Atomic layer deposition apparatus
CN310029530SActive Publication Date: 2026-06-12ATOMIC NANO MATERIALS (NAN JING) CO LTD
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- ATOMIC NANO MATERIALS (NAN JING) CO LTD
- Filing Date
- 2025-08-29
- Publication Date
- 2026-06-12
Smart Images
Figure 000007_ABST
Abstract
1. The name of the design product: atomic layer deposition equipment. 2. The use of the design product: through the precursor reaction and blowing cooperation and plasma cleaning chamber function to realize the atomic level thin film deposition reaction on the surface of multiple wafers. 3. The design points of the design product: in shape. 4. The picture or photo that best indicates the design points: perspective view.
Need to check novelty before this filing date? Find Prior Art