Low pressure semi-automatic CVD equipment
CN309258061SActive Publication Date: 2025-04-25HANGZHOU ATOM TECHNOLOGY CO LTD
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Patent Information
- Application Number
- CN202430559258.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-09-02
- Publication Date
- 2025-04-25
- Estimated Expiration
- 2039-09-02
Smart Images
Figure 000007_ABST
Abstract
1. The name of the product of this design: low-pressure semi-automatic CVD equipment. 2. Purpose of the product of this design: Mainly used for thin film deposition under relatively low gas pressure. 3. The design key point of this appearance design product lies in the shape. 4. The picture or photo that best illustrates the design points: three-dimensional picture.
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