Double compartment sleeping mask blister
CN309002360SActive Publication Date: 2024-12-13YUTAI (SHANGHAI) BIOTECHNOLOGY CO LTD
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Patent Information
- Application Number
- CN202430176165.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-04-01
- Publication Date
- 2024-12-13
- Estimated Expiration
- 2039-04-01
Smart Images
Figure 000001_ABST
Abstract
1. The name of the product of this design: double compartment sleeping mask blister. 2. The purpose of this appearance design product: used to place materials in the skin care product field, and the front and rear compartments are independently used to place different materials. 3. The design key point of this appearance design product lies in the combination of shape and pattern. 4. The picture or photo that best illustrates the key points of the design: main view.
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