Electroluminescence indicator device and method for its manufacture

Abstract

Electroluminescent display device comprising: a substrate (100); a first electrode (300) which is provided on the substrate (100); a wall (400) configured to cover a first end of the first electrode (300) and to define an emission area (E1, E2, E3); an emission layer (510, 520, 530) that is provided for in the emission area (E1, E2, E3) defined by the wall (400); and a second electrode (610, 620, 630) which is provided on the emission layer (510, 520, 530), wherein a profile of a top surface of the second electrode (610, 620, 630) has a first curvature in the middle of the emission region (E1, E2, E3) and a second curvature at the edge of the emission region (E1, E2, E3) and the second curvature is greater than the first curvature, wherein a connecting layer (700) which is connected to the second electrode (610, 620, 630) is provided on the wall (400) and is different from the second electrode (610, 620, 630), wherein the substrate (100) is formed from an opaque material, wherein the connecting layer (700) overlaps the second electrode (610, 620, 630) only at the edge of the emission region (E1, E2, E3).

Description

BACKGROUNDTechnical field

[0001] The present disclosure relates to an electroluminescent display device and a method of manufacturing the same. Description of the state of the art

[0002] An electroluminescent display device is designed such that an emission layer is formed between two electrodes. Accordingly, when the emission layer emits light due to an electric field between the two electrodes, an image is displayed on the electroluminescent display device.

[0003] The emission layer can be made of an organic material that emits light when an exciton is produced by a combination of an electron and a hole, and the exciton decays from an excited state to a ground state. Alternatively, the emission layer can be made of an inorganic material such as a quantum dot.

[0004] Hereinafter, the electroluminescent display device according to the prior art will be described with reference to the accompanying drawings.

[0005] Fig. 1 is a cross-sectional view illustrating the electroluminescent display device according to the prior art.

[0006] As in Fig. 1, the prior art electroluminescent display device may include a substrate 10, a circuit device layer 20, a first electrode 30, a wall 40, an emission layer 50, and a second substrate 60.

[0007] The circuit device layer 20 is formed on the first substrate 10. Here, various signal lines, a thin-film transistor, and a capacitor are formed in the circuit device layer 20.

[0008] The first electrode 30 is formed on the circuit device layer 20. The first electrode 30 is patterned through each pixel, and the first electrode 30 functions as an anode of the electroluminescent display device.

[0009] The wall 40 is formed in a matrix configuration to define several emission areas.

[0010] The emission layer 50 is formed in each of the plurality of emission regions defined by the wall 40. The emission layer 50 is formed in each of the plurality of emission regions by a solution process using an inkjet device.

[0011] The second electrode 60 is formed on the emission layer 50, wherein the second electrode 60 functions as a cathode of the electroluminescent display device.

[0012] In the case of the prior art electroluminescence display device, the emission layer 50 is formed by the solution process, and then the second electrode 60 is formed by a deposition process.

[0013] Accordingly, in the prior art, the inkjet device for forming the emission layer 50 and a deposition device for forming the second electrode 60 are inevitably required, thus increasing the manufacturing cost. In addition, the substrate 10 must be transferred to the different devices to form the emission layer 50 and the second electrode 60, thereby causing an increase in processing time.

[0014] US 2003 / 0146692 A1 relates to an organic electroluminescent display device in which a functional layer is formed between bank sections. A cathode is further formed on the functional layer.

[0015] US 2016 / 0293670 A1 describes an AMOLED display device. The AMOLED display device comprises an array substrate having a plurality of subpixels, a pixel-defining layer arranged on a surface of the array substrate, and OLED display structures arranged on a surface of the pixel-defining layer, wherein the OLED display structures each correspond to the subpixels. SUMMARY

[0016] The present disclosure has been made in view of the above problems, and it is an object of the present disclosure to provide an electroluminescent display device and a method for manufacturing the same which can reduce the manufacturing cost and the processing time.

[0017] The object of the present invention is achieved by the subject matter of the independent claims. Advantageous embodiments are specified in the subclaims.

[0018] By providing an emission layer and a second electrode through a solution process, it is possible to manufacture an electroluminescent display device without using a mask, thereby reducing manufacturing costs and time. BRIEF DESCRIPTION OF THE MULTIPLE VIEWS OF THE DRAWINGS

[0019] The above and other objects, features and advantages of the present invention will be better understood from the following detailed description taken in conjunction with the accompanying drawings, in which: Fig. 1 is a cross-sectional view illustrating the electroluminescent display device according to the prior art; Fig. 2 is a cross-sectional view illustrating an electroluminescent display device according to an embodiment of the present disclosure; Fig. 3 is a plan view illustrating the electroluminescent display device according to an embodiment of the present disclosure; Fig. 4 is a cross-sectional view illustrating an electroluminescent display device according to another embodiment of the present disclosure; Fig. 5 is a cross-sectional view illustrating an electroluminescent display device according to another embodiment of the present disclosure; Fig. 6 is a diagram showing the change in light transmittance after each wavelength range according to a change in a second electrode according to an embodiment of the present disclosure; Fig. 7 is a plan view illustrating an electroluminescent display device according to another embodiment of the present disclosure; Fig. 8 is a cross-sectional view illustrating an electroluminescent display device according to another embodiment of the present disclosure and corresponding to a cross section along II of Fig. 7; and Fig. 9 is a cross-sectional view illustrating an electroluminescent display device according to another embodiment of the present disclosure, and corresponding to a cross section along II of Fig. 7 corresponds. DETAILED DESCRIPTION OF REVELATION

[0020] Advantages and features of the present disclosure and methods of implementation thereof will be more fully understood by the following embodiments described with reference to the accompanying drawings. However, the present disclosure may be embodied in various forms. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the present disclosure to those skilled in the art.

[0021] The shapes, sizes, ratios, angles, and numbers disclosed in the drawings for describing embodiments of the present disclosure are merely examples, and thus the present disclosure is not limited to the details shown. Like reference numerals refer to like elements throughout. In the following description, when the detailed description of the relevant known function or configuration is determined to unnecessarily obscure the important point of the present disclosure, the detailed description will be omitted. Where "comprise," "have," and "include" described in the present specification are used, another part may also be present unless "only" is used. The terms in a singular form may include plural forms unless indicated otherwise.When interpreting an element, the element is interpreted to contain an error region even though there is no explicit description of it. When describing a positional relationship, for example, when the positional order is described as "on", "above", "below", and "next to", the case of no contact between them may be included unless "exactly" or "directly" is used. If it is mentioned that a first element is positioned "on" a second element, this does not mean that the first element is positioned substantially above the second element in the figure. The upper part and the lower part of an affected object may be swapped depending on the object's orientation.Consequently, the case where a first element is positioned "on" a second element includes both the case where the first element is positioned "below" the second element and the case where the first element is positioned "above" the second element in the figure or in an actual configuration. When describing a temporal relationship, for example, when the temporal order is described as "after," "subsequent," "next," and "before," a case that is not continuous may be included unless "exactly" or "directly" is used. It should be understood that although the terms "first," "second," etc., may be used here to describe different elements, these elements should not be limited by these terms. These terms are used only to distinguish one element from another.For example, a first element could be referred to as a second element, and similarly, a second element could be referred to as a first element, without departing from the scope of the present disclosure. The terms "first horizontal axis direction," "second horizontal axis direction," and "vertical axis direction" should not be interpreted solely based on a geometric relationship in which the respective directions are perpendicular to each other, and may be intended as directions having broader directives within the range in which the components of the present disclosure can functionally operate. It is understood that the term "at least one" includes all combinations that refer to an element.For example, "at least one of a first element, a second element, and a third element" may include any combination of two or more elements selected from the first, second, and third elements, as well as any of the first, second, and third elements. Features of various embodiments of the present disclosure may be partially or entirely coupled or combined with one another and may be interoperable and technically driven in various ways, as those skilled in the art can readily understand. The embodiments of the present disclosure may be practiced independently of one another or may be practiced together in a mutually dependent relationship.

[0022] Hereinafter, an electroluminescent display device according to the embodiment of the present disclosure will be described in detail with reference to the accompanying drawings.

[0023] Fig. 2 is a cross-sectional view illustrating an electroluminescent display device according to an embodiment of the present disclosure.

