Mask center support section

CN310238651SActive Publication Date: 2026-09-29SHENZHEN QIXUN TECHNOLOGY CO LTD
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Patent Information

Application Number
CN202630148419.5
Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
Filing Date
2025-07-01
Publication Date
2026-09-29
Estimated Expiration
2040-07-01

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Abstract

1. Name of this design: Centerline support part of a face mask. 2. Purpose of this design: The overall product is a face mask, with the central support portion placed on the inner surface of the mask to isolate makeup from the mouth and nose. 3. The key design feature of this product is its shape. 4. The image or photograph that best illustrates the design's key points: the front view. 5. The left view, right view, and bottom view have already been shown in other views, so the left view, right view, and bottom view are omitted. 6. This design is a partial design protection; the part covered by the semi-transparent red block in the view is not part of the content protected by this design.
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