A process cavity wafer fork test fixture
By designing a wafer fork test fixture for the process cavity, the problem of difficulty in observing the height of the spindle fork was solved, enabling precise adjustment and efficient positioning confirmation, thereby improving the operational accuracy and efficiency of semiconductor processing.
Patent Information
- Application Number
- CN202522729256.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-12-23
- Publication Date
- 2026-11-06
- Estimated Expiration
- 2035-12-23
AI Technical Summary
In a multi-station mobile wafer loading and unloading mode, the height adjustment of the spindle fork is difficult to observe from the side of the chamber, making it difficult to determine whether it meets the design specifications.
A process cavity wafer fork test fixture is designed, including a first positioning block, a second positioning block, and a support structure. A measurement area is formed to facilitate the detection of the top surface height of the spindle fork. The support structure provides a positioning reference for the heater. The operator can confirm whether the height meets the standard by the contact between the spindle fork and the positioning block.
The process of adjusting the spindle fork height has been simplified, ensuring that it meets design specifications and improving operational accuracy and efficiency.
Smart Images
Figure CN224945376U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of semiconductor equipment technology, and in particular to a process cavity wafer fork test fixture. Background Technology
[0002] To improve the processing efficiency of semiconductor chambers, a multi-station flow-through wafer pick-and-place mode is typically used. For this mode, the most common process is as follows: a robotic arm transfers the wafer to a process chamber equipped with heaters and a spindle fork; the spindle fork then picks up the wafer from the robotic arm and transfers it to the heater.
[0003] To ensure the accuracy of subsequent operations, the positional precision of the spindle fork is extremely critical, and its initial height must meet design specifications. However, to maintain overall accuracy, the spindle fork can only be adjusted after being assembled into the process chamber. In this case, its position can only be observed from above the chamber; observing subtle differences in the spindle fork's height from the side becomes impractical, making it extremely difficult to determine whether its height meets the standard. Summary of the Invention
[0004] This invention provides a process cavity wafer fork test fixture to overcome the above-mentioned problems.
[0005] To achieve the above objectives, the technical solution of this utility model is as follows: A process cavity wafer fork test fixture includes a first positioning block, a second positioning block and a support structure arranged in sequence. The bottom of the first positioning block is provided with a first positioning surface, and the bottom of the second positioning block is provided with a second positioning surface. The plane where the first positioning surface is located is higher than the plane where the second positioning surface is located. A measurement area for detecting the height of the top surface of the spindle fork is formed between the plane where the first positioning surface is located and the plane where the second positioning surface is located. When the support structure is placed on the top surface of the heater, the height of the spindle fork located within the measurement area conforms to the design specifications.
[0006] Furthermore, the support structure is an extension rod, one end of which is located at the end of the second positioning block away from the first positioning block, and the bottom of the extension rod is provided with a reference plane for placing on the top surface of the heater.
[0007] Furthermore, it also includes a handle, which is located at the end of the first positioning block away from the second positioning block.
[0008] Furthermore, the first positioning block, the second positioning block, and the support structure are integrally formed.
[0009] Furthermore, both the first positioning block and the second positioning block are provided with rounded corners.
[0010] Beneficial effects: This utility model provides a process cavity wafer fork test fixture, which provides a positioning reference for the first positioning block and the second positioning block through a support structure placed on the top surface of the heater. The plane where the first positioning surface of the first positioning block is located and the plane where the second positioning surface of the second positioning block is located form a measurement area. The height of the spindle fork on the top surface within the measurement area conforms to the predetermined design specifications. The operator only needs to check whether the height meets the standard by whether the spindle fork is in contact with the first positioning block and the second positioning block. Attached Figure Description
[0011] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0012] Figure 1 This is a schematic diagram of the structure of a process cavity wafer fork test fixture disclosed in this utility model; Figure 2 This is a front view schematic diagram of a process cavity wafer fork test fixture disclosed in this utility model; Figure 3 This is a schematic diagram of the structure of a process cavity wafer fork test fixture for use in a process cavity, as disclosed in this utility model. Figure 4 This is a top view schematic diagram of a process cavity wafer fork test fixture disclosed in this utility model for use in a process cavity; Figure 5 for Figure 4 CC cross-sectional view.
[0013] In the picture: 1. First positioning block; 11. First positioning surface; 2. Second positioning block; 21. Second positioning surface; 3. Extension rod; 31. Reference plane; 4. Handle; 5. Round the corners; A. Spindle fork; B. Heater. Detailed Implementation
[0014] To make the objectives, technical solutions, and advantages of the embodiments of this utility model clearer, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this utility model, not all embodiments. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of this utility model.
