Gas supply nozzle for substrate processing apparatus

CN310024839SActive Publication Date: 2026-06-09KOKUSAI DENKI KK
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
KOKUSAI DENKI KK
Filing Date
2022-11-24
Publication Date
2026-06-09

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Abstract

1. Name of the designed product: gas supply nozzle for substrate processing apparatus 2. Use of the designed product: used in a substrate processing apparatus that processes a substrate held in a reaction tube in a vertical direction. 3. Design points of the designed product: in shape. 4. Picture or photograph that best shows the design points: perspective view. 5. The part indicated by solid line is the partial claim.
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