Spin-drying cleaning device

Abstract

A centrifugal cleaning device (1) comprising: a centrifugal table (30) with a holding surface (300a) for holding a workpiece (W) to be cleaned; a rotating means (32) for rotating the centrifugal table (30); a cleaning nozzle (60) for ejecting a mixture of cleaning water and air onto the workpiece (W) held by the centrifugal table (30); a horizontal movement means (40) for moving the cleaning nozzle (60) horizontally over an upper side of the centrifugal table (30); a scattering prevention cover (5) surrounding the centrifugal table (30) and through which the mixture, which is radially scattered from the centrifugal table when a centrifugal force due to a rotation of the centrifugal table acts on the mixture ejected from the cleaning nozzle (60) onto the workpiece (W), is caused to flow downwards;and a lifting means (16) for raising and lowering the scatter prevention cover (5) in an axial direction of a shaft (320) for rotating the centrifugal table (30), wherein the scatter prevention cover (5) comprises: an opening (50) through which the centrifugal table (30) can pass, an annular perimeter plate (51) designed such that its section is inclined in a gradually increasing direction from the opening (50), a side plate (52) surrounding the perimeter plate (51) and extending in a lifting direction of the centrifugal table (30), and an upper plate (53) connecting the side plate (52) and a lower end of the perimeter plate (51), wherein the centrifugal cleaning device (1) further comprises: a scatter prevention section (7;7A), which is arranged on or extends over the upper plate (53) and prevents the force of air ejected from the cleaning nozzle (60) from acting on water that collects on an upper surface of the upper plate (53) of the scatter prevention cover (5), so that the water that collects on the upper surface of the upper plate (53) is splashed when air is ejected from the cleaning nozzle (60) to dry a circumferential edge (Wd) of the workpiece (W) after cleaning, during a series of cleaning and drying operations involving positioning the opening (50) over an upper surface (Wb) of the workpiece (W) held by the centrifugal table (30), ejecting the mixed liquid from the cleaning nozzle (60) to clean the workpiece, and then ejecting air from the cleaning nozzle to dry the workpiece (W).

Description

BACKGROUND OF THE INVENTION AREA OF THE INVENTION

[0001] The present invention relates to a centrifugal cleaning device for cleaning a workpiece to be cleaned, such as a semiconductor wafer. DESCRIPTION OF THE RELATED STATE OF THE ART

[0002] A grinding device for grinding a workpiece, such as a semiconductor wafer, by means of a grinding stone and a polishing device for polishing a workpiece with a polishing pad includes a centrifugal cleaning device in which a centrifugal table, which holds the workpiece after processing, is rotated at high speed and the workpiece is cleaned while cleaning water is supplied to it (see, for example, the Japanese published patent number 2014-180739). SUMMARY OF THE INVENTION

[0003] Where a workpiece is supported by a substrate (support substrate), chips are deposited between the perimeter of the substrate and the circumference of the workpiece, necessitating a positive cleaning of the workpiece's perimeter. Accordingly, a binary fluid, obtained by mixing air and cleaning water, is blown onto the edge or perimeter of the workpiece to remove the chips. It should be noted that one reason why chips tend to be deposited between the perimeter of the substrate and the circumference of the workpiece is, for example, that the workpiece's perimeter edge is chamfered to have an arcuate cross-sectional shape, creating a cavity at the interface between the substrate and the workpiece.

[0004] To prevent the binary fluid expelled from the centrifugal cleaning device from being swirled onto the upper surface of the workpiece and re-adhering to it, an inclined surface surrounding the workpiece is provided in the vicinity of the centrifugal table. This ensures that the cleaning waste fluid flows downwards along the inclined surface to drip into a drain container or similar and be drained away. As the cleaning waste fluid, subjected to a centrifugal force due to the rotation of the centrifugal table, moves radially towards the outer edge of the workpiece, the centrifugal cleaning device incorporates a spillage prevention cover surrounding the centrifugal table, which itself holds the workpiece.

[0005] Furthermore, after cleaning with the binary fluid, water droplets tend to collect at the transition between the circumference of the substrate and the circumference of the workpiece; accordingly, air is blown onto the circumference of the cleaned workpiece to dry the transition between the circumference of the substrate and the circumference of the workpiece.

[0006] However, if the circumferential section of the workpiece is positively cleaned with the binary fluid, a pool can form on the scatter prevention cover. Furthermore, the air expelled to the circumferential section of the workpiece for drying can splash the water that collects on the scatter prevention cover, thereby re-wetting the dried workpiece.

