Gap measuring device
CN309824577SActive Publication Date: 2026-03-03SHANGHAI GND ETECH CO LTD
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2025-06-18
- Publication Date
- 2026-03-03
Smart Images
Figure 000004_ABST
Abstract
1. Name of the product in this design: Gap measuring device. 2. Application of this design: This product is used in the field of semiconductor industry measurement to measure the gap distance between the base on which the substrate or wafer is placed and the target conductor component, or the flatness between two planes. 3. The key design feature of this product is its shape. 4. The picture or photo that best illustrates the key design points: Design 1 front view. 5. Design 1 is designated as the basic design.
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