A uniformly covered film structure

Abstract

This utility model discloses a uniformly covered film structure, including a film body with multiple area blocks and dividing lines between adjacent area blocks. Each area block includes an outer frame and multiple interlaced horizontal and vertical lines within the outer frame. The difference from existing designs lies in the fact that, because each area block has a predetermined difference in size and shape, the interlaced horizontal and vertical lines within the area blocks allow the exposure machine to develop the non-area block portions (i.e., form a corrosion-resistant layer on the non-developed portions) on the photosensitive material of the metal sheet through the area blocks and the interlaced horizontal and vertical lines. This satisfies the requirements of the next etching process. Furthermore, the interlaced horizontal and vertical lines ensure more uniform etching on the metal sheet, avoiding the uneven etching caused by large etching materials and areas, which is common in existing block etching methods, thus improving etching stability.

Description

Technical Field

[0001] This utility model relates to the field of film processing mechanisms, and in particular to a uniformly covered film structure. Background Technology

[0002] In existing metal sheet forming processes, the precision of mesh forming is generally achieved through precision engraving. However, when the inner diameter of the holes is small and the number of mesh holes is large, the processing time and the defect rate also increase, seriously affecting production stability and processing efficiency.

[0003] Especially when processing non-standard meshes, the defect rate is high when the size of each mesh is inconsistent, regardless of whether film processing or fine engraving is used. Utility Model Content

[0004] The main purpose of this invention is to propose a uniformly covered film structure, which aims to improve the existing metal mesh forming structure. By improving the structure of the film, the forming of non-standard holes can be made consistent, thereby improving the processing qualification rate.

[0005] To achieve the above objectives, this utility model proposes a uniformly covered film structure, comprising: The film body is provided with multiple area blocks, and there are dividing lines between adjacent area blocks; The region module includes an outer frame and multiple interlaced horizontal and vertical lines within the outer frame.

[0006] The difference from existing designs lies in the fact that, because each area has a certain difference in size and shape, the area is defined by intersecting horizontal and vertical lines within it. On the photosensitive material of the metal sheet, after the exposure machine and the film substrate are in conjunction, the non-developed areas are developed (i.e., the non-developed areas form a corrosion-resistant layer), thus meeting the requirements of the next etching process. By using interlaced horizontal and vertical lines, the etching process can achieve more uniform etching on the metal sheet, avoiding the uneven etching caused by the etching material and the large etching area, which is common in existing block etching methods. This improves the stability of the etching process. This can be understood as previously placing a piece of etching solution in a region, so the etching solution reacts as a whole; By using horizontal and vertical lines, the etching solution slowly etches from the horizontal and vertical lines, gradually corroding the micro-development blocks between them. This reduces the reaction rate, thereby ensuring the consistency of pore positions and preventing excessive corrosion.

[0007] That is, each area block has a different area, but the etching time is not consistent. Therefore, by designing micro-development blocks, the etching time of each area block can be made more consistent.

[0008] This design serves as a good reference model for precision machining, which helps improve the stability of metal processing. Attached Figure Description

[0009] Figure 1 This is a schematic diagram of a film slide magnified during low-magnification microscopy. Figure 2 This is a schematic diagram of a film slide magnified during high-magnification microscopy. Figure 3 This is a product illustration.

[0010] In the picture, 1 represents a region module, 10 represents a dividing line, 11 represents a vertical line, and 12 represents a horizontal line. 21 is a micro-developing block, and 22 is a fibrous developing block. 3 represents the product, 30 represents the stem, and 31 represents the mesh size. Detailed Implementation

[0011] The technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this utility model, and not all of them. Based on the embodiments of this utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of this utility model.

[0012] It should be noted that if any directional indication (such as up, down, left, right, front, back, top, bottom, inside, outside, vertical, horizontal, longitudinal, counterclockwise, clockwise, circumferential, radial, axial, etc.) is involved in the embodiments of this utility model, the directional indication is only used to explain the relative positional relationship and movement of each component in a certain specific posture (as shown in the figure). If the specific posture changes, the directional indication will also change accordingly.

[0013] Furthermore, if the embodiments of this utility model involve descriptions such as "first" or "second," such descriptions are for descriptive purposes only and should not be construed as indicating or implying their relative importance or implicitly specifying the number of technical features indicated. Therefore, features defined with "first" or "second" may explicitly or implicitly include at least one of those features. Additionally, the technical solutions of the various embodiments can be combined with each other, but this must be based on the ability of those skilled in the art to implement them. When the combination of technical solutions is contradictory or impossible to implement, such a combination of technical solutions should be considered non-existent and not within the scope of protection claimed by this utility model.