[0007] It is an object of the present invention to provide a centrifugal cleaning device that is capable of preventing a workpiece that has been dried after cleaning from becoming re-wetted.

[0008] In accordance with one aspect of the present invention, a centrifugal cleaning device is provided, comprising: a centrifugal table with a holding surface for holding a workpiece to be cleaned; a rotating means for rotating the centrifugal table; a cleaning nozzle for ejecting a mixture of cleaning water and air onto the workpiece held by the centrifugal table; a horizontal movement means for moving the cleaning nozzle horizontally over an upper side of the centrifugal table; and a scattering prevention cover surrounding the centrifugal table, by which the mixture that is radially scattered from the centrifugal table when a centrifugal force is exerted on the mixture ejected from the cleaning nozzle onto the workpiece due to rotation of the centrifugal table is caused to beto flow downwards; and a lifting means for raising and lowering the scatter prevention cover in an axial direction of a shaft for rotating the centrifugal table, the scatter prevention cover having an opening through which the centrifugal table can pass, an annular perimeter plate designed such that its cross-section is inclined in a gradually increasing direction from the opening, a side plate surrounding the perimeter plate and extending in a lifting direction of the centrifugal table, and an upper plate connecting the side plate and a lower end of the perimeter plate. The centrifugal cleaning device further includes a scatter prevention section which prevents a force of air expelled from the cleaning nozzle from acting on water that collects on an upper surface of the upper plate of the scatter prevention cover, so that water that collects on the upper surface of the upper plate,not at the time of expulsion of air from the cleaning nozzle to dry a circumferential edge of the workpiece after cleaning, during a series of cleaning and drying operations involving positioning the opening over an upper surface of the workpiece held by the centrifugal table, expulsion of the mixing fluid from the cleaning nozzle to clean the workpiece, and subsequent expulsion of air from the cleaning nozzle to dry the workpiece.

[0009] Preferably, the scatter prevention section includes a plate with an inclined surface extending from the opening of the scatter prevention cover towards a circumferential edge of the upper plate along a trajectory of the cleaning nozzle, being higher on the opening side and lower on the circumferential edge side, and a drain opening formed at the circumferential edge through which the water drips down from a lower end edge of the plate with an inclined surface.

[0010] Alternatively, the scatter prevention section includes a porous element arranged on the upper plate of the scatter prevention cover along a trajectory of the cleaning nozzle.

[0011] In accordance with the centrifugal cleaning device of the present invention, the force of the air can be absorbed by the scatter prevention section to ensure that the water that collects on the upper surface of the upper plate of the scatter prevention cover is not splashed by the air. Therefore, a situation in which water droplets splashed by the air re-adhere to the dried workpiece can be prevented.

[0012] In the case where the scatter prevention section includes the inclined plate extending from the opening of the scatter prevention cover towards a circumferential edge of the upper plate along the trajectory of the cleaning nozzle, being higher on the opening side and lower on the circumferential edge side, and the drain opening formed at the circumferential edge through which the water drips from the lower end edge of the inclined plate, it is possible, by preventing the force of the air expelled from the cleaning nozzle from acting on the water collecting on the upper surface of the upper plate during the drying of the workpiece's circumferential edge, to prevent the water collecting on the upper surface of the upper plate from being splashed by the air.This prevents a situation from occurring in which water droplets splashed by the air adhere again to the dried workpiece.

[0013] In cases where the scatter prevention section includes a porous element positioned on the upper plate of the scatter prevention cover along the trajectory of the cleaning nozzle, it is possible to prevent the force of the air expelled from the cleaning nozzle from acting on the water collecting on the upper surface of the upper plate during the drying of the workpiece's circumferential edge. This prevents the water collecting on the upper surface of the upper plate from being splashed by the air. Therefore, it is possible to prevent a situation where water droplets splashed by the air would re-adhere to the dried workpiece.

