Ion source
CN310129866SActive Publication Date: 2026-08-04SHENZHEN CSL VACUUM SCI & TECH CO LTD
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- SHENZHEN CSL VACUUM SCI & TECH CO LTD
- Filing Date
- 2026-02-27
- Publication Date
- 2026-08-04
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Figure 000001_ABST
Abstract
1. Name of the product in this design: Ion Source. 2. Purpose of this design: To generate plasma. 3. The key design feature of this product is its shape. 4. The image or photograph that best illustrates the design's key points: 3D view 1. 5. Other situations requiring explanation: Part A is a partial enlarged view of point A in 3D view 1; Part B is a partial enlarged view of point B in 3D view 2.
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