Atmospheric twin-arm wafer transfer robot
CN310105185SActive Publication Date: 2026-07-21苏州盛拓半导体科技有限公司
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- 苏州盛拓半导体科技有限公司
- Filing Date
- 2026-01-27
- Publication Date
- 2026-07-21
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Figure 000007_ABST
Abstract
1. The name of the design product: atmospheric dual-arm wafer transfer robot. 2. The use of the design product: the design product is used in a semiconductor photolithography machine. 3. The design points of the design product: in shape. 4. The picture or photo that best indicates the design points: perspective view.
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