[0014] The above and other tasks, features and advantages of the present invention and the manner of its implementation will become clearer by studying the following description and attached claims, with reference to the accompanying drawings, which show some preferred embodiments of the invention, and the invention itself will be best understood by this. List of characters Fig. Figure 1 is a perspective view showing an example of a centrifugal cleaning device in which a scatter prevention section has a plate with an inclined surface and a drain opening; Fig. Figure 2 is a perspective view showing an example of the centrifugal cleaning device in a state where a scatter prevention cover is lowered; Fig. Figure 3 is a perspective view showing an example of the centrifugal cleaning device in which a scatter prevention section is a porous element arranged on an upper plate of the scatter prevention cover; Fig. Figure 4 is a sectional view of the centrifugal cleaning device, in which the scatter prevention section includes the inclined plate and the drain opening, to illustrate a condition in which air is expelled from a cleaning nozzle to dry a circumferential edge of a workpiece; Fig. Figure 5 is a sectional view of the centrifugal cleaning device, wherein the centrifugal prevention section is a porous element arranged on the upper plate of the scatter prevention cover, to illustrate a condition in which air is expelled from a cleaning nozzle to dry a circumferential edge of a workpiece; Fig. Figure 6 is a sectional view to illustrate a condition in which a mixed fluid is ejected from a cleaning nozzle to clean a workpiece in a conventional centrifugal cleaning device; and Fig. Figure 7 is a sectional view to illustrate a condition in which air is expelled to dry a circumferential edge of a workpiece in a conventional centrifugal cleaning device. DETAILED DESCRIPTION OF PREFERRED EXECUTION FORMS

[0015] One in Fig. 1 illustrated spin cleaning device 1 indicates: a spin table 30 , which provides a holding surface 300a for holding a workpiece to be cleaned W features; a rotating means 32 for rotating the spin table 30 ; a cleaning nozzle 60 , which is a mixed fluid (binary fluid) of cleaning water and air to which the centrifuge table passes 30held workpiece W emits; a horizontal means of motion 40 for horizontal movement of the cleaning nozzle 60 on one upper side of the spin table 30 ; a dispersion prevention cover 5 , which the spin table 30 surrounds and is caused by the fact that the mixed liquid, which is removed from the centrifugal table 30 is distributed radially when the centrifugal table rotates. 30 a centrifugal force on the area from the cleaning nozzle 60 to the workpiece W The expelled mixed fluid flows downwards; and a lifting device 16 for raising and lowering the scatter prevention cover 5 in an axial direction (Z-direction) of a shaft 320 for rotating the spin table 30 The spin-drying cleaning device 1It can be used alone or can be used by being incorporated into a grinding device, a polishing device, a cutting device, or a multi-purpose device that has several of the functions of these devices.

[0016] The workpiece W One example is a so-called laminated wafer. A laminated wafer is created by laminating a circular semiconductor wafer. W1 and a substrate (support substrate) W2 , which has the same diameter as the semiconductor wafer W1 exhibits, obtained through the use of an adhesive or similar substance. Handling the semiconductor wafer W1 and the substrate W2 as a body, the handling of the thin semiconductor wafer becomes W1 improved and it can prevent the semiconductor wafer from W1 is warped or broken at the time of processing.

[0017] The semiconductor wafer W1 For example, a circular wafer containing a silicon starting material or similar. A front surface Wa of the semiconductor wafer W1 , which in Fig. The one that is directed downwards is formed with several components that are embedded in the laminated substrate. W2 be protected. A rear surface Wb of the semiconductor wafer W1 , which are on the front surface Wa The opposite side is an area that is subject to a grinding process and is a surface to be cleaned. Wb of the workpiece W It should be noted that the workpiece W is not limited to materials containing silicon, but may also contain gallium arsenide, sapphire, ceramic, resin, gallium nitride, silicon carbide or similar materials.

[0018] It should be noted that the workpiece Wfor example, only the circular semiconductor wafer W1 It can be a material that has a silicon base material or similar. Alternatively, the workpiece can be W a so-called TAIKO wafer, in which the area of ​​the back surface Wb of the semiconductor wafer W1 , which has building elements on the front surface Wa is formed, which corresponds to the component area, is ground to form a circular recess and in the area of ​​the rear surface Wb to form a ring-shaped projection for reinforcement, corresponding to a circumferential excess area and surrounding the component area.

[0019] The spin cleaning device 1 closes a container section 2 one that accommodates the aforementioned components. The container section 2 includes: a case 20, whose outer shape in top view is, for example, a polygon; an angle cover 21 , located on a rear side section (+X-direction side) of the housing 20 rising from an upper end face; and an upper cover 22 , which comes with the angled cover 21 is connected and the case 20 Covered from above. The top cover 22 In top view, it has the same shape as the housing seen from the +Z direction side. 20 , and its end on the +Y direction side is at an upper end section of the angle cover 21 fastened by a fastener, such as a bolt.

