Facial mask instrument
CN309316053SActive Publication Date: 2025-05-30深圳成诺电子有限公司
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Patent Information
- Application Number
- CN202430640666.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-11
- Publication Date
- 2025-05-30
- Estimated Expiration
- 2039-10-11
Smart Images
Figure 000002_ABST
Abstract
1. The name of the design product: Facial mask instrument. 2. The use of the design product: For facial photon beauty treatment. 3. The design key points of the design product: Lies in the shape. 4. The picture or photo that best shows the design key points: Perspective view.
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