Plasma enclosure (streamlined and compact - E520)
CN310131472SActive Publication Date: 2026-08-04XIAN BAICHUAN MECHANICAL & ELECTRICAL EQUIP MFG CO LTD
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- XIAN BAICHUAN MECHANICAL & ELECTRICAL EQUIP MFG CO LTD
- Filing Date
- 2026-03-19
- Publication Date
- 2026-08-04
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Figure 000001_ABST
Abstract
1. Name of the product in this design: Plasma Chassis (Streamlined Compact - E520). 2. Application of this design: Used as a chassis for plasma processing equipment. 3. The key design feature of this product is its shape. 4. The image or photograph that best illustrates the design's key points: a 3D model.
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