[0020] The case 20 closes an outer circumferential plate 200 , one in Fig. 4 illustrated inner circumferential plate 201 and a base plate 202 one that has a lower end of the outer circumferential plate 200and a lower end of the inner circumferential plate 201 is connected. A space with a shape recessed in its vertical cross-section, which is connected by the outer circumferential plate. 200 , the inner circumferential plate 201 and the base plate 202 The area surrounding the unit is a space where the cleaning fluid can be temporarily stored. A drain pipe, such as a drain hose or similar, is connected to the base plate. 202 connected, and the drain pipe may be connected to a non-illustrated drain tank.

[0021] The scatter prevention cover 5 includes: an opening 50 , through which the spin table 30 can pass through it; a ring-shaped border plate 51 , which is designed in such a way that its section is inclined so that, as in Fig. 4 shown, moving away from the opening 50gradually enlarged; a side plate 52 , which is the border plate 51 surrounds and is in a lifting direction of the spin table 30 (Z-axis direction) extends; and an upper plate 53 , which the side panel 52 and a lower end of the edging plate 51 connects. In Fig. 1 represents a state in which the side plate 52 for cleaning the workpiece W has been moved upwards and its upper end surface is flush with a lower surface of the top cover 22 came into contact.

[0022] The side panel 52 is a tubular body that has a polygonal shape in top view and is smaller than and similar to the casing 20 is and seen from the +Z direction side inside the housing 20 is arranged. As in Fig. As shown in 2, the side panel 52 inside the case20 lowered to assume an open state when the workpiece W to the spin table 30 is attached to or removed from it, and is taken from inside the housing. 20 lifted to assume a closed state, thus preventing the mixing liquid or similar from being scattered when the workpiece W , as in Fig. 1 is shown, cleaned and dried. The side panel 52 and the top cover 22 They can be designed using a transparent element, such as an acrylic sheet, so that, for example, the operator can see the condition of the workpiece. W can be checked during cleaning.

[0023] A sealing element not illustrated, such as rubber, can be used at the upper end surface of the side plate. 52 be arranged so that, when the side plate 52is raised to assume the closed state, a bottom surface of a circumferential edge section of the upper cover 22 comes into contact with the sealing element to separate the side plate 52 and the upper cover 22 to seal hermetically.

[0024] The opening 50 the scatter prevention cover 5 is in accordance with the circular outer shape of the ejection table 30 formed in a circular shape. As in Fig. The border plate shown in section 4 is... 51 so designed that their section of the opening 50 is inclined, gradually increasing in size, and the surrounding plate is ring-shaped in plan view. In the case of the Fig. The illustrated example is the area of ​​the border plate. 51 furnished smaller than the area of ​​the upper plate 53However, this is not a limiting factor. Furthermore, the angle of inclination and similar aspects of the edging plate are also relevant. 51 set to values ​​that, with regard to the amount of cleaning fluid from the nozzle 60 are appropriate for ejected mixed liquid and the like. As in the Fig. 1 and Fig. As illustrated in section 4, the border plate forms the 51 and the top plate 53 , with the side plate and the lower end of the edging plate 51 through the top plate 53 connected, a ground section of the scatter prevention cover 5 out of.

[0025] The spin table 30 , which is in the container section 2 is arranged and the workpiece W holds, closes a suction holding section 300 , which, for example, has a circular outer shape including a porous element or similar, and the workpiece Wheld in place by a vacuum, and a frame body 301 one that holds the suction section 300 supported. The suction retention section 300 is connected to a suction source (not illustrated) and holds the workpiece W on a flat holding surface 300a via a negative pressure that exposes an area of ​​the suction holding section 300 and with an upper end face of the frame body 301 is flush.

[0026] The rotational medium 32 closes a wave 320 , which have an upper end with the bottom surface of the spin table 30 connected has a motor 321 , which is connected to the lower end of the shaft 320 is connected and generates a rotational driving force, etc. The axial direction of the shaft 320 , which the spin table 30 The direction of rotation is the Z-axis direction (vertical direction).

[0027] For example, the one in Fig. 4 wave shown 320 an apron section 305 one that extends from an outer circumferential surface of the wave 320 extends horizontally and then slopes further down in the -Z direction. Through the skirt section 305 This prevents the parts from being thrown from the spin table. 30 downward flowing mixed fluid between the wave 320 and the inner circumferential plate 201 enters.

