Precursor flow excursion blocker plate
CN310163614SActive Publication Date: 2026-08-21APPLIED MATERIALS INC
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Patent Information
- Application Number
- CN202530575771.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Priority Date
- 2025-03-28
- Filing Date
- 2025-09-26
- Publication Date
- 2026-08-21
- Estimated Expiration
- 2040-09-26
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Figure 000009_ABST
Abstract
1. The name of the design product: precursor flow offset baffle. 2. The use of the design product: the design product is used as a precursor flow offset baffle for constraining precursor flow in semiconductor processing machinery equipment. 3. The design points of the design product: in shape. 4. The picture or photo that best shows the design points: design 1 perspective view 1. 5. Design 1 rear view is symmetrical with design 1 front view, omit design 1 rear view; Design 1 right view is symmetrical with design 1 left view, omit design 1 right view; Design 2 rear view is symmetrical with design 2 front view, omit design 2 rear view; Design 2 right view is symmetrical with design 2 left view, omit design 2 right view. 6. Design 1 is designated as the basic design.
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