[0015] This embodiment provides a process cavity wafer fork test fixture, such as Figure 1 and Figure 2 As shown, it includes a first positioning block 1, a second positioning block 2 and a support structure arranged in sequence. The bottom of the first positioning block 1 is provided with a first positioning surface 11, and the bottom of the second positioning block 2 is provided with a second positioning surface 21. The plane where the first positioning surface 11 is located is higher than the plane where the second positioning surface 21 is located. A measurement area for detecting the height of the top surface of the spindle fork A is formed between the plane where the first positioning surface 11 is located and the plane where the second positioning surface 21 is located. When the support structure is placed on the top surface of heater B, the height of the spindle fork A, located within the measurement area, conforms to the design specifications.
[0016] This embodiment provides a process cavity wafer fork test fixture, such as Figures 3 to 5 As shown, the support structure placed on the top surface of heater B provides a positioning reference for the first positioning block 1 and the second positioning block 2. The plane where the first positioning surface 11 of the first positioning block 1 is located and the plane where the second positioning surface 21 of the second positioning block 2 is located form a measurement area, so that the height of the spindle fork A on the top surface within the measurement area meets the predetermined design specifications. It is only necessary to confirm whether the height meets the standard by whether the spindle fork A is in contact with the first positioning block 1 and the second positioning block 2.
[0017] Specifically, such as Figure 1 and Figure 2 As shown, the support structure is an extension rod 3. One end of the extension rod 3 is located at the end of the second positioning block 2 away from the first positioning block 1. The bottom of the extension rod 3 is provided with a reference plane 31 for placing on the top surface of the heater B.
[0018] In actual use, the operator places the extension rod 3 on the top surface of the heater B, and then moves the extension rod 3 radially along the heater B so that the first positioning block 1 and the second positioning block 2 are close to the spindle fork A. When the first positioning block 1 can pass over the spindle fork A and the second positioning block 2 abuts against the side of the spindle fork A, it means that the height of the spindle fork A meets the standard. If the above requirements cannot be met, the height of the spindle fork A needs to be adjusted until it meets the standard.
[0019] Preferably, such as Figure 1 and Figure 2As shown, it also includes a handle 4, which is disposed at the end of the first positioning block 1 away from the second positioning block 2; Simply relying on the extension rod 3 to adjust the position of the fixture is prone to displacement. By adding the handle 4, the operator can adjust the position of the fixture with both hands without touching the first positioning block 1 and the second positioning block 2 which have precision.
[0020] Preferably, the first positioning block 1, the second positioning block 2, the extension rod 3, and the handle 4 are integrally formed to avoid the cumulative error caused by segmented splicing affecting the measurement effect.
[0021] Preferably, such as Figure 2 As shown, both the first positioning block 1 and the second positioning block 2 are provided with rounded corners 5 to prevent the spindle fork A and the heater B from being scratched.
[0022] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of this utility model, and are not intended to limit it. Although the utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features therein. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this utility model.
Claims
1. A process cavity wafer fork test fixture, characterized in that, It includes a first positioning block (1), a second positioning block (2) and a support structure arranged in sequence. The bottom of the first positioning block (1) is provided with a first positioning surface (11), and the bottom of the second positioning block (2) is provided with a second positioning surface (21). The plane where the first positioning surface (11) is located is higher than the plane where the second positioning surface (21) is located. A measurement area for detecting the height of the top surface of the spindle fork (A) is formed between the plane where the first positioning surface (11) is located and the plane where the second positioning surface (21) is located. When the support structure is placed on the top surface of the heater (B), the height of the spindle fork (A) located within the measurement area conforms to the design specifications.
2. The process cavity wafer fork test fixture according to claim 1, characterized in that, The support structure is an extension rod (3), one end of which is located at the end of the second positioning block (2) away from the first positioning block (1), and the bottom of the extension rod (3) is provided with a reference plane (31) for placing on the top surface of the heater (B).
3. The process cavity wafer fork test fixture according to claim 2, characterized in that, It also includes a handle (4), which is located at one end of the first positioning block (1) away from the second positioning block (2).
4. The process cavity wafer fork test fixture according to claim 1, characterized in that, The first positioning block (1), the second positioning block (2), and the support structure are integrally formed.
5. The process cavity wafer fork test fixture according to claim 1, characterized in that, Both the first positioning block (1) and the second positioning block (2) are provided with rounded corners (5).