3D phototherapy mask (E43-4)

CN310194468SActive Publication Date: 2026-09-08SHENZHEN YIKEMEI TECH CO LTD
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Patent Information

Application Number
CN202630106487.5
Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
Filing Date
2026-03-11
Publication Date
2026-09-08
Estimated Expiration
2041-03-11

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Abstract

1. The name of the design product: 3D phototherapy mask (E43-4). 2. The use of the design product: The design product is used for facial beauty of human body. 3. The design points of the design product: the combination of shape and pattern. 4. The picture or photo that best indicates the design points: perspective view.
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