Phototherapy mask

CN310041702SActive Publication Date: 2026-06-19高奇玉
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
高奇玉
Filing Date
2025-12-11
Publication Date
2026-06-19

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Abstract

1. The name of the design product: phototherapy mask. 2. The use of the design product: facial skin care and repair. 3. The design features of the design product: in shape. 4. The picture or photo that best shows the design features: perspective view.
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