[0024] As in Fig. 2, the electroluminescent display device according to an embodiment of the present disclosure may include a substrate 100, a circuit device layer 200, a first electrode 300, a wall 400, an emission layer 510, 520 and 530, a second electrode 610, 620 and 630, and an interconnect layer 700.

[0025] The first substrate 100 may be formed from a glass or plastic material, but is not limited to these materials. The first substrate 100 may be formed from a translucent or opaque material. According to the invention, the substrate is opaque.

[0026] When the electroluminescent display device according to an embodiment of the present disclosure is formed in an upper emission type in which the emitted light propagates to an upper side, the first substrate 100 may be formed of both an opaque material and a translucent material. Meanwhile, when the electroluminescent display device (not according to the invention) is formed in a lower emission type in which the emitted light propagates to a lower side, the first substrate 100 may be formed of a translucent material.

[0027] The circuit device layer 200 is formed on the substrate 100.

[0028] The circuit device layer 200 includes an active layer 210, a gate insulating film 220, a gate electrode 230, an interlayer insulating layer 240, a source electrode 250a, a drain electrode 250b, a passivation layer 260, and a planarization layer 270.

[0029] The active layer 210 is formed on the substrate 100. The active layer 210 may be formed of a silicon-based semiconductor material or an oxide-based semiconductor material, but is not limited to these materials. Meanwhile, although not shown, a light shielding layer may additionally be provided between the substrate 100 and the active layer 210 to prevent light from propagating to the active layer, thereby preventing deterioration of the active layer 210.

[0030] The gate insulation film 220 is formed on the active layer 210 to thereby insulate the active layer 210 and the gate electrode 230 from each other.

[0031] The gate electrode 230 is formed on the gate insulation film 220.

[0032] The interlayer insulation layer 240 is formed on the gate electrode 230, wherein the interlayer insulation layer 240 insulates the gate electrodes 230 from the source / drain electrodes 250a / 250b.

[0033] The source electrode 250a is provided at a predetermined distance from the drain electrode 250b, and the source electrode 250a and the drain electrode 250b, which are opposite or facing each other, are provided on the interlayer insulation film 240. The source electrode 250a and the drain electrode 250b are each connected at one end to the active layer 210 via contact holes provided in the interlayer insulation film 240 and the gate insulation film 220.

[0034] The passivation layer 260 is provided on the source electrode 250a and the drain electrode 250b to thereby protect a thin film transistor.

[0035] The planarization layer 270 is formed on the passivation layer 260 to thereby planarize a surface of the substrate 100.

[0036] Accordingly, the circuit device layer 200 includes the thin film transistor having the gate electrode 230, the active layer 210, the source electrode 250a, and the drain electrode 250b. Fig. Figure 2 shows the thin-film transistor having a top gate structure where the gate electrode 230 is provided above the active layer 210, but is not limited to this type. For example, the thin-film transistor having a bottom gate structure where the gate electrode 230 is provided below the active layer 210 may be provided in the circuit device layer 200.

[0037] In the circuit device layer 200, each pixel provides a circuit device including various signal lines, a thin-film transistor, and a capacitor. The signal lines may include a gate line, a data line, a power supply line, and a reference line, and the thin-film transistor may include a switching thin-film transistor, a driving thin-film transistor, and a sensing thin-film transistor.

[0038] Accordingly, when the switching thin film transistor is switched in accordance with a gate signal supplied to the gate line, a data voltage provided from the data line is supplied to the driving thin film transistor through the switching thin film transistor.

[0039] Accordingly, when the driving thin film transistor is switched according to the data voltage supplied from the switching thin film transistor, a data current is generated by the current supplied from the power supply line, and the generated data current is supplied to the first electrode 300.

[0040] The detection thin-film transistor detects a threshold voltage deviation of the driving thin-film transistor that causes image quality deterioration. The detection thin-film transistor supplies a current of the driving thin-film transistor to the reference line in response to a detection control signal supplied from the gate line or an additional detection line.

[0041] The capacitor maintains the data voltage supplied to the drive thin-film transistor for a frame period. The capacitor is connected to each of the gate and source terminals of the drive thin-film transistor.

[0042] The first electrode 300 is formed on the circuit device layer 200. The first electrode 300 is patterned per pixel. The first electrode 300 functions as an anode of the electroluminescent display device. Thus, each pixel has its own first electrode 300, which is separated or insulated from the first electrodes of neighboring pixels.

[0043] When the electroluminescent display device according to an embodiment of the present disclosure is formed in an upper emission type, the first electrode 300 may include a reflective material for reflecting the light emitted from the emission layer 500 upward. In this case, the first electrode 300 may be formed in a deposition structure including the reflective material and a light-transmitting conductive material. When the electroluminescent display device (not according to the invention) is formed in a lower emission type, the first electrode 300 may be formed of the light-transmitting conductive material.

[0044] The first electrode 300 is connected to the drain electrode 250b of the thin-film transistor via a contact hole provided in the planarization layer 270 and the passivation layer 260. In some cases, the first electrode 300 may be connected to the source electrode 250a of the thin-film transistor via a contact hole provided in the planarization layer 270 and the passivation layer 260.

[0045] The wall 400 is formed in a matrix configuration to define a boundary line between each of the plurality of pixels, thereby defining an emission region E1, E2, or E3 in each of the plurality of pixels. That is, an opening portion where the wall 400 is not formed in each pixel becomes the emission regions E1, E2, and E3.

[0046] The wall 400 covers both ends of the first electrode 300, and the wall 400 is formed on the circuit device layer 200. Thus, the plurality of first electrodes 300 patterned for the plurality of pixels can be isolated from each other by the wall 400. The wall 400 is in contact with the circuit device layer 200, particularly the planarization layer 270, in a region between two adjacent first electrodes 300 to separate them.

[0047] The wall 400 may be formed of an organic insulating material having hydrophilic properties. In this case, the emission layers 510, 520, and 530 spread evenly toward a side surface of the wall 400, making it possible to realize the uniformity of the emission regions E1, E2, and E3.

[0048] Meanwhile, if the entire region of the wall 400 has the hydrophilic property, the emission layer 510, 520, and 530 formed in any emission region E1, E2, or E3 overflows into the adjacent emission region E1, E2, or E3 via a top surface of the wall 400, whereby the emission layer 510, 520, and 530 formed in any other emission region E1, E2, or E3 can be mixed with the emission layer 510, 520, and 530 formed in the adjacent emission region E1, E2, or E3. Thus, the top surface of the wall 400 preferably has the hydrophobic property to prevent the mixing of the adjacent emission layers 510, 520, and 530.

[0049] For this purpose, the wall 400 can be obtained by coating a mixed solution of an organic insulating material having hydrophilic property and a hydrophobic material such as fluorine, and patterning the coated mixed solution using a photolithography process. By light irradiated for the photolithography process, the hydrophobic material such as fluorine can be shifted to an upper portion of the wall 400, whereby the upper portion of the wall 400 can have the hydrophobic property, and the remaining portions of the wall 400 can have the hydrophilic property.In this case, the top surface of the wall 400 has the hydrophobic property, so that it is possible to reduce the spreading of the adjacent emission layers 510, 520 and 530 into the top surface of the wall to some extent and thereby reduce a problem related to the mixing of the adjacent emission layers 510, 520 and 530.

[0050] The emission layer 510, 520, and 530 is formed on the first electrode 300. Specifically, the emission layer 510, 520, and 530 is formed in the emission region E1, E2, and E3 defined by the wall 400.

[0051] The emission layer 510, 520, and 530 is patterned in each of the emission regions E1, E2, and E3, respectively, by a solution process without using a mask. In this case, a height h1 of an upper end of the emission layer 510, 520, and 530 in the center of the emission regions E1, E2, and E3 after the drying process of the solution for forming the emission layer 510, 520, and 530 is lower than a height h2 of an upper end of the emission layer 510, 520, and 530 at the end of the emission regions E1, E2, and E3, and particularly at the end of the emission regions E1, E2, and E3 that is in contact with the dam 400. In particular, as shown in the drawings, since the height of the emission layer 510, 520 and 520 is gradually lowered from the end of the emission region E1, E2 and E3 in contact with the embankment 400 to the center of the emission region E1, E2 and E3, it is possible to realize a gradually lowered profile shape.

