Atomic layer deposition graphical user interface for electronic devices
CN310188086SActive Publication Date: 2026-09-04XIAMEN XINYIFANG TECHNOLOGY CO LTD
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Patent Information
- Application Number
- CN202530468010.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2025-08-08
- Publication Date
- 2026-09-04
- Estimated Expiration
- 2040-08-08
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Figure 000001_ABST
Abstract
1. Name of the product in this design: Atomic Layer Deposition Graphical User Interface for Electronic Devices. 2. Intended use of this design: for use in an electronic device. 3. The key design feature of this product is its graphical user interface. 4. The picture or photo that best illustrates the key design points: Design 1 front view. 5. Other views are omitted as they are standard design. 6. Design 1 is designated as the basic design. 7. Purpose of Graphical User Interface: A graphical user interface for controlling the operation of semiconductor atomic layer deposition equipment. 8. Human-Computer Interaction Method of Graphical User Interface: The main views of Design 1 to Design 8 correspond to the basic interface states of different operating stages of the atomic layer deposition equipment: Design 1 main view is the initial main screen of the equipment; clicking the "Emergency Stop" button in the main view of Design 1 will enter the interface change state diagram of Design 1; Design 2 main view is the interface after the software and PLC are connected; Design 3 main view is the interface of the equipment in vacuum mode; Design 4 main view is the interface of all heaters on mode; Design 5 main view is the interface of process gas introduction mode; Design 6 main view is the interface of setting power to start discharge mode; Design 7 main view is the interface of stopping discharge, shutting off process gas, and opening ALD valves; Design 8 main view is the interface of shutting off all heaters and valves and introducing vacuum breaking gas.
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