Midi skirt (with acetate silk drape and lace trim)
CN310122020SActive Publication Date: 2026-07-31BIYUE (BEIJING) TECH CO LTD
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- BIYUE (BEIJING) TECH CO LTD
- Filing Date
- 2026-01-26
- Publication Date
- 2026-07-31
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Figure 000005_ABST
Abstract
1. Name of the product in this design: Half skirt (acetic acid silk draped lace patchwork). 2. Intended use of this design: for women's skirts. 3. The key design features of this product are the combination of shape and pattern. 4. The image or photograph that best illustrates the design's key points: a 3D model. 5. The design considerations for the top view of the product have been shown in other views, so the top view is omitted; the bottom view of the product is generally not easy to see during use, so the bottom view is omitted.
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