Panoramic Quality Analyzer
CN309274084SActive Publication Date: 2025-05-06HEFEI MEIYA OPTOELECTRONICS TECH
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Patent Information
- Application Number
- CN202430660826.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-21
- Publication Date
- 2025-05-06
- Estimated Expiration
- 2039-10-21
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Figure 000004_ABST
Abstract
1. The name of the product of this design: Panoramic quality analyzer. 2. The purpose of this design product: to quickly detect the quality of materials and determine the proportion of impurities in samples. 3. The design key point of this appearance design product lies in the shape. 4. The picture or photo that best illustrates the key points of the design: main view. 5. The bottom surface of this design product is a part that is not easily visible or cannot be seen when in use, so the top view is omitted.
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