Phototherapy mask base (MJ-78E)
CN310260681SActive Publication Date: 2026-10-16深圳市欧伦医疗健康科技有限公司
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Patent Information
- Application Number
- CN202630163830.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2026-04-09
- Publication Date
- 2026-10-16
- Estimated Expiration
- 2041-04-09
Smart Images
Figure 000007_ABST
Abstract
1. The name of the design product: phototherapy mask base (MJ-78E). 2. The use of the design product: for placing and supporting phototherapy mask. 3. The design points of the design product: in shape. 4. The picture or photo that best indicates the design points: perspective view.
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