) Fixed base: Some existing devices use fixed bases to maintain the stability of the epitaxial wafer, but the dimensions of these bases are usually fixed, which is not suitable for epitaxial wafers of different thicknesses or sizes, and the fixing effect and positioning accuracy are low, affecting the accuracy of the test. Utility Model Content
[0004] In order to overcome the shortcomings of the existing technology, the purpose of this utility model is to provide a carrier and optical inspection equipment for epitaxial wafer surface testing, which can achieve high-precision and reliable fixation of epitaxial wafers, improve the repeatability and accuracy of testing, and at the same time be compatible with multi-specification samples and reduce production costs.
[0005] To achieve the above objectives, the technical solution of this utility model is a carrier for testing the surface of an epitaxial wafer, including a base. A fixing groove for accommodating and supporting the epitaxial wafer is provided on the top surface of the base. The fixing groove has adjacent first groove walls and second groove walls. Adjustable limiting structures are provided on the top surface of the base at positions located on one side of the first groove wall and on one side of the second groove wall. The installation position of the adjustable limiting structures on the base is adjustable and at least partially extends into the fixing groove.
[0006] As one embodiment, the adjustable limiting structure includes a slide groove and a limiting component. The slide groove is arranged parallel to the first groove wall or the second groove wall on one side. One end of the limiting component is slidably installed on the slide groove, and the other end extends into the fixed groove.
[0007] As one embodiment, the limiting component is a limiting block component, including a slider and a limiting block for limiting the extension piece from the side. The slider is slidably installed in the slide groove; one end of the limiting block is installed on the slider, and the other end extends into the fixing groove.
[0008] As one embodiment, the limiting component is an elastic pressure plate component, including a slider and an elastic pressure plate for limiting the outer extension sheet from above. The slider is slidably installed in the slide groove; one end of the elastic pressure plate is installed on the slider, and the other end extends into the fixing groove.
[0009] As one embodiment, a pick-and-place groove for picking up and placing the extension sheet is provided on one side of the fixing groove. The pick-and-place groove is located on the opposite side of the first groove wall or the second groove wall and is connected to the fixing groove.
[0010] As one embodiment, the bottom of the pick-and-place groove is arranged to slope downwards from the bottom of the fixing groove to the side away from the fixing groove.
[0011] As one implementation method, the bottom of the base is provided with a hollow structure.
[0012] As one embodiment, a gasket is provided at the bottom of the fixing groove.
[0013] As one embodiment, the top surface of the base is provided with a plurality of fixing grooves arranged at intervals.
[0014] This utility model also provides an optical inspection device for testing the surface of an epitaxial wafer, including a base, a carrier disposed on the base, and an optical inspection mechanism disposed above the carrier, wherein the carrier is any one of the carriers described above.
[0015] Compared with the prior art, the beneficial effects of this utility model are as follows:
[0016] (1) This utility model provides an adjustable limiting structure on one side of the first groove wall and one side of the second groove wall of the fixing groove, which cooperates with one side of the first groove wall and the second groove wall to achieve high precision and reliable fixing of the epitaxial wafer, ensuring that the epitaxial wafer does not shift or deform during the test, improving the fixing effect, avoiding the instability in traditional technology, reducing the possible errors during the test, and improving the repeatability and accuracy of the test. At the same time, the position of the adjustable limiting structure is adjustable, which can be adapted to the fixing of epitaxial wafers of different sizes, greatly improving the compatibility of the carrier and reducing the production cost.
[0017] (2) This utility model provides a pick-and-place groove on one side of the fixed groove to facilitate the loading and unloading of the epitaxial wafer in conjunction with the shovel tool, thereby reducing the risk of damage during the pick-and-place process of the epitaxial wafer and improving the convenience of operation.
[0018] (3) This utility model adopts a multi-station design. By setting multiple fixing slots, multiple epitaxial wafers can be fixed at the same time. In the same test process, multiple epitaxial wafers can be quickly switched and tested, which significantly improves the test efficiency.
