Skirt (new Chinese style clouded pleated skirt)
CN310035474SActive Publication Date: 2026-06-19XINGXIN VOCATIONAL & TECH COLLEGE OF XINJIANG PROD & CONSTR CORPS
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- XINGXIN VOCATIONAL & TECH COLLEGE OF XINJIANG PROD & CONSTR CORPS
- Filing Date
- 2026-01-16
- Publication Date
- 2026-06-19
Smart Images
Figure 000001_ABST
Abstract
1. Name of the product in this design: Skirt (New Chinese Style Cloud Pattern Layered Decorative Skirt). 2. Intended use of this design: for wearing. 3. The key design feature of this product is its shape. 4. The image or photograph that best illustrates the design's key points: a 3D model.
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