Non-destructive concentration measurement apparatus for semiconductor material concentration
CN310279662SActive Publication Date: 2026-10-27SHANGHAI JINGHONG KEPU OPTOELECTRONICS TECHNOLOGY CO LTD
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Patent Information
- Application Number
- CN202630340502.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2026-07-02
- Publication Date
- 2026-10-27
- Estimated Expiration
- 2041-07-02
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Figure 000003_ABST
Abstract
1. The name of the design product: semiconductor material concentration nondestructive concentration measurement equipment. 2. The use of the design product: the design product is used for quantitative measurement of doped / carrier / semiconductor compound nondestructive concentration analysis and gives depth distribution measurement. 3. The design points of the design product: in shape. 4. The picture or photo that best shows the design points: perspective view. 5. The bottom view is not visible or difficult to see when in use, so the bottom view is omitted.
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