[0052] The emission layers 510, 520, and 530 may include the first emission layer 510 provided in the first emission region E1 of the first pixel, the second emission layer 520 provided in the second emission region E2 of the second pixel, and the third emission layer 530 provided in the third emission region E3 of the third pixel.

[0053] The first emission layer 510 may include a hole injection layer HIL, a hole transport layer HTL, and a red-emitting material layer EML(R). The second emission layer 520 may include a hole injection layer HIL, a hole transport layer HTL, and a green-emitting material layer EML(G). The third emission layer 530 may include a hole injection layer HIL, a hole transport layer HTL, and a blue-emitting material layer EML(B).

[0054] The hole injection layer HIL is formed in each of the first to third emission regions E1, E2, and E3 by the solution process, and the hole injection layer HIL is included in each of the first emission layer 510, the second emission layer 520, and the third emission layer 530. The hole transport layer HTL is formed in each of the first to third emission regions E1, E2, and E3 by the solution process, and the hole transport layer HTL is included in each of the first emission layer 510, the second emission layer 520, and the third emission layer 530.The red-emitting material layer EML(R), the green-emitting material layer EML(G), and the blue-emitting material layer EML(B) are formed in the first to third emission regions E1, E2, and E3, respectively, by the solution process, wherein the red-emitting material layer EML(R), the green-emitting material layer EML(G), and the blue-emitting material layer EML(B) are included in the first emission layer 510, the second emission layer 520, and the third emission layer 530, respectively.

[0055] Each of the emission layers 510, 520, and 530 includes the hole injection layer HIL and the hole transport layer HTL to transfer holes generated in the first electrode 300 to each of the red emitting material layer EML(R), the green emitting material layer EML(G), and the blue emitting material layer EML(B).

[0056] Each of the emission layers 510, 520, and 530 does not include an electron injection layer EIL and an electron transport layer ETL for transferring electrons generated in the second electrode 610, 620, and 630 to each of the red-emitting material layer EML(R), the green-emitting material layer EML(G), and the blue-emitting material layer EML(B). In some cases, at least one of the electron injection layer EIL and the electron transport layer ETL may be included in each of the emission layers 510, 520, and 530.

[0057] The second electrode 610, 620, and 630 is formed on the emission layer 510, 520, and 530. The second electrode 610, 620, and 630 can serve as a cathode of the electroluminescent display device.

[0058] In the same way as the emission layers 510, 520, and 530, the second electrodes 610, 620, and 630 in each emission region E1, E2, and E3 can be patterned by a solution process without using a mask. Thus, the second electrode 610 is formed on the first emission layer 510 of the first emission region E1, the second electrode 620 is formed on the second emission layer 520 of the second emission region E2, and the second electrode 630 is formed on the third emission layer 520 of the third emission layer E3.

[0059] As described above, if the electron injection layer EIL and the electron transport layer ETL are not included in the emission layer 510, 520, and 530, the second electrode 610, 620, and 630 may contain a material having the electron injection property and the electron transport property. Specifically, the second electrode 610, 620, and 630 may contain a conductive material such as silver (Ag), so that the second electrode 610, 620, and 630 can serve as the cathode of the electroluminescent display device. To realize the electron injection property and the electron transport property, the second electrode 610, 620, and 630 may contain at least one of an alkali metal, a metal oxide, and a metal carbonate.The second electrode 610, 620 and 630 can be obtained by mixing at least one of the alkali material, the material and the metal carbonate with ink containing silver (Ag) and performing the dissolving process with the above mixed material using an ink jet device.

[0060] According to one embodiment of the present disclosure, the emission layer 510, 520, and 530 and the second electrode 610, 620, and 630 can be formed by the solution process, making it possible to reduce the manufacturing cost and process time. Specifically, the second electrode 610, 620, and 630 contains the material having the electron injection property and the electron transport property, making it possible to remove the electron injection layer and the electron transport layer from the emission layer 510, 520, and 530, thereby significantly shortening a process time for forming the emission layer 510, 520, and 530.

[0061] When the electroluminescent display device according to an embodiment of the present disclosure is formed in an upper emission type, the second electrode 610, 620, and 630 may be formed of a light-transmitting conductive material for directing the light emitted from the emission layer 510, 520, and 530 upward, or may be formed with a very thin thickness to improve light transmittance. When the electroluminescent display device (not according to the invention) is formed in a lower emission type, the second electrode 610, 620, and 630 may include a reflective material for reflecting the light emitted from the emission layer 510, 520, and 530 downward.

[0062] Accordingly, since the second electrode 610, 620 and 630 is formed by the solution process, the second electrode 610, 620 and 630 has a profile corresponding to the profile of the emission layer 510, 520 and 530.

[0063] In addition, since the second electrode 610, 620 and 630 are formed in each emission region E1, E2 and E3, the second electrode 610 formed on the first emission layer 510, the second electrode 620 formed on the second emission layer 520 and the second electrode 630 formed on the third emission layer are separated from each other without being connected to each other.

[0064] Since the second electrode 610 formed on the first emission layer E1, the second electrode 620 formed on the second emission layer 520, and the second electrode 630 formed on the third emission layer 530 are connected to each other by the interconnection layer 700, a common voltage can be applied to each of the second electrodes 610, 620, and 630. Thus, the interconnection layer 700 is formed of a conductive material.

[0065] The connecting layer 700 is distinguishable from the second electrodes and is provided on the top side of the wall 400 and extends to the second electrodes 610, 620, and 630, whereby the second electrodes 610, 620, and 630 can be electrically connected to each other. The connecting layer 700 extends to a top side of the second electrode 610, 620, and 630. If the electroluminescent display device according to the present disclosure is formed in the upper emission type, the connecting layer 700 may be formed of a light-transmitting conductive material to prevent the reduction of light transmittance. Meanwhile, if the electroluminescent display device (not according to the invention) is formed in the lower emission type, the connecting layer 700 may be formed of an opaque conductive material. The structure of the connecting layer 700 will be described with reference to Fig. 3 easily understood.

[0066] Although not shown in the figures, an encapsulation layer may additionally be formed on the second electrode 610, 620, and 630. The encapsulation layer prevents external moisture from penetrating the emission layer 510, 520, and 530. The encapsulation layer may be formed of an inorganic insulating material or may be formed in a deposition structure obtained by alternately depositing an organic insulating material and an organic insulating material, but is not limited to these structures.

[0067] Fig. 3 is a plan view illustrating the electroluminescent display device according to an embodiment of the present disclosure.

[0068] As in Fig. 3, the wall 400 is formed in the matrix configuration on the substrate 100 to thereby define the first emission region E1, the second emission region E2, and the third emission region E3. For reference, the wall is shown in Fig. 3 marked with diagonal lines.

[0069] The first emission layer 510 and the second electrode 610 are formed in the first emission region E1, the second emission layer 520 and the second electrode 620 are formed in the second emission region E2, and the third emission layer 530 and the third electrode 630 are formed in the third emission region E3.

[0070] The interconnect layer 700 is formed on top of the wall 400 while overlapping the wall 400. The interconnect layer 700 may include a plurality of first interconnect lines 710, a plurality of second interconnect lines 720, a plurality of first interconnect electrodes 715, a plurality of second interconnect electrodes 725, and a third interconnect line 730. The thickness of the interconnect layer may vary due to a varying profile of a structure on which it is formed. The thickness of the interconnect layer 700, when formed on a surface parallel to the top of the substrate 100, is typically smaller than the second electrode 600.

[0071] The plurality of first connecting lines 710 extend in a first direction on the top surface of the wall 400, for example, a horizontal direction. The plurality of second connecting lines 720 extend in a second direction on the top surface of the wall 400, for example, a vertical direction.

[0072] Each of the plurality of first connecting electrodes 715 interconnects the first connecting line 710 and the second electrodes 610, 620, and 630, and each of the plurality of second connecting electrodes 725 interconnects the second connecting line 720 and the second electrodes 610, 620, and 630. Accordingly, each of the plurality of first connecting electrodes 715 and each of the plurality of second connecting electrodes 725 may extend to the top of the second electrodes 610, 620, and 630 on the top surface of the wall 400.

