reticle shutter (RSP)
CN310040046SActive Publication Date: 2026-06-19NANJING COSWAY TECHNOLOGY CO LTD
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- NANJING COSWAY TECHNOLOGY CO LTD
- Filing Date
- 2025-10-15
- Publication Date
- 2026-06-19
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Figure 000001_ABST
Abstract
1. Name of the product in this design: Photomask Opener (RSP). 2. Purpose of this design: This design is used to open the photomask box. 3. The key design feature of this product is its shape. 4. The image or photograph that best illustrates the design's key points: a 3D model.
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