Non-destructive concentration measurement equipment for semiconductor materials
CN310279882SActive Publication Date: 2026-10-27SHANGHAI JINGHONG KEPU OPTOELECTRONICS TECHNOLOGY CO LTD
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Patent Information
- Application Number
- CN202630340501.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2026-07-02
- Publication Date
- 2026-10-27
- Estimated Expiration
- 2041-07-02
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Figure 000003_ABST
Abstract
1. Name of the product in this design: Online non-destructive concentration measurement device for semiconductor materials. 2. Purpose of this design: This design is used for quantitative non-destructive concentration analysis of doped / carrier / semiconductor compounds and to provide depth distribution measurements. 3. The key design feature of this product is its shape. 4. The image or photograph that best illustrates the design's key points: a 3D model. 5. If the bottom view is not visible or difficult to see during use, the bottom view should be omitted.
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