Reflecting plate for substrate processing apparatus

Abstract

1. Name of the product in this design: Reflector for substrate processing device. 2. Application of this design: In a substrate processing apparatus for processing wafers, it is positioned above a heat insulation plate located below the wafer boat to heat the center of the lower wafer by reflecting infrared rays inside the furnace back to the furnace and suppressing heat leakage to the furnace opening. 3. The key design feature of this product is its shape. 4. The image or photograph that best illustrates the design's key points: a 3D model. 5. As shown in the reference figure, the upper surface component of the main body is transparent, and in the front view, the inner part of the edge is mirror-cut.

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