[0073] The third connection line 730 connects the plurality of first connection lines 710 to the plurality of second connection lines 720. The third connection line 730 may be formed in the periphery of the wall 400, for example, a pad region connected to a circuit driver. The third connection line 730 may be provided in the periphery of an active region for displaying an image and may be provided to surround the active region.

[0074] The plurality of first connecting lines 710, the plurality of second connecting lines 720, the plurality of first connecting electrodes 715, the plurality of second connecting electrodes 725, and the third connecting line 730 may be formed of the same material and may be manufactured by the same process, but not necessarily. The plurality of first connecting lines 710, the plurality of second connecting lines 720, and the third connecting line 730 may be made of a metal material having high conductivity and may be manufactured by the same process. The plurality of first connecting electrodes 715 and the plurality of second connecting electrodes 725 may be made of a light-transmitting conductive material and may be manufactured by the same process.

[0075] The interconnection layer 700 can be modified into various structures capable of electrically connecting the plurality of second electrodes 610, 620, and 630. For example, it is possible to omit the plurality of first interconnection lines 710 and the plurality of first interconnection electrodes 715, omit the plurality of second interconnection lines 720 and the plurality of second interconnection electrodes 725, and omit the third interconnection line 730.

[0076] Fig. 4 is a cross-sectional view illustrating an electroluminescent display device according to another embodiment of the present disclosure. In addition to a structure of the wall 400, the Fig. 4 is similar to the structure of the electroluminescent display device shown in Fig. 2, whereby the same reference numerals are used throughout the drawings to designate the same parts. Only the different structures will be described in detail below as follows.

[0077] Referring to Fig. 4, the wall 400 includes a first wall 410 and a second wall 420.

[0078] The first wall 410 covers one end of a first electrode 300, and the first wall 410 is formed on a circuit device layer 200. A thickness of the first wall 410 is relatively smaller than a thickness of the second wall 420, and a width of the first wall 410 is relatively larger than a width of the second wall 420. The height is measured in a direction perpendicular to the surface of the substrate, and the width is measured in a direction parallel to the surface of the substrate. In the same way as an emission layer 510, 520, and 530, the first wall having the above structure has the hydrophilic property. The first wall 410 having the hydrophilic property may be formed of an inorganic insulating material such as silicon oxide.Thus, when the emission layer 510, 520 and 530 is formed by a solution process, a solution for forming the emission layer 510, 520 and 530 can easily spread on the first wall 410.

[0079] The height (h1) of an emission layer is measured from the top surface of the first electrode 300. The height of a second electrode 600 is also measured from the top surface of the first electrode 300. The height of a ridge 400 is measured from the top surface of the planarization layer 270. The edge of the emission region can be considered the top surface of the emission region that is in direct contact with the ridge. The top surface of a feature is the surface of the feature that is farthest from the first substrate and parallel to the substrate surface.

[0080] The second wall 420 is formed on the first wall 410. The width of the second wall 420 is smaller than the width of the first wall 410. The second wall 420 can be obtained by coating a mixed solution of an organic insulating material having a hydrophilic property and a hydrophobic material such as fluorine, and patterns of the coated mixed solution using a photolithography process. By the light irradiated for the photolithography process, the hydrophobic material such as fluorine can be shifted to an upper portion of the second wall 420, whereby the upper portion of the second wall 420 has the hydrophobic property and the remaining portions of the second wall 420 have the hydrophilic property.That is, the lower portion of the second wall 420, which is in contact with the first wall 410, has the hydrophilic property, and the upper portion of the second wall 420 has the hydrophobic property, but this is not limited to this structure. For example, all portions of the second wall 420 may have the hydrophobic property.

[0081] Here, the spreading ability of the solution for forming the emission layer 510, 520, 530 can be improved, which is due to the fact that the first wall 410 has the hydrophilic property and the lower portion of the second wall has the hydrophilic property. In particular, since the first wall 410 has the relatively smaller thickness and the relatively larger width compared to the second wall, it is possible to prepare a two-stage structure of the hydrophilic property by combining the first wall 410 and the second wall 410, whereby the solution for forming the emission layer 510, 520, and 530 can easily spread to the left and right ends of the emission regions E1, E2, and E3.

[0082] In addition, the upper portion of the second wall 420 having the hydrophobic property prevents the solution for forming the emission layer 510, 520, and 530 from spreading to another adjacent emission region E1, E2, and E3, so that it is possible to prevent the emission layer 510, 520, and 530 of one emission region E2, E2, and E3 from being mixed with the emission layer 510, 520, and 530 of another adjacent emission region E1, E2, and E3.

[0083] The first wall or the second wall may have a linear structure in the active region. A linear structure is a straight structure, i.e. the wall extends along a first direction and has a constant cross-section perpendicular to the first direction. The first wall may be formed as a lattice structure, which is a structure comprising a single layer having a plurality of regular openings, which are typically rectangular openings arranged in a rectangular array, defining a regular structure of emission regions in the active region. An electroluminescent display device may have a plurality of second walls with a linear structure, which are parallel to one another and which are formed on top of the first wall having a lattice structure.An electroluminescent display device may include a plurality of second ridges having a linear structure that are parallel to one another and formed on top of a plurality of first ridges having a linear structure that are parallel to one another and perpendicular to the linear structure of the second ridges. A ridge having a parallel structure may have such a structure only in the active region. In some cases, a ridge may be formed of a plurality of linear structures that are parallel to one another and connected in the dummy region surrounding the active region, forming a serpentine pattern.

[0084] Fig. 5 is a cross-sectional view illustrating an electroluminescent display device according to another embodiment of the present disclosure. Except for a structure of a second electrode 610, 620, and 630, the structure shown in Fig. 5 is similar to the structure of the electroluminescent display device shown in Fig. 2, whereby the same reference numerals are used throughout the drawings to designate the same parts. Only the different structures will be described in detail below as follows.

[0085] As in Fig. 5, according to another embodiment of the present disclosure, a first thickness T1 of a second electrode 610 provided in a first emission region E1 is greater than a second thickness T2 of a second electrode 620 provided in a second emission region E2 and a third thickness T3 of a second electrode 630 provided in the third emission region E3. In addition, the second thickness (T2) of the second electrode 620 provided in the second emission region (E2) is greater than the third thickness (T3) of the second electrode 630 provided in the third emission region (E3). In this specification, the thicknesses T1, T2, and T3 of the second electrodes 610, 620, and 630 respectively indicate the thickness at the center of each emission region E1, E2, and E3.

[0086] When the thicknesses T1, T2, and T3 of the second electrodes 610, 620, and 630 are large, electrical resistance can be reduced. Thus, increasing the thicknesses T1, T2, and T3 in the second electrodes 610, 620, and 630 is preferably beneficial for reducing resistance. However, when the electroluminescent display device according to the present disclosure is formed in a top emission type, increasing the thicknesses T1, T2, and T3 of the second electrodes 610, 620, and 630 may reduce light transmittance. Thus, the thicknesses T1, T2, and T3 of the second electrodes 610, 620, and 630 must be determined taking light transmittance into consideration.

[0087] Fig. 6 is a graph showing the change in light transmittance for each wavelength range according to a change in the second electrode according to an embodiment of the present disclosure. The graph of Fig. 6 shows results obtained by changing the thickness of the second electrode 610, 620 and 630 containing an alkali material such as MgAg (alloy of magnesium and silver) to 5.0 nm ~ 20.0 nm.

[0088] As in Fig. As shown in Figure 6, as the thickness of the second electrode 610, 620, and 630 increases, the light transmittance decreases accordingly. Specifically, the light transmittance is lowest in a short wavelength range, the light transmittance is highest in a long wavelength range, and the light transmittance is in the middle in a medium wavelength range.

[0089] Taking into account the difference in light transmittance for each wavelength range, as shown in Fig. 5, the first thickness T1 of the second electrode 610 provided in the first emission region E1 for emitting red color light corresponding to the long wavelength range is the largest, the third thickness T3 of the second electrode 630 provided in the third emission region E3 for emitting blue color light corresponding to the short wavelength range is the smallest, and the thickness T2 of the second electrode 620 provided in the second emission region E2 for emitting green color light corresponding to the medium wavelength range is midway between the first thickness T1 and the second thickness T3.