[0019] (4) By setting a hollow structure at the bottom of the base, this utility model can reduce the interference of dust on optical measurement and improve the test accuracy. Attached Figure Description
[0020] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0021] Figure 1 A perspective view of a carrier for epitaxial wafer surface testing provided in an embodiment of this utility model;
[0022] Figure 2 A top view of a carrier for epitaxial wafer surface testing provided in an embodiment of this utility model;
[0023] Figure 3 A side view of a carrier for epitaxial wafer surface testing provided in an embodiment of this utility model;
[0024] In the diagram: 1. Base; 2. Fixing groove; 3. Picking and placing groove; 4. Limiting component; 5. Sliding groove; 6. Hollow structure. Detailed Implementation
[0025] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of the present utility model.
[0026] In the description of this utility model, it should be understood that the terms "center", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model.
[0027] The terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature; in the description of this utility model, unless otherwise stated, "a plurality of" means two or more.
[0028] like Figures 1-3 As shown, this embodiment provides a carrier for testing the surface of an epitaxial wafer, including a base 1. A fixing groove 2 for accommodating and supporting the epitaxial wafer is provided on the top surface of the base 1. The fixing groove 2 has adjacent first groove walls and second groove walls. Adjustable limiting structures are provided on the top surface of the base 1 at positions located on one side of the first groove wall and on one side of the second groove wall. The installation position of the adjustable limiting structures on the base 1 is adjustable and at least partially extends into the fixing groove 2. This embodiment achieves high-precision and reliable fixing of the epitaxial wafer by providing adjustable limiting structures on one side of the first groove wall and one side of the second groove wall of the fixing groove 2, cooperating with the first and second groove walls. This ensures that the epitaxial wafer does not shift or deform during testing, improves the fixing effect, avoids the instability of traditional technologies, reduces possible errors during testing, and improves the repeatability and accuracy of the test. Furthermore, the adjustable limiting structure's position is adjustable, allowing for the fixing of epitaxial wafers of different sizes, greatly improving the utilization rate of the carrier.
[0029] In this embodiment, the size of the fixing groove 2 is larger than the maximum size of the series of epitaxial wafers to be tested. In one embodiment, the fixing groove 2 is square, used to accommodate and support the square epitaxial wafer. Adjustable limiting structures on one side of the first groove wall and on one side of the second groove wall cooperate with the first and second groove walls to achieve high-precision and reliable fixing of the square epitaxial wafer. Specific dimensions of the square epitaxial wafer include, but are not limited to, 3cm×2cm, 4cm×3cm, 5cm×4cm, and 6cm×5cm.
[0030] Furthermore, the adjustable limiting structure includes a sliding groove 5 and a limiting component 4. The sliding groove 5 is arranged parallel to the first groove wall or the second groove wall on one side of it. One end of the limiting component 4 is slidably mounted on the sliding groove 5, and the other end extends into the fixed groove 2. Figure 1 As shown, the sliding groove 5 on the outer side of the first groove wall is close to and parallel to the first groove wall, and the sliding groove 5 on the outer side of the second groove wall is close to and parallel to the second groove wall. Before placing the epitaxial sheet, the limiting blocks on one side of the first and second groove walls are moved along the corresponding sliding grooves 5 to the end away from the connection between the first and second groove walls. Then, the epitaxial sheet is placed. When the adjacent first and second sides of the epitaxial sheet are respectively attached to the first and second groove walls, the limiting components 4 on one side of the first and second groove walls are moved from the end away from the connection between the first and second groove walls along the corresponding sliding grooves 5 to the end close to the connection between the first and second groove walls, until the limiting components 4 on both sides abut or press against the epitaxial sheet. The limiting components 4 are adjusted in position along the sliding grooves 5 according to the size of the epitaxial sheet, thereby achieving high-precision and reliable fixing of epitaxial sheets of different sizes, with strong adaptability.
[0031] In some embodiments, the limiting component 4 is a limiting block component, including a slider and a limiting block. The slider is slidably mounted on the groove 5, and one end of the limiting block is mounted on the slider, while the other end extends into the fixing groove 2. When the adjacent first and second sides of the epitaxial wafer are respectively attached to the first and second groove walls, the limiting block abuts against the other adjacent third and fourth sides of the epitaxial wafer. This surface contact method achieves limiting constraint on the epitaxial wafer, avoiding point stress concentration and reducing the potential risk of damage to the surface of the mercury cadmium telluride material.
