Polishing pad (space layer + wool)

CN310093248SActive Publication Date: 2026-07-17
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Filing Date
2026-01-27
Publication Date
2026-07-17

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Abstract

1. Name of the product in this design: Polishing Pad (Space Layer + Wool). 2. Purpose of this product: This product is used for polishing pads. 3. The key design feature of this product is its shape. 4. The image or photograph that best illustrates the key design points: Design 1 3D view. 5. Design 1 is designated as the basic design.
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