Fully automatic continuous flow photoelectric reactor
CN309014000SActive Publication Date: 2024-12-17SHENZHEN E ZHENG TECH CO LTD
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Patent Information
- Application Number
- CN202430145354.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-03-20
- Publication Date
- 2024-12-17
- Estimated Expiration
- 2039-03-20
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Figure 000007_ABST
Abstract
1. The name of the product of this design: Fully automatic continuous flow photoelectric reactor. 2. Purpose of the product with this appearance design: The product with this appearance design is mainly used for continuous flow micro-reaction process under the action of photoelectricity for continuous synthesis of chemical industry, pharmaceutical industry, materials, etc. 3. The design key point of this appearance design product lies in the shape. 4. The picture or photo that best illustrates the key points of the design: Design 1 Stereoscopic drawing 1. 5. Designate Design 1 as the base design.
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