Continuous positive airway pressure mask (YN50 / YN50H)
CN310030594SActive Publication Date: 2026-06-12SHENZHEN VVFLY ELECTRONICS CO LTD
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- SHENZHEN VVFLY ELECTRONICS CO LTD
- Filing Date
- 2025-12-02
- Publication Date
- 2026-06-12
Smart Images

Figure 000021_ABST
Abstract
1. The name of the design product: continuous positive airway pressure mask (YN50 / YN50H type). 2. The use of the design product: the design product is used as a continuous positive airway pressure mask, realizing the functions of inputting the positive pressure airflow of the connected sleep breathing machine to the airway of the user through the nose, non-invasive ventilation support, etc. Design 1 and design 2 do not include a moisturizing tube. Design 3 and design 4 include a moisturizing tube. 3. The design points of the design product: in shape. 4. The picture or photo that best indicates the design points: design 3 perspective view. 5. Design 3 is designated as the basic design.
Need to check novelty before this filing date? Find Prior Art