Mask (double-layer opening)
CN310255483SActive Publication Date: 2026-10-13石家庄市栾城区糖果小笛服饰有限公司
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Patent Information
- Application Number
- CN202630110976.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2026-03-13
- Publication Date
- 2026-10-13
- Estimated Expiration
- 2041-03-13
Smart Images
Figure 000001_ABST
Abstract
1. The name of the design product: mask (double-layer opening). 2. The use of the design product: for masks. 3. The design points of the design product: in shape. 4. The picture or photo that best indicates the design points: front view. 5. The part of the design product that is not easy to see or cannot be seen when in use is omitted, and the rear view, top view and bottom view are omitted.
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