Precursor flow excursion blocker plate

CN310163614SActive Publication Date: 2026-08-21APPLIED MATERIALS INC
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Patent Information

Application Number
CN202530575771.2
Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
Priority Date
2025-03-28
Filing Date
2025-09-26
Publication Date
2026-08-21
Estimated Expiration
2040-09-26

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Abstract

1. The name of the design product: precursor flow offset baffle. 2. The use of the design product: the design product is used as a precursor flow offset baffle for constraining precursor flow in semiconductor processing machinery equipment. 3. The design points of the design product: in shape. 4. The picture or photo that best shows the design points: design 1 perspective view 1. 5. Design 1 rear view is symmetrical with design 1 front view, omit design 1 rear view; Design 1 right view is symmetrical with design 1 left view, omit design 1 right view; Design 2 rear view is symmetrical with design 2 front view, omit design 2 rear view; Design 2 right view is symmetrical with design 2 left view, omit design 2 right view. 6. Design 1 is designated as the basic design.
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