Vest (New Chinese Style Side-Plattered Patchwork - Three Abundance Pattern)
CN310144302SActive Publication Date: 2026-08-14BEIJING SHANSI DESIGN CONSULTING CO LTD
View PDF 0 Cites 0 Cited by
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2026-01-31
- Publication Date
- 2026-08-14
Smart Images
Figure 000001_ABST
Abstract
1. Name of this design product: Vest (New Chinese Style Side-Platform Spliced Design - Three Abundance Pattern). 2. Purpose of this design: A vest for wearing. 3. The key design elements of this product are the combination of shape, pattern, and color. 4. The image or photograph that best illustrates the design's key points: a 3D model. 5. The design for which protection is sought includes color. 6. This is a thin product; other views do not contain design features, so the left view, right view, top view, and bottom view are omitted.
Need to check novelty before this filing date? Find Prior Art