Base (with cloud pattern)
CN310154205SActive Publication Date: 2026-08-18ZHEJIANG GUANGSHA COLLEGE OF APPLIED CONSTRTECH +1
View PDF 0 Cites 0 Cited by
Patent Information
- Application Number
- CN202630075609.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2026-02-10
- Publication Date
- 2026-08-18
- Estimated Expiration
- 2041-02-10
Smart Images
Figure 000007_ABST
Abstract
1. Name of this design product: Base (Hebi Cloud Pattern Base). 2. Purpose of this design: as a base for decorative ornaments. 3. The key design feature of this product is its shape. 4. The image or photograph that best illustrates the design's key points: a 3D model.
Need to check novelty before this filing date? Find Prior Art