High altitude skydiving oxygen mask
CN310107430SActive Publication Date: 2026-07-21HEFEI JIANGHANG AIRCRAFT EQUIP CORP LTD
View PDF 0 Cites 0 Cited by
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- HEFEI JIANGHANG AIRCRAFT EQUIP CORP LTD
- Filing Date
- 2025-12-03
- Publication Date
- 2026-07-21
Smart Images
Figure 000001_ABST
Abstract
1. The name of the design product: high altitude parachuting oxygen mask. 2. The use of the design product: used by parachutists when wearing and high altitude parachuting. 3. The design points of the design product: in shape. 4. The picture or photo that best shows the design points: perspective view.
Need to check novelty before this filing date? Find Prior Art