[0014] like Figures 1 to 3 As shown, a uniformly covered film structure includes: The film body is provided with multiple area blocks, and there are dividing lines between adjacent area blocks; The region module includes an outer frame and multiple interlaced horizontal and vertical lines within the outer frame.

[0015] The difference from existing designs lies in the fact that, because each area has a certain difference in size and shape, the area is defined by intersecting horizontal and vertical lines within it. On the photosensitive material of the metal sheet, after the exposure machine and the film substrate are in conjunction, the non-developed areas are developed (i.e., the non-developed areas form a corrosion-resistant layer), thus meeting the requirements of the next etching process. By using interlaced horizontal and vertical lines, the etching process can achieve more uniform etching on the metal sheet, avoiding the uneven etching caused by the etching material and the large etching area, which is common in existing block etching methods. This improves the stability of the etching process. This can be understood as previously placing a piece of etching solution in a region, so the etching solution reacts as a whole; By using horizontal and vertical lines, the etching solution slowly etches from the horizontal and vertical lines, gradually corroding the micro-development blocks between them. This reduces the reaction rate, thereby ensuring the consistency of pore positions and preventing excessive corrosion.

[0016] That is, each area block has a different area, but the etching time is not consistent. Therefore, by designing micro-development blocks, the etching time of each area block can be made more consistent.

[0017] Specifically, the horizontal and vertical lines form a micro-developing block, which in turn forms a corrosion-resistant layer.

[0018] In this embodiment of the invention, the micro-developing block is rhomboid or triangular in shape.

[0019] Specifically, the horizontal and vertical lines have the same width.

[0020] In this embodiment of the invention, a developing strip is provided between the area blocks. In actual design, the film consists of two sides, a front side and a back side, so a developing strip can be provided on one side and not on the other side.

[0021] Specifically, the film body includes a front film body and a back film body, and the back film body is provided with the filament developing strip.

[0022] In this embodiment of the invention, when the two sides of the metal sheet are respectively attached to the front film body and the back film body, The metal plate is placed in the exposure machine, and the wall of the metal plate is coated with photosensitive ink. The photosensitive ink forms an anti-corrosion protective layer on the dividing line, the micro developing block and the filament developing strip.

[0023] in Figure 1 This is an enlarged schematic diagram of the reverse side of the film body, where the wire developing block is used to form a wire anti-corrosion protective layer on the other side of the stainless steel plate, so the other side of the mask is a smooth surface; Figure 2 This is a magnified view of the front of the film, mainly used for processing the inner side of the product; it is actually an etched surface.

[0024] The width of the longitudinal and transverse lines is 0.06mm-0.1mm.

[0025] The above description is only a preferred embodiment of the present utility model and does not limit the patent scope of the present utility model. All equivalent structural transformations made under the inventive concept of the present utility model using the contents of the present utility model specification and drawings, or direct / indirect applications in other related technical fields, are included within the patent protection scope of the present utility model.

Claims

1. A uniformly covered film structure, characterized in that, include: The film body is provided with multiple area blocks, and there are dividing lines between adjacent area blocks; The region module includes an outer frame and multiple interlaced horizontal and vertical lines within the outer frame.

2. The uniformly covered film structure as described in claim 1, characterized in that: The horizontal and vertical lines form a micro-developing block.

3. The uniformly covered film structure as described in claim 2, characterized in that: The micro-developing blocks are rhomboid or triangular in shape.

4. The uniformly covered film structure as described in claim 1, characterized in that: The horizontal and vertical lines have the same width.

5. The uniformly covered film structure as described in claim 1, characterized in that: The regions are separated by filament development strips.

6. The uniformly covered film structure as described in claim 5, characterized in that: The film body includes a front film body and a back film body, and the back film body is provided with the filament developing strip.

7. The uniformly covered film structure as described in claim 6, characterized in that: When the two sides of the metal sheet are respectively attached to the front film body and the back film body. The metal plate is placed in the exposure machine, and the wall of the metal plate is coated with photosensitive ink. The photosensitive ink forms an anti-corrosion protective layer on the dividing line, the micro developing block and the filament developing strip.

8. The uniformly covered film structure as described in claim 3, characterized in that: The width of the longitudinal and transverse lines is 0.06mm-0.1mm.

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