Epitaxial apparatus (MOCVD)
CN310177417SActive Publication Date: 2026-08-28YINGHANSI (WUHAN) TECHNOLOGY CO LTD
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Patent Information
- Application Number
- CN202630033427.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2026-01-22
- Publication Date
- 2026-08-28
- Estimated Expiration
- 2041-01-22
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Figure 000007_ABST
Abstract
1. Name of the designed product: epitaxial equipment (MOCVD). 2. Use of the designed product: used for the preparation of semiconductor materials. 3. Design points of the designed product: the combination of shape and pattern. 4. Picture or photo best showing the design points: perspective view.
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