Upper portion of a physical vapor deposition chamber target
CN310199871SActive Publication Date: 2026-09-11APPLIED MATERIALS INC
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Patent Information
- Application Number
- CN202530415977.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Priority Date
- 2025-01-17
- Filing Date
- 2025-07-16
- Publication Date
- 2026-09-11
- Estimated Expiration
- 2040-07-16
Smart Images
Figure 000008_ABST
Abstract
1. Name of the designed product: upper portion of a physical vapor deposition chamber target. 2. Use of the designed product: the designed product is used as a physical vapor deposition chamber target. 3. Design points of the designed product: in shape. 4. Picture or photograph best indicating the design points: perspective view 1. 5. Other circumstances or explanations: the dotted lines in the figure represent the environment not claimed and do not constitute part of the claimed design.
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