The center of the target in the physical vapor deposition chamber

Abstract

1. The name of this design product: the central part of the target material in the physical vapor deposition chamber. 2. Purpose of the product of this design: The physical vapor deposition chamber target is used as a sputtering target used in a physical vapor deposition chamber, for depositing a material film on a workpiece supported in the physical vapor deposition chamber, and the central portion of the physical vapor deposition chamber target is used as a part of the physical vapor deposition chamber target. 3. The key design point of this design product lies in the shape of the part shown by the solid line. 4. The picture or photo that best illustrates the design points: three-dimensional picture. 5. Other situations that need to be explained Other explanations: The dotted lines in the figure are used to indicate the parts that are not requested to be protected.

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