Laser (Dual UV Picosecond)
CN310282873SActive Publication Date: 2026-10-27HUARI LASER TECHNOLOGY (SUZHOU) CO LTD
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Patent Information
- Application Number
- CN202630145301.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2026-03-31
- Publication Date
- 2026-10-27
- Estimated Expiration
- 2041-03-31
Smart Images
Figure 000001_ABST
Abstract
1. Name of the product in this design: Laser (Dual Ultraviolet Picosecond). 2. Application of this design: This design is used for laser marking, laser engraving, and laser surface treatment. 3. The key design feature of this product is its shape. 4. The image or photograph that best illustrates the design's key points: a 3D model.
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