Laser direct writing lithography machine
CN310105040SActive Publication Date: 2026-07-21SUZHOU ZHONGTE MICROELECTRONICS TECH CO LTD
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- SUZHOU ZHONGTE MICROELECTRONICS TECH CO LTD
- Filing Date
- 2025-12-26
- Publication Date
- 2026-07-21
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Figure 000007_ABST
Abstract
1. The name of the design product: laser direct writing photoetching machine. 2. The use of the design product: for laser direct writing exposure on photosensitive material. 3. The design points of the design product: in shape. 4. The picture or photo that best indicates the design points: perspective view.
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