Seals for plasma chambers
CN310126080SActive Publication Date: 2026-07-31LAM RES CORP
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- LAM RES CORP
- Filing Date
- 2024-12-26
- Publication Date
- 2026-07-31
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Figure 000003_ABST
Abstract
1. Name of the product in this design: Seal for plasma chamber. 2. Application of this design: This design is used in the plasma chamber of a semiconductor manufacturing apparatus. 3. The key design feature of this product is its shape. 4. The image or photograph that best illustrates the key design points: Design 1 3D view. 5. The left, right, and rear views of Design 1 are the same as the front view, so the left, right, and rear views of Design 1 are omitted; the bottom view of Design 1 is the same as the top view (except for the section symbols), so the bottom view of Design 1 is omitted; the left, right, and rear views of Design 2 are the same as the front view, so the left, right, and rear views of Design 2 are omitted; the right view of Design 3 is symmetrical to the left view, so the right view of Design 3 is omitted; the right view of Design 4 is symmetrical to the left view, so the right view of Design 4 is omitted. 6. Design 1 is designated as the basic design.
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