[0028] The lifting device 16 for raising and lowering the scatter prevention cover 5 in the axial direction (Z-axis direction) of the shaft 320 , which the spin table 30 The rotating mechanism is an air cylinder or pneumatic cylinder, an electrically driven cylinder, a ball screw mechanism, or similar. The lifting device 16 for example, with the lower end of the side panel 52 or a lower surface of the border plate51 connected and is in Fig. 1 shown in a simplified form.

[0029] The in Fig. 1 illustrated horizontal means of movement 40 includes: a wave segment 400 , which is the top plate 53 the scatter prevention cover 5 penetrates a bearing, sealing material or similar (not illustrated) and is located on the upper side of the upper plate 53 rises upwards; an arm section 401 , which extends from the upper end of the wave section 400 extends in a horizontal direction; and a rotary motor 402 , whose wave is connected to the lower end of the wave section 400 is connected. Furthermore, the cleaning nozzle 60 at the end of the arm section 401 attached.

[0030] When the rotary motor 402 the wave section 400When rotating around an axis in the Z-axis direction, the arm section 401 and the cleaning nozzle 60 This causes it to move horizontally in a horizontal direction (swivel motion). Consequently, the trajectory of the cleaning nozzle is 60 In top view, it is arc-shaped, and the cleaning nozzle 60 can an ejection port 600 , which is formed at its lower end section, from a withdrawn position at a position above the upper side of the holding surface 300a of the spin table 30 Position. For example, it is preferred that the center of rotation of the centrifugal table 30 under the trajectory of the cleaning nozzle 60 is arranged.

[0031] The cleaning nozzle 60 is connected to a water source 69 connected, which has a pump or similar device and, for example, uses pure water as cleaning water through a connection 690and a flexible water flow path 691 , such as a plastic pipe or hose. A water path switching valve 692 is on the water flow path 691 arranged. In addition, the cleaning nozzle is 60 with an air source 68 in a connection that includes a compressor or similar device and delivers compressed air through a connection 680 and a flexible airflow path 681 , such as a plastic pipe or hose. An airflow path switching valve. 682 is on the airflow path 681 arranged. The one from the water source 69 supplied cleaning water and that from the air source 68 The supplied air is processed in the cleaning nozzle. 60 mixed to pass through the ejection port 600 to be expelled downwards as a mixed liquid.

[0032] The in Fig. 1 illustrated spin cleaning device 1 includes a dispersion prevention section 7 one, which in a first embodiment is referred to as a scattering prevention section 7 Reference is made to this and it prevents a force from the cleaning nozzle from being exerted. 60 expelled air acts on water that is on an upper surface of the upper plate 53 the scatter prevention cover 5 collects, so that the water that is on the upper surface of the upper plate 53 collects, is not sprayed at a time when the cleaning nozzle is 60 Air is expelled to form a circumferential edge Wd of the workpiece W to dry, specifically after a series of cleaning and drying processes with positioning of the opening. 50 above a top surface Wb of the spin table 30 held workpiece W, an ejection of a mixture of water and air from the cleaning nozzle 60 , to the workpiece W to clean, and then an expulsion of air from the cleaning nozzle 60 , to the workpiece W to dry.

[0033] At the in Fig. The scatter prevention section concludes with the example shown in section 1. 7 a: a plate with a sloping surface 70 , which are located above the upper plate 53 from the opening 50 the scatter prevention cover 5 in the direction of a circumferential edge of the upper plate 53 along an arc-shaped trajectory of the cleaning nozzle 60 extends and is located on the side of the opening. 50 higher and on the side of the circumferential edge of the upper plate 53 is lower; and a drain opening 71 , which are located at the circumferential edge of the upper plate 53is formed and through which water flows from a lower end edge of the plate with an inclined surface 70 drips down.

[0034] The plate with a sloping surface 70 For example, it has an essentially rectangular outer shape and is fastened in a state by bolts or similar means not illustrated, in which its upper end is abutted by the upper end of the surrounding plate. 51 is suspended. The lower end of the plate has an inclined surface. 70 For example, it is cut at an angle, and one side of the lower end of the plate has an inclined surface. 70 achieved in the Fig. In example 1, the circumferential edge of the upper plate is shown. 53 The lower end of the plate with a sloping surface 70 is with a top surface of the top plate 53 fastened by bolts or similar fasteners not illustrated.