[0032] In other embodiments, the limiting component 4 is an elastic pressure plate assembly, including a slider and an elastic pressure plate. The slider is slidably mounted on the groove 5, and one end of the elastic pressure plate is mounted on the slider, while the other end extends into the fixing groove 2. When the adjacent first and second sides of the epitaxial wafer are respectively fitted against the first and second groove walls, the elastic pressure plate presses the ends of the first and second sides of the epitaxial wafer away from the connection between the first and second groove walls, thereby achieving flexible limiting of the epitaxial wafer and reducing the risk of damage to the epitaxial wafer under force. Preferably, the elastic pressure plate is made of polyimide, silicone rubber, or other low-hardness materials, which will not cause damage to the epitaxial wafer.
[0033] In some embodiments, the groove 5 on one side of the first groove wall is connected to the groove 5 on one side of the second groove wall. For example... Figure 1 As shown, the sliding groove 5 on one side of the first groove wall and the sliding groove 5 on one side of the second groove wall are connected on the outside of the connection between the first groove wall and the second groove wall.
[0034] In an optimized embodiment, a loading / unloading groove 3 for loading and unloading epitaxial wafers is provided on one side of the fixing groove 2. The loading / unloading groove 3 is located on the opposite side of the first or second groove wall and communicates with the fixing groove 2. By providing the loading / unloading groove 3 on one side of the fixing groove 2, it facilitates the loading and unloading of epitaxial wafers in conjunction with a scraper tool. This embodiment allows for the placement of epitaxial wafers using only a scraper tool, simplifying the operation.
[0035] Preferably, the bottom of the pick-and-place groove 3 is arranged at an angle downwards from the bottom of the fixing groove 2 to the side away from the fixing groove 2. Because the bottom of the pick-and-place groove 3 has a guide angle, in conjunction with the scraper tool, it enables safe pick-and-place of the epitaxial wafer without direct contact with the surface of the epitaxial wafer, reducing the risk of damage from manual operation. Furthermore, by inserting the scraper tool into the pick-and-place groove 3 to pick up and place the epitaxial wafer, slippage can be prevented.
[0036] In some embodiments, a perforated structure 6 is provided at the bottom of the base 1. By providing the perforated structure 6 at the bottom of the base 1, interference from particulate contamination on the test optical path can be reduced, improving the accuracy of the test results. Furthermore, the perforated structure 6 includes regularly spaced openings on the bottom surface and side surface of the base 1, with the regularly spaced openings located below the fixing groove 2. By employing regularly spaced openings to achieve dust removal, the accumulation of particles inside the device is reduced, thereby improving the cleanliness of the epitaxial wafer surface and ensuring the accuracy and repeatability of the surface profile test data. Figure 1 As shown, the base 1 has regular openings on its side. The regular openings on the bottom surface of the base 1 can be open structures, and the regular openings on the side can communicate with the regular openings on the bottom surface.
[0037] In some embodiments, a gasket is provided at the bottom of the fixing groove 2. The fixing groove 2 in this embodiment is suitable for epitaxial wafers with a certain thickness. When the epitaxial wafer is a fragile ultrathin epitaxial wafer, a gasket can be provided at the bottom of the fixing groove 2, and then the ultrathin epitaxial wafer can be placed on the gasket to ensure reliable fixing of the epitaxial wafer.
[0038] Preferably, the base 1 is made of polytetrafluoroethylene (PTFE). In this embodiment, the base 1 is made of PTFE. Since PTFE itself does not release metal ions and is almost unaffected by all strong acids, strong alkalis, strong oxidants, and organic solvents, it will not react with mercury cadmium telluride or cleaning agents it may come into contact with, achieving ultra-low pollution and ensuring long-term stability and durability. Furthermore, PTFE has a low coefficient of friction, which can avoid mechanical damage to the surface of the mercury cadmium telluride epitaxial wafer, thereby ensuring the reliability of the test. At the same time, PTFE has extremely low surface energy, making it difficult for the mercury cadmium telluride sample to adhere to the tooling during placement and handling, greatly reducing the risk of sample breakage or damage due to adhesion during wafer handling, and also greatly reducing the possibility of residual particles or contaminants on the sample surface, ensuring the accuracy of the test results.
