Midi skirt (with acetate silk drape and lace trim)

CN310122020SActive Publication Date: 2026-07-31BIYUE (BEIJING) TECH CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
BIYUE (BEIJING) TECH CO LTD
Filing Date
2026-01-26
Publication Date
2026-07-31

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Abstract

1. Name of the product in this design: Half skirt (acetic acid silk draped lace patchwork). 2. Intended use of this design: for women's skirts. 3. The key design features of this product are the combination of shape and pattern. 4. The image or photograph that best illustrates the design's key points: a 3D model. 5. The design considerations for the top view of the product have been shown in other views, so the top view is omitted; the bottom view of the product is generally not easy to see during use, so the bottom view is omitted.
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