[0035] The drain opening 71for example, by cutting out the top plate 53 the scatter prevention cover 5 formed in a triangular shape such that part of the circumferential edge of the upper plate 53 forms one side of the triangular shape and the drainage opening 71 with a lower end of the plate with an inclined surface or sloping surface plate 70 is continuous. Furthermore, the drain opening is 71 with the space in the case 20 in connection which has a recess in a vertical section and in which the mixed liquid used can be stored.

[0036] It should be noted that the outer shapes of the plate have an inclined surface. 70 and the drain opening 71 are not limited to those of the illustrated example. For example, the plate with an inclined surface can 70 with an arc shape over the upper plate 53 from the opening50 the scatter prevention cover 5 out in the direction of the circumferential edge of the upper plate 53 along the arc-shaped trajectory of the cleaning nozzle 60 extend.

[0037] Furthermore, in the Fig. The example shown in section 1 only includes one dispersion prevention section. 7 on the upper plate 53 arranged. However, for example, a scatter prevention section 7 A similar, further scatter prevention section should be arranged at a position that is aligned with the center of the centrifugal table. 30 inserted between, below the arc-shaped trajectory of the cleaning nozzle 60 symmetrical to the arrangement position of the scattering prevention section 7 is.

[0038] The spin cleaning device 1 In accordance with the present invention, a spin-proof section can be provided. 7Aincludes, according to this, in a second embodiment, the scattering prevention section 7A Reference is made and the in Fig. 3 instead of the one in Fig. 1 depicted dispersion prevention section 7 is shown. The dispersion prevention section 7A is a porous element located on the upper plate 53 the scatter prevention cover 5 along the trajectory of the cleaning nozzle 60 is arranged. Examples of the porous element include porous ceramics, porous metals, porous carbon, and a metal or resin mesh wound or folded into a multitude of layers. The scattering prevention section 7A For example, it has an essentially triangular prism outer shape, which extends from the opening 50 the scatter prevention cover 5 out in the direction of a circumferential edge of the upper plate 53along the trajectory of the cleaning nozzle 60 over the upper surfaces of the border plate 51 and the top plate 53 extends and is attached to the upper surface of the upper plate by an adhesive or similar substance. 53 is attached.

[0039] In the Fig. The upper surface of the scattering prevention section is shown in example 3. 7A , which of the cleaning nozzles 60 facing, an inclined surface that points towards a circumferential edge of the upper plate 53 It becomes lower. However, this is not limiting, and the surface can be a flat area extending towards the circumferential edge. Furthermore, the outer shape of the scattering prevention section is 7A not limited to an essentially triangular prism shape. Moreover, in the case of the Fig. The three illustrated examples show only one dispersion prevention section. 7A on the upper plate 53arranged, however, for example, a further dispersion prevention section, which is the dispersion prevention section 7A Similarly, it should be arranged in a position that is aligned with the center of the spin table. 30 inserted between, below the arc-shaped trajectory of the cleaning nozzle 60 symmetrical to the arrangement position of the scattering prevention section 7A is.

[0040] As in Fig. Shown in section 5 is a drain opening. 75 for example, in a position below the dispersion prevention section 7A the upper plate 53 The drain opening is deeply penetrating. 75 stands with the space in the case 20 in connection, which has a recess-shaped vertical cross-section and in which the mixed liquid used can be received. It should be noted that the arrangement position of the drain opening 75is not limited to the example shown in the present embodiment.

[0041] The following describes the operation of the spin cleaning device. 1 in case air is expelled from the cleaning nozzle 60 , to the workpiece W after cleaning the upper surface Wb of the workpiece W with a mixed fluid (binary fluid) of air and cleaning water by using the centrifugal cleaning device 1 to dry.

[0042] First, as in Fig. 2 shown, the lifting device 16 the spin cleaning device 1 activated to activate the scatter prevention cover 5 to lower, thereby removing the side panel 52 is put into an open state. In other words, part of the spin-drying cleaning device is... 1 between the top cover 22 and the case 20opened in the Z-axis direction, resulting in a state in which the workpiece W into whose interior one can enter.

[0043] The workpiece W is placed on the spin table 30 transported, and the workpiece W is with its upper surface Wb on the upper side on the holding surface 300a placed. Then a suction force is created by the spin table. 30 a connected, not illustrated suction source is generated, to the holding surface 300a transferred, thereby the spin table 30 the workpiece W via a vacuum at the holding surface 300a holds.

