Base ring for plasma processing equipment

Abstract

1. The name of the product of this design: base ring for plasma processing device. 2. Purpose of the product of this design: This product is a base ring used in plasma processing equipment in semiconductor manufacturing, mainly used to protect the stage from the influence of plasma. 3. The key design features of this design product are: the shape of this design product, especially the shape shown in the enlarged figure. 4. The picture or photo that best illustrates the key points of the design: Design 1 Stereoscopic drawing 1. 5. Designate Design 1 as the base design. 6. Other situations that require explanation Other explanations: In the reference diagram of the usage status and the names of the parts of Design 1 and Design 2, G-discharge part, H-infrared lamp, J-chip, K-stage, L-this design product.

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