[0090] In more detail, when the light transmittance of each emission region E1, E2, and E3 is set to 70% or more than 70%, a method of adjusting the thickness T1, T2, and T3 in each second electrode 610, 620, and 630 is described as follows.

[0091] First, in the case of the first emission region E1 for emitting light having the long wavelength range, the first thickness T1 of the second electrode 610 may be set with respect to the wavelength range of 625 nm. In this case, when the first thickness T1 of the second electrode 610 is set to 17 nm or less than 17 nm, it is possible to maintain the light transmittance of 70% or more than 70%. Then, in the case of the second emission region E2 for emitting light having the medium wavelength range, the second thickness T2 of the second electrode 620 may be set with respect to the wavelength range of 525 nm. In this case, when the second thickness T2 of the second electrode 620 is set to 12 nm or less than 12 nm, it is possible to maintain the light transmittance of 70% or more than 70%.Then, in the case of the third emission region E3 for emitting light having the short wavelength range, the third thickness T3 of the second electrode 630 can be set with respect to the wavelength range of 450 nm. In this case, if the third thickness T3 of the second electrode 630 is set to 6 nm or less than 6 nm, it is possible to maintain the light transmittance of 70% or more than 70%. Accordingly, the thicknesses T1, T2, and T3 of each second electrode 610, 620, and 630 can be set taking into account the wavelength range of the light transmittance in a constructed display device.

[0092] Meanwhile, considering a resistance of the second electrode 610, 620, and 630, the thicknesses T1, T2, and T3 of the second electrode 610, 620, and 630 are preferably set to 1 nm or more than 1 nm. Thus, if the light transmittance is set to 70% or more than 70%, preferably, the first thickness T1 of the second electrode 610 provided in the first emission region E1 is set to be in a range of 1 nm to 17 nm, the second thickness T2 of the second electrode 620 provided in the second emission region E2 is set to be in a range of 1 nm to 12 nm, and the third thickness T3 of the second electrode 630 provided in the third emission region E3 is set to be in a range of 1 nm to 6 nm.

[0093] Instead of or in addition to varying the thickness, the light transmittance of the second electrodes 610, 620, and 630 may vary in different emission regions. There may be three emission regions corresponding to regions emitting red, green, and blue light, each of which has a corresponding second electrode. The light transmittance of the second electrode in the blue region may be greater than the light transmittance of the second electrode in the green region. The light transmittance of the second electrode in the green region may, in turn, be greater than the light transmittance of the second electrode in the red region.The variation in light transmittance can be achieved by varying the thickness of the second electrode, by varying the material properties of the second electrode in the emission regions, or by selecting a material for the second electrode that attenuates red light more than green light and green light more than blue light. By varying the light transmittance and / or thickness, light attenuation can be optimized, thereby improving the quality of images formed by the display device.

[0094] Although not shown in detail, the Wall 400 can be Fig. 5 include the first wall 410 and the second wall 420, as in Fig. 4 is shown.

[0095] Fig. 7 is a plan view illustrating an electroluminescent display device according to another embodiment of the present invention, which relates to an electroluminescent display device including an active region AA, a dummy region DA, and a pad region PA.

[0096] The active region AA functions as a display region for displaying an image. A dam is provided in the active region AA to define a first emission region E1, a second emission region E2, and a third emission region E3. A first emission layer 510 and a second electrode 610 are provided in the first emission region E1, a second emission layer 520 and a second electrode 620 are provided in the second emission region E2, and a third emission layer 530 and a second electrode 630 are provided in the third emission region E3.

[0097] The dummy region DA is provided so as to surround the active region AA. Specifically, the dummy region DA is provided on the left, right, lower, and upper peripheral sides of the active region AA. In the same way as the active region AA, a dam 400 for defining a dummy emission region DE is provided in the dummy region DA. Furthermore, a dummy emission layer 550 and a second dummy electrode 650 are provided in the dummy emission region DE. The dam is formed in a matrix configuration on the entire active region AA and the dummy region DA, thereby defining the emission regions E1, E2, and E3 and the dummy emission region DE. Fig. 7, Wall 400 is marked as a slanting line.

[0098] The dummy region DA is not the display region for displaying an image, so no light emission is generated in the dummy emission region DE of the dummy pixel provided in the dummy region DA. The dummy region DA is provided to realize a uniform profile between the emission layer 510, 520, and 530 formed in the center of the active region and the emission layer 510, 520, and 530 formed in the periphery of the active region AA.

[0099] When the emission layer 510, 520, and 530 is formed by a solution process, it may cause a difference between a drying rate of the emission layer 510, 520, and 530 formed in the center of a substrate and a drying rate of the emission layer 510, 520, and 530 formed in the edge of the substrate. Thus, when only the active region AA is formed without the dummy region DA, the profile of the emission layer 510, 520, and 530 formed in the center of the active region AA and the profile of the emission layer 510, 520, and 530 formed at the edge of the active region AA may be uneven, whereby the light emission in the center of the active region AA and the light emission at the edge of the active region may be uneven.

[0100] Thus, according to another embodiment of the present disclosure, when the dummy region DA is formed in the periphery of the active region AA and the emission layer 510, 520, and 530 is formed in the active region AA by the solution process, the dummy emission layer 550 is also formed in the dummy region DA by the solution process. In this case, even if the profile of the dummy emission layer 550 and the profile of the emission layers 510, 520, and 530 are uneven, it is possible to realize the uniform profile of the emission layers 510, 520, and 530 throughout the active region AA. For reference, Fig. 7, the dummy emission layer 550 in which no light emission is generated is marked as 'D' to distinguish the emission layer 510, 520 and 530 for emitting red R, green G and blue B light, which is shown in the Fig. 8 and Fig. 9 is applied immediately.

[0101] Furthermore, according to another embodiment of the present disclosure, when the second electrodes 610, 620, and 630 are formed in the active region AA by the solution process, the second dummy electrode 650 is also formed in the dummy region DA by the solution process. In this case, even if the profile of the second dummy electrode 650 and the profile of the second electrodes 610, 620, and 630 are uneven, it is possible to realize the uniform profile of the second electrodes 610, 620, and 630 throughout the active region AA.

[0102] The contact point area PA is planned in the periphery of the dummy area DA.

[0103] A circuit driver, such as a gate driver or a data driver, may be prepared in the pad region PA. The circuit driver may be formed in at least one of the left, right, lower, and upper peripheral sides of the dummy region DA. The circuit driver prepared in the pad region PA is connected to the circuit device within the active region AA via the dummy region DA.

[0104] According to another embodiment of the present disclosure, an interconnect layer 700 is formed on a top surface of the wall 400 while overlapping the wall 400. The interconnect layer 700 may include a plurality of first interconnect lines 710, a plurality of second interconnect lines 720, a plurality of first interconnect electrodes 715, a plurality of second interconnect electrodes 725, and a third interconnect line 730.

[0105] The plurality of first connection lines 710 are arranged in a first direction, for example, a horizontal direction, on top of the wall 400 provided in the active region AA and the dummy region DA, and the plurality of first connection lines 710 may extend to the pad region PA. The plurality of second connection lines 720 are arranged in a second direction, for example, a vertical direction, on top of the wall 400 provided in the active region AA and the dummy region DA, and the plurality of second connection lines 720 may extend to the pad region PA.

[0106] Each of the plurality of first connection electrodes 715 connects the first connection line 710 and the second electrodes 610, 620, and 630 to each other on the top surface of the dam 400 provided in the active region AA. Each of the plurality of second connection electrodes 725 connects the second connection line 720 and the second electrodes 610, 620, and 630 to each other on the top surface of the dam 400 provided in the active region AA. Accordingly, each of the plurality of first connection electrodes 715 and each of the plurality of second connection electrodes 725 may extend to the top surface of the second electrodes 610, 620, and 630 on the top surface of the dam 400 provided in the active region AA. However, each of the plurality of first connection electrodes 715 and each of the plurality of second connection electrodes 725 is not provided in the dummy region DA. This is because the dummy area DA is not intended as a light emission area.That is, there is no need to apply a voltage to the second dummy electrode 650 provided in the dummy region DA. That is, since the second electrodes 610, 620, and 630 are connected to the connection line 700, it is possible to apply a common voltage via the connection line 700. However, the second dummy electrode 650 is not connected to the connection line 700, thus there is no need to apply the common voltage thereto.

