Front end of the gas nozzle for substrate processing device
CN310282372SActive Publication Date: 2026-10-27KOKUSAI DENKI KK
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Patent Information
- Application Number
- CN202330392253.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Priority Date
- 2023-01-25
- Filing Date
- 2023-06-26
- Publication Date
- 2026-10-27
- Estimated Expiration
- 2038-06-26
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Figure 000007_ABST
Abstract
1. Name of the product in this design: Front end of a gas nozzle for a substrate processing device. 2. Purpose of this design: It is used as a gas supply nozzle in a substrate processing apparatus for processing substrates held in multiple layers vertically inside a reaction tube. The claimed part is used to form the front end of the gas supply nozzle and to supply gas from the formed gas supply port. 3. The key design features of this product are the shape of the part that is to be protected. 4. The image or photograph that best illustrates the design's key points: a 3D model. 5. Other situations requiring explanation: In the figure, the parts represented by solid lines are the parts that require protection, and the single-dot dashed lines represent the boundary lines between the parts that require protection and other parts.
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