[0039] In some embodiments, a plurality of fixing slots 2 are provided on the top surface of the base 1 at intervals. This embodiment adopts a multi-station design. By setting multiple fixing slots 2, multiple epitaxial wafers can be fixed simultaneously, and multiple epitaxial wafers can be quickly switched and tested in the same test process, which significantly improves test efficiency.
[0040] In one embodiment, such as Figure 1 As shown, the carrier adopts a dual-station design, with two fixing slots 2 arranged side by side on the top surface of the base 1, which can fix two epitaxial wafers at the same time, enabling rapid switching and testing of the two epitaxial wafers in the same test process, significantly improving test efficiency.
[0041] Preferably, the plurality of fixing slots 2 are arranged side by side and / or parallel, and the sliding grooves 5 on one side of the plurality of fixing slots 2 arranged side by side or parallel are connected. For example Figure 1 As shown, the sliding grooves 5 on the same side of the two fixed grooves 2 are connected.
[0042] The carrier in this embodiment effectively reduces testing errors caused by epitaxial wafer movement or uneven stress, and reduces sample surface contamination, thereby improving the accuracy and reliability of test results. The base in this embodiment is made of PTFE material. Because PTFE material has excellent chemical inertness, a low coefficient of friction, and extremely low surface energy, it can remain stable under high humidity, acid / alkali, or long-term testing environments, avoiding contamination or mechanical damage to the surface of the mercury cadmium telluride epitaxial wafer, thus ensuring the accuracy and reliability of the test.
[0043] This embodiment also provides an optical inspection device for testing the surface of an epitaxial wafer, including a base, a carrier disposed on the base, and an optical inspection mechanism disposed above the carrier, wherein the carrier is any of the carriers described above. In this embodiment, the optical inspection device includes an optical profilometer, a microscope, etc.
[0044] The above description is only a preferred embodiment of the present utility model and is not intended to limit the present utility model. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present utility model should be included within the protection scope of the present utility model.
Claims
1. A carrier for epiwafer surface testing comprising a base, characterised in that: The top surface of the base is provided with a fixing groove for accommodating and supporting the epitaxial wafer. The fixing groove has an adjacent first groove wall and a second groove wall. Adjustable limiting structures are provided on the top surface of the base at positions located on one side of the first groove wall and on one side of the second groove wall. The installation position of the adjustable limiting structures on the base is adjustable and at least partially extends into the fixing groove.
2. The carrier of claim 1, wherein: The adjustable limiting structure includes a slide groove and a limiting component. The slide groove is arranged parallel to the first groove wall or the second groove wall on one side. One end of the limiting component is slidably installed on the slide groove, and the other end extends into the fixed groove.
3. The carrier of claim 2, wherein: The limiting component is a limiting block component, including a slider and a limiting block for limiting the extension piece from the side. The slider is slidably installed in the slide groove; one end of the limiting block is installed on the slider, and the other end extends into the fixing groove.
4. The carrier of claim 2, wherein: The limiting component is an elastic pressure plate component, including a slider and an elastic pressure plate for limiting the outer extension sheet from above. The slider is slidably installed in the slide groove; one end of the elastic pressure plate is installed on the slider, and the other end extends into the fixing groove.
5. The carrier of claim 1, wherein: A pick-and-place groove for picking up and placing the extension sheet is provided on one side of the fixing groove. The pick-and-place groove is located on the opposite side of the first groove wall or the second groove wall and is connected to the fixing groove.
6. The carrier of claim 5, wherein: The bottom of the pick-and-place groove is arranged to slope downwards from the bottom of the fixed groove to the side away from the fixed groove.
7. The carrier of claim 1, wherein: The bottom of the base has a hollow structure.
8. The carrier of claim 1, wherein: A gasket is provided at the bottom of the fixing groove.
9. The carrier of any one of claims 1-8, wherein: The top surface of the base is provided with a plurality of fixing grooves arranged at intervals.
10. An optical inspection device for testing the surface of an epitaxial wafer, comprising a base, a carrier disposed on the base, and an optical inspection mechanism disposed above the carrier, characterized in that: The vehicle is the vehicle described in any one of claims 1-9.