[0107] The third connection line 730 connects the plurality of first connection lines 710 in the pad region PA to each other and also connects the plurality of second connection lines 720 in the pad region PA to each other. The third connection line 730 may be connected to the circuit driver provided in the pad region PA.

[0108] Here, the material and structure in each of the plurality of first connecting lines 710, the plurality of second connecting lines 720, the plurality of first connecting electrodes 715, the plurality of second connecting electrodes 725, and the third connecting line 710 may be the same as those of Fig. 3, omitting a detailed description for the same parts.

[0109] Fig. 8 is a cross-sectional view illustrating an electroluminescent display device according to another embodiment of the present disclosure, corresponding to a cross section along II of Fig. 7 corresponds. Fig. Figure 8 shows that an active area AA in the structure of Fig. 2 is formed.

[0110] The electroluminescent display device according to another embodiment of the present disclosure may include a substrate 100, a circuit device layer 200, a first electrode 300, a wall 400, an emission layer 510, 520, and 530, a dummy emission layer 550, a second electrode 610, 620, and 630, a second dummy electrode 650, a second connection line 720, a second connection electrode 725, and a third connection line 730.

[0111] The circuit device layer 200 is formed in an active region AA, a dummy region DA, and a pad region PA. The circuit device layer 200 formed in the dummy region DA may be similar in structure to the circuit device layer 200 formed in the active region AA, and the circuit device layer 200 formed in the dummy region DA and the circuit device layer 200 formed in the active region AA may be formed by the same process, but not necessarily. That is, some of the signal lines, such as the signal lines, may be formed by the same process.A gate line, a data line, a power supply line, and a reference line may not be included in the circuit device layer 200 formed in the dummy region DA, or some of the switching thin-film transistor and the driving thin-film transistor may not be included in the circuit device layer 200 formed in the dummy region DA, whereby light emission cannot be generated in the dummy region DA. In some cases, the circuit device layer 200 formed in the dummy region DA may be incompletely configured so as not to actuate any of the switching thin-film transistor and the driving thin-film transistor.In the case where the circuit device layer 200 is formed in the pad region PA, the signal line provided in the active region AA may extend to the circuit device layer 200 formed in the pad region, and the thin-film transistor for light emission may not be included in the circuit device layer 200 formed in the pad region PA, other than in the active region AA. In other cases, a driving device for driving a circuit device provided in the active region AA may be included in the pad region PA. In this case, a thin-film transistor for the driving device may be included in the pad region PA.

[0112] The first electrode 300 is formed in the active region AA and the dummy region DA. The first electrode 300 formed in the dummy region DA may be structurally similar to the first electrode 300 formed in the active region AA, and the first electrode 300 formed in the dummy region DA and the first electrode 300 formed in the active region AA may be fabricated by the same process. The first electrode 300 may not be formed in the dummy region DA, whereby light emission cannot be generated in the dummy region DA.

[0113] The wall 400 is formed in the active region AA and the dummy region DA. The wall 400 formed in the dummy region DA may be structurally identical to the wall 400 formed in the active region AA, and the wall 400 formed in the dummy region DA and the wall 400 formed in the active region AA may be manufactured by the same process. Although not shown in detail, the wall 400 may include first and second walls 410 and 420, as shown in Fig. 4 is described.

[0114] The emission layer 510, 520, and 530 is formed in the active region AA. The emission layer 510, 520, and 530 may be formed by the solution process as shown in Fig. 2, and a detailed description for the emission layer 510, 520 and 530 is omitted.

[0115] The dummy emission layer 550 is formed in the dummy region DA. The structure of the dummy emission layer 550 may be the same as the structure of any of the first, second, and third emission layers 510, 520, and 530. That is, in the same manner as for the first emission layer 510, the dummy emission layer 550 may include a hole injection layer HIL, a hole transport layer HTL, and a red-emitting material layer EML(R). The dummy emission layer 550 may include a green-emitting material layer EML(G) instead of the red-emitting material layer EML(R), thereby allowing it to have the same structure as that of the second emission layer 520. The dummy emission layer 550 may include a blue-emitting material layer EML(B) instead of the red-emitting material layer EML(R), thereby allowing it to have the same structure as that of the third emission layer 530.Each of the hole injection layer HIL, the hole transport layer HTL, the red emitting material layer EML(R), the green emitting material layer EML(G), and the blue emitting material layer EML(B) constituting the dummy emission layer 550 may be formed by the solution process.

[0116] The plurality of dummy emission layers 550 may be provided in the dummy region DA, and the plurality of dummy emission layers 550 may be formed in the same structure, but not necessarily. Among the plurality of dummy emission layers 550, some of the dummy emission layers 550 may be formed in the same structure as that of the first emission layer 510, some other dummy emission layers 550 may be formed in the same structure as that of the second emission layer 520, and the remaining dummy emission layers 550 may be formed in the same structure as that of the third emission layer 530.

[0117] The second electrode 610, 620, and 630 is formed on the emission layer 510, 520, and 530 in the active region AA. The second electrode 610, 620, and 630 may be formed by the solution process, as in another embodiment of Fig. 2, omitting a detailed description for the second electrode 610, 620 and 630.

[0118] The second dummy electrode 650 is formed on the dummy emission layer 550 in the dummy region DA. The second dummy electrode 650 is formed in the same structure as the second electrodes 610, 620, and 630. That is, the second dummy electrode 650 may include a mixed material obtained by mixing a conductive material such as silver (Ag) with at least one of an alkali component, a metal oxide material, and a metal carbonate material. The second dummy electrode 650 may be formed by preparing the mixed material obtained by mixing the conductive material such as silver (Ag) with at least one of the alkali component, the metal oxide material, and the metal carbonate material, and performing the dissolution process on the mixed material using an inkjet device.Furthermore, the second dummy electrode 650 may be formed with the same thickness as that of the second electrodes 610, 620, and 630. In this present disclosure, the thickness of the second dummy electrode 650 indicates the thickness at the center of the dummy emission region DE.

[0119] The second connection line 720 is formed on a top surface of the wall 400 of the active region AA, and the second connection electrode 725 extends from the second connection line 720 to a top surface of the second electrode 610, 620, and 630. The third connection line 730 is formed in the pad region PA. The wall 400 may not be provided in the pad region PA, whereby the third connection line 730 may be formed on the circuit device layer 200.

[0120] Fig. 9 is a cross-sectional view illustrating an electroluminescent display device according to another embodiment of the present disclosure, corresponding to a cross section along II of Fig. 7 corresponds. Fig. Figure 9 shows that an active area AA in the same structure as that of Fig. 5 is formed. Thus, the structure of Fig. 9 except for a thickness T1, T2 and T3 of a second electrode 610, 620 and 630 and a thickness T1 of a second dummy electrode 650 equal to the structure of Fig. 8, which only describes the different structures in detail.

[0121] Referring to Fig. 9, a first thickness T1 of a second electrode 610 provided on a first emission layer 510 is greater than a second thickness T2 of a second electrode 620 provided on a second emission layer 502, and a third thickness T3 of a second electrode 630 provided on a third emission layer 503, and the second thickness T2 of the second electrode 620 provided on the second emission layer 520 is greater than the third thickness T3 of the second electrode 630 provided on the third emission layer 530, as described above in Fig. 5 is described.

[0122] In addition, a second dummy electrode 650 has a thickness T1 equal to the first thickness T1 of the second electrode 610 provided on the first emission layer 510. In this case, the second dummy electrode 650 may be formed by spraying a solution using an inkjet nozzle, the amount of the sprayed solution being equal to the amount of the solution for the second electrode 610 provided on the first emission layer 510, but not necessarily. The second dummy electrode 650 may have a thickness T2 equal to the second thickness T2 of the second electrode 620 provided on the second emission layer 520, or may have a thickness T3 equal to the third thickness T3 of the second electrode 630 provided on the third emission layer 530.

