Facial mask cloth (small S water ripple)
CN310285283SActive Publication Date: 2026-10-27ATOMY (SHANGHAI) BIOTECHNOLOGY CO LTD
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Patent Information
- Application Number
- CN202630248870.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2026-05-20
- Publication Date
- 2026-10-27
- Estimated Expiration
- 2041-05-20
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Figure 000001_ABST
Abstract
1. The name of the design product: mask cloth (small S water ripples). 2. The use of the design product: for mask cloth. 3. The design points of the design product: in the combination of shape and pattern. 4. The picture or photo that best indicates the design points: front view. 5. The design product is a thin product, and the left, right, bottom, and top views are omitted. 6. Other circumstances that need to be explained: the front view has a raised small S water ripple pattern, and the back view is a flat surface without protrusions, but due to the extremely thin thickness of the mask, the small S water ripple shape can also be seen in the back view.
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