Facial mask cloth (small S water ripple)

CN310285283SActive Publication Date: 2026-10-27ATOMY (SHANGHAI) BIOTECHNOLOGY CO LTD
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Patent Information

Application Number
CN202630248870.4
Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
Filing Date
2026-05-20
Publication Date
2026-10-27
Estimated Expiration
2041-05-20

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Abstract

1. The name of the design product: mask cloth (small S water ripples). 2. The use of the design product: for mask cloth. 3. The design points of the design product: in the combination of shape and pattern. 4. The picture or photo that best indicates the design points: front view. 5. The design product is a thin product, and the left, right, bottom, and top views are omitted. 6. Other circumstances that need to be explained: the front view has a raised small S water ripple pattern, and the back view is a flat surface without protrusions, but due to the extremely thin thickness of the mask, the small S water ripple shape can also be seen in the back view.
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