[0123] Meanwhile, the plurality of second dummy electrodes 650 are provided in the dummy region DA, and the plurality of second dummy electrodes 650 may have the same thickness. Light emission is not generated in the dummy region DA. Therefore, it is not necessary to consider the light transmittance when adjusting the thickness of the second dummy electrode 650 provided in the dummy region DA.

[0124] According to the present disclosure, both the emission layer and the second electrode can be formed by the solution process, making it possible to reduce manufacturing costs and processing time. Specifically, the second electrode contains the material possessing the electron injection property and the electron transport property, making it possible to remove the electron injection layer and the electron transport layer from the emission layer, thus shortening the processing time for forming the emission layer.

[0125] The following list provides aspects of the disclosure and forms part of the description. These aspects may be combined in any compatible combination beyond those expressly stated. The aspects may also be combined with any compatible features described herein: In one aspect, an electroluminescent display device is provided, comprising, among other things: a substrate; a first electrode provided on the substrate; a dam configured to cover one end of the first electrode and define an emission region; an emission layer provided in the emission region defined by the dam; and a second electrode provided on the emission layer, wherein the emission layer includes a hole injection layer, a hole transport layer, and an emission material layer, and the second electrode includes a material having the electron injection property and the electron transport property.

[0126] Preferably, the emission layer does not contain an electron injection layer (EIL) and / or an electron transport layer (ETL) to transfer electrons.

[0127] Preferably, the material having the electron injection property and the electron transport property contains at least one of an alkali material, a metal oxide, and a metal carbonate.

[0128] According to the invention, the second electrode is provided in the emission region, and a connection layer connected to the second electrode is additionally provided on the wall.

[0129] In some embodiments, the emission layer includes a first emission layer provided in the first emission region, a second emission layer provided in the second emission region, and a third emission layer provided in the third emission region.

[0130] Preferably, the second electrode is provided on each of the first emission layer, the second emission layer and the third emission layer.

[0131] Preferably, a first thickness of the second electrode provided on the first emission layer, a second thickness of the second electrode provided on the second emission layer, and a third thickness of the second electrode provided on the third emission layer are different from each other.

[0132] In some embodiments, the first emission layer emits light of red color, the second emission layer emits light of green color, and the third emission layer emits light of blue color.

[0133] In some embodiments, the first thickness is greater than the second thickness and the third thickness, and the second thickness is greater than the third thickness.

[0134] In some embodiments, a profile of the emission layer is provided in such a manner that a height of an upper end of the emission layer in the center of the emission region is relatively lower than a height of an upper end of the emission layer at the end of the emission region, and a profile of the second electrode corresponds to the profile of the emission layer.

[0135] In another aspect, an electroluminescent display device is provided, comprising, among other things: a substrate; a first electrode provided on the substrate; a dam configured to cover one end of the first electrode and define a first emission region, a second emission region, and a third emission region; a first emission layer provided in the first emission region; a second emission layer provided in the second emission region; a third emission layer provided in the third emission region; a second electrode provided on each of the first emission layer, the second emission layer, and the third emission layer;and a connecting layer for connecting the second electrode provided on the first emission layer, the second electrode provided on the second emission layer, and the second electrode provided on the third emission layer to each other.;

[0136] In some embodiments, the interconnection layer includes a plurality of first interconnection lines extending in a first direction on a top surface of the wall and a plurality of first interconnection electrodes for connecting the plurality of first interconnection lines to the second electrodes provided on the first emission layer, the second emission layer, and the third emission layer, respectively.

[0137] In some embodiments, the interconnection layer additionally includes a plurality of second interconnection lines extending in a second direction different from the first direction on the top surface of the wall, and a plurality of second interconnection electrodes for connecting the plurality of second interconnection lines to the second electrodes provided on the first emission layer, the second emission layer, and the third emission layer, respectively.

[0138] In one embodiment, the connecting line further includes a third connecting line for connecting the plurality of first connecting lines and the plurality of second connecting lines, and the third connecting line is provided in the periphery of the wall.

[0139] In some embodiments, each of the first, second, and third emissive layers includes a hole injection layer, a hole transport layer, and an emissive material layer.

[0140] In some embodiments, each of the second electrodes provided on the first, second, and third emission layers, respectively, includes a material having an electron injection property and an electron transport property.

[0141] In some embodiments, a first thickness of the second electrode provided on the first emission layer, a second thickness of the second electrode provided on the second emission layer, and a third thickness of the second electrode provided on the third emission layer are different from each other.

[0142] In some embodiments, the first emission layer emits light of red color, the second emission layer emits light of green color, and the third emission layer emits light of blue color.

[0143] In some embodiments, the first thickness is greater than the second thickness and the third thickness, and the second thickness is greater than the third thickness.

[0144] In another aspect, an electroluminescent display device is provided, comprising, among other things: a substrate including an active region for displaying an image and a dummy region provided in the periphery of the active region; a wall configured to define an emission region on the active region of the substrate and a dummy emission region on the dummy region of the substrate; a plurality of emission layers provided in the emission region defined by the wall; a plurality of electrodes respectively provided on the plurality of emission layers; a plurality of dummy emission layers provided in the dummy emission region defined by the wall; a plurality of dummy electrodes respectively provided on the plurality of dummy emission layers; and a connection layer for connecting the plurality of electrodes to each other.

[0145] Preferably, the connection layer is not connected to the plurality of dummy electrodes.

[0146] Preferably, the interconnection layer includes a plurality of first interconnection lines extending in a first direction on a top surface of the wall, and a plurality of first interconnection electrodes for connecting the plurality of first interconnection lines to the plurality of electrodes.

[0147] Preferably, the plurality of first connecting lines are provided in the active region and the dummy region, and the plurality of first connecting lines are provided in the active region.

[0148] Preferably, the substrate additionally includes a pad region provided in the periphery of the dummy region, and the interconnection layer further includes an additional interconnection line for connecting the plurality of first interconnections to each other in the pad region.

[0149] Preferably, the emission layer includes a hole injection layer, a hole transport layer, and an emission material layer, and the second electrode includes a material having the electron injection property and the electron transport property.

[0150] Preferably, the emission layer includes a first emission layer provided in a first emission region, a second emission layer provided in a second emission region, and a third emission layer provided in a third emission region, wherein the second electrode is provided on each of the first emission layer, the second emission layer, and the third emission layer.

[0151] Preferably, a first thickness of the second electrode provided on the first emission layer, a second thickness of the second electrode provided on the second emission layer, and a third thickness of the second electrode provided on the third emission layer are different from each other.

[0152] Preferably, the first emission layer emits red color light, the second emission layer emits green color light, and the third emission layer emits blue color light, and the first thickness is greater than the second thickness and the third thickness, and the second thickness is greater than the third thickness.

