focusing ring
CN310273202SActive Publication Date: 2026-10-23TOKYO ELECTRON LTD
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Patent Information
- Application Number
- CN202630115951.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2026-03-17
- Publication Date
- 2026-10-23
- Estimated Expiration
- 2041-03-17
Smart Images
Figure 000007_ABST
Abstract
1. The name of the design product: focus ring. 2. The use of the design product: used as a focus ring of a plasma processing equipment, for improving the plasma uniformity on the surface of a semiconductor wafer by spreading the distribution of the plasma generated in the chamber from the surface of the semiconductor wafer to the surface of the focus ring. 3. The design points of the design product: in shape. 4. The picture or photo that best indicates the design points: perspective view.
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