Photon mask (M17)

CN310056381SActive Publication Date: 2026-06-26何天飞
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
何天飞
Filing Date
2025-12-09
Publication Date
2026-06-26

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Abstract

1. Name of the designed product: Photon mask (M17). 2. Use of the designed product: For facial skin care. 3. Design points of the designed product: In shape. 4. Picture or photo best indicating the design points: Perspective view 1.
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