Claims

[1] Electroluminescent display device comprising: a substrate (100); a first electrode (300) provided on the substrate (100); a wall (400) configured to cover a first end of the first electrode (300) and define an emission region (E1, E2, E3); an emission layer (510, 520, 530) provided in the emission area (E1, E2, E3) defined by the wall (400); and a second electrode (610, 620, 630) provided on the emission layer (510, 520, 530), wherein a profile of a top side of the second electrode (610, 620, 630) has a first curvature in the center of the emission region (E1, E2, E3) and a second curvature at the edge of the emission region (E1, E2, E3), and the second curvature is greater than the first curvature, wherein a connecting layer (700) connected to the second electrode (610, 620, 630) is provided on the wall (400) and is different from the second electrode (610, 620, 630), wherein the substrate (100) is formed from an opaque material, wherein the connecting layer (700) overlaps the second electrode (610, 620, 630) only at the edge of the emission region (E1, E2, E3). [2] The electroluminescent display device according to claim 1, comprising a first emission layer (510) provided in a first emission region (E1), a second emission layer (520) provided in a second emission region (E2), and a third emission layer (530) provided in a third emission region (E3), wherein the first emission layer (510), the second emission layer (520), and the third emission layer (530) each contain a hole injection layer (HIL), a hole transport layer (HTL), and an emission material layer (EML(R), EML(G), EML(B)); wherein a second electrode (610, 620, 630) is provided on each of the first emission layer (510), the second emission layer (520), and the third emission layer (530), the second electrodes (610, 620, 630) being separated from each other. [3] An electroluminescent display device comprising: a substrate (100) including an active area (AA) for displaying an image and a dummy area (DA) provided around the periphery of the active area (AA); a plurality of first electrodes (300) provided on the substrate (100) in the active region (AA) and optionally the dummy region (DA); a wall (400) configured to cover one end of each first electrode (300) and to define a plurality of emission regions (E1, E2, E3) on the active region (AA) of the substrate (100) and a plurality of dummy emission regions (DE) on the dummy region (DA) of the substrate (100); a plurality of emission layers (510, 520, 530) each provided on the plurality of emission areas (E1, E2, E3) defined by the wall (400); a plurality of second electrodes (610, 620, 630) respectively provided on the plurality of emission layers (510, 520, 530); a plurality of dummy emission layers (550) each provided in the plurality of dummy emission areas (DE) defined by the wall (400); a plurality of dummy electrodes (650) each provided on the plurality of dummy emission layers (550); and a connecting layer (700) for connecting the plurality of second electrodes (610, 620, 630) to each other, wherein the connecting layer (700) is different from the plurality of second electrodes (610, 620, 630); wherein the substrate (100) is formed from an opaque material, wherein the connecting layer (700) overlaps the plurality of second electrodes (610, 620, 630) only at the edge of the respective emission region (E1, E2, E3). [4] The electroluminescent display device according to claim 3, wherein the connection layer (700) is not connected to the plurality of dummy electrodes (650). [5] The electroluminescent display device according to claim 3 or 4, wherein the connecting layer (700) includes a plurality of first connecting lines (710) extending in a first direction on an upper surface of the wall (400), and a plurality of first connecting electrodes (715) for connecting the plurality of first connecting lines (710) to the plurality of electrodes (610, 620, 630), the plurality of first connecting lines (710) are provided in the active region (AA) and the dummy region (DA), and the plurality of first connection electrodes (715) are provided in the active region (AA). [6] The electroluminescent display device according to any one of claims 3 to 5, wherein the substrate (100) further includes a pad region (PA) provided around the periphery of the dummy region (DA), and the interconnection layer (700) further includes an additional interconnection line (730) for connecting the plurality of first interconnection lines (710) to each other in the pad region (PA). [7] The electroluminescent display device according to any one of claims 3-6, wherein the plurality of emission layers (510, 520, 530) includes a first emission layer (510) provided in a first emission region (E1), a second emission layer (520) provided in a second emission region (E2), and a third emission layer (530) provided in a third emission region (E3), the plurality of second electrodes (610, 620, 630) includes a second electrode (610, 620, 630) on each of the first emission layer (510), the second emission layer (520), and the third emission layer (530). [8] The electroluminescent display device according to claim 7, wherein a first thickness (T1) of the second electrode (610) provided on the first emission layer (510), a second thickness (T2) of the second electrode (620) provided on the second emission layer (520), and a third thickness (T3) of the second electrode (630) provided on the third emission layer (530) are different from each other, preferably the first thickness (T1) is greater than the second thickness (T2) and the third thickness (T3) and the second thickness (T2) is greater than the third thickness (T3). [9] An electroluminescent display device comprising: a substrate (100); a plurality of first electrodes (300) provided on the substrate (100); a wall (400) configured to cover one end of each first electrode (300) and to define a first emission region (E1), a second emission region (E2), and a third emission region (E3); a first emission layer (510) provided in the first emission region (E1); a second emission layer (520) provided in the second emission region (E2); a third emission layer (530) provided in the third emission region (E3); a second electrode (610, 620, 630) on each of the first emission layer (510), the second emission layer (E2) and the third emission layer (E3); and a connecting layer (700) for connecting the second electrode (610) provided on the first emission layer (510), the second electrode (620) provided on the second emission layer (520), and the second electrode (630) provided on the third emission layer (530) to each other, wherein the connecting layer (700) is provided on an upper surface of the wall (400) and is different from the second electrode (610, 620, 630); wherein the substrate (100) is formed from an opaque material, wherein the connecting layer (700) overlaps the respective second electrode (610, 620, 630) only at the edge of the respective emission region (E1, E2, E3). [10] Electroluminescent display device according to one of the preceding claims, wherein at least one of the second electrodes (610, 620, 630) has a center thickness (T1, T2, T3) in the center of the corresponding emission region (E1, E2, E3) and an edge thickness at the edge of the corresponding emission region (E1, E2, E3), and the center thickness and the edge thickness are different, preferably the edge thickness is greater than the center thickness. [11] An electroluminescent display device according to any one of the preceding claims, wherein at least one of the emission layers has a first height (h1) in the center of the corresponding emission region (E1, E2, E3) and a second height (h2) at an edge of the corresponding emission region (E1, E2, E3), and the first height (h1) is lower than the second height (h2); and / or a profile of the second electrode (610, 620, 630) on the at least one of the emission layers (510, 520, 530) corresponds to a profile of the corresponding emission layer (510, 520, 530). [12] An electroluminescent display device according to any one of claims 2-11, wherein: the second electrode (610) on the first emission layer (510) has a first light transmittance, the second electrode (620) on the second emission layer (520) has a second light transmittance, the second electrode (630) on the third emission layer (530) has a third light transmittance; and the first, second and third light transmittances are different from each other. [13] An electroluminescent display device according to any one of the preceding claims, wherein at least one of the second electrodes (610, 620, 630) is thicker than the connecting layer (700). [14] An electroluminescent display device according to any preceding claim, wherein the wall (400) comprises a first wall (410) and a second wall (420), the second wall (420) being formed on the first wall (420). [15] The electroluminescent display device according to any one of claims 2 or 9-14, wherein the connection layer (700) includes a plurality of first connection lines (710) extending in a first direction on an upper surface of the wall (400), and a plurality of first connection electrodes (715) for connecting the plurality of first connection lines (710) to at least one of the second electrodes (610, 620, 630) provided on the at least one first emission layer (510), the second emission layer (520) and the third emission layer (530). [16] The electroluminescent display device according to claim 5 or 15, wherein the connection layer (700) includes a plurality of second connection lines (720) extending in a second direction different from the first direction on an upper surface of the wall (400), and a plurality of second connection electrodes (725) for connecting the plurality of second connection lines (720) to at least one of the second electrodes (610, 620, 630) provided on the at least one first emission layer, the second emission layer, and the third emission layer. [17] The electroluminescent display device according to claim 16, wherein the interconnection layer (700) further includes a third interconnection line (730) for interconnecting the plurality of first interconnection lines (710) and the plurality of second interconnection lines (720), and the third interconnection line (730) is provided around the periphery of the wall (400). [18] An electroluminescent display device according to any one of the preceding claims, wherein at least one of the emission layers (510, 520, 530) contains a hole injection layer (HIL), a hole transport layer (HTL) and an emission material layer (EML(R), EML(G), EML(B)) and / or the at least one second electrode (610, 620, 630) provided on the at least one emission layer contains a material having an electron injection property and an electron transport property. [19] An electroluminescent display device according to claim 18, wherein the material having an electron injection property and an electron transport property contains at least one of an alkali material, a metal oxide, and a metal carbonate. [20] A method of manufacturing an electroluminescent display device, comprising: Providing a substrate (100), Providing a circuit device layer (200), wherein the circuit device layer (200) comprises at least one thin-film transistor having a gate electrode (230), an active layer (210), a source electrode (250a) and a drain electrode (250b), Forming a first electrode (300) on the circuit device layer (200); Forming a wall (400) in a matrix configuration to define a plurality of pixels, each having an emission region (E1, E2, E3); Forming an emission layer (510, 520, 530) in each of the emission regions (E1, E2, E3) using a solution process; Forming a second electrode (610, 620, 630) in each emission region (E1, E2, E3) by a solution process; Forming a connecting layer (700) on a top surface of the wall (400) to connect the second electrode (610, 620, 630), the connecting layer (700) being different from the second electrode (610, 620, 630); wherein the substrate (100) is formed from an opaque material, wherein the connecting layer (700) overlaps the second electrode (610, 620, 630) only at the edge of the emission region (E1, E2, E3).

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