Front end of the gas nozzle for substrate processing device

CN310282372SActive Publication Date: 2026-10-27KOKUSAI DENKI KK
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Patent Information

Application Number
CN202330392253.8
Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
Priority Date
2023-01-25
Filing Date
2023-06-26
Publication Date
2026-10-27
Estimated Expiration
2038-06-26

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Abstract

1. Name of the product in this design: Front end of a gas nozzle for a substrate processing device. 2. Purpose of this design: It is used as a gas supply nozzle in a substrate processing apparatus for processing substrates held in multiple layers vertically inside a reaction tube. The claimed part is used to form the front end of the gas supply nozzle and to supply gas from the formed gas supply port. 3. The key design features of this product are the shape of the part that is to be protected. 4. The image or photograph that best illustrates the design's key points: a 3D model. 5. Other situations requiring explanation: In the figure, the parts represented by solid lines are the parts that require protection, and the single-dot dashed lines represent the boundary lines between the parts that require protection and other parts.
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