[0044] Next, the lifting device will be 16 , as in Fig. 1 illustrates, activated to activate the scatter prevention cover 5 from inside the case 20 to lift, and an upper end surface of the side plate 52comes with a lower surface of a circumferential edge section of the upper cover 22 in contact and is stopped. A part between the top cover 22 and the case 20 is connected to the side panel 52 closed, thus through the top cover 22 and the scatter prevention cover 5 A closed space is formed for cleaning and drying workpiece B. Furthermore, the opening 50 the scatter prevention cover 5 above the upper surface Wb of the spin table 30 held workpiece W arranged. In other words, the upper surface Wb of the workpiece W in a position below the upper end surface of the border plate 51 arranged.

[0045] The cleaning nozzle is described below. 60 through the horizontal means of movement 40swiveled, and the ejection opening 600 the cleaning nozzle 60 is located on an upper side of the center point of the upper surface Wb of the workpiece held by a vacuum W with an alignment of the centers by the spin table 30 arranged. In this state, cleaning water is drawn from the water source. 69 from to the cleaning nozzle 60 guided, while compressed air from the air source 68 to the cleaning nozzle 60 is guided, and the mixed fluid (binary fluid) from the air and the cleaning water is discharged from the ejection opening. 600 the cleaning nozzle 60 in the direction of the center of the upper surface Wb of the workpiece W ejected. Furthermore, the cleaning nozzle 60 , which expels the mixing liquid, over an upper side of the workpiece WIt is pivoted around an axis in the Z-axis direction in such a way that it moves back and forth at a predetermined angle. In addition, the centrifugal table is 30 through the rotating medium 32 rotated at a predetermined speed, causing the mixed liquid to flow from the cleaning nozzle. 60 to the entire surface of the upper surface Wb of the workpiece W is expelled.

[0046] It should be noted that the cleaning nozzle 60 It can be moved in a straight line in a horizontal direction without being swiveled. Furthermore, the cleaning nozzle must 60 not above the top of the workpiece's center point W be arranged. In other words, only the part of the circumferential edge can be Wd of the workpiece W be cleaned without damaging the center and a central section of the workpiece W to clean.

[0047] As a result, adhering substances, such as grinding chips, that are on the upper surface are removed. Wb of the workpiece W The residue adheres, is cleaned with the mixing liquid, and removed. The mixing liquid then flows out due to the rotation of the centrifuge table. 30 centrifugal force generated across the upper surface Wb of the workpiece W from the middle side to the edge side and flows from a position on the upper surface Wb from downwards into the space, which is recess-shaped in the vertical cross-section and is enclosed by the outer circumferential plate 200 , the inner circumferential plate 201 (see Fig. 4) and the base plate 202 of the case 20 is surrounded in order to be kept in the room.

[0048] In addition, the mixed liquid, which comes from the centrifuge table, 30 and the workpiece Wis distributed radially when the centrifugal force is due to the rotation of the centrifugal table. 30 on the cleaning nozzle 60 on the workpiece W The ejected mixing liquid is exerted on the lower surface of the border plate. 51 the in Fig. 4 depicted dispersion prevention coverage 5 , flows downwards along the lower surface and flows downwards into the space which is recess-shaped in the vertical cross-section and through the outer circumferential plate 200 , the inner circumferential plate 201 and the base plate 202 (see Fig. 1) of the housing 20 is surrounded.

[0049] After the entire surface of the upper surface Wb of the workpiece W The perimeter edge has been cleaned over a predetermined period of time. Wd of the workpiece WThe laminated wafer is positively cleaned by the mixing liquid. This is because adhering material, such as grinding chips, is often found at the peripheral edge. Wd the laminated wafer is deposited. The cleaning nozzle 60 is caused by the horizontal means of movement 40 swiveled, and the ejection opening 600 the cleaning nozzle 60 is above the upper side of the circumferential edge Wd of the workpiece W arranged, which is through the spin table 30 is held by a vacuum, whereupon a movement of the cleaning nozzle occurs 60 is stopped.

[0050] In this state, the mixture of air and cleaning water is expelled from the discharge opening. 600 the cleaning nozzle 60 ejected. Furthermore, the ejection table 30rotated at a predetermined rotational speed, thereby distributing the mixing fluid to the entire circumference of the peripheral edge Wd of the workpiece. W is ejected. When cleaning the perimeter edge, the majority of the mixing liquid is also carried away by the edging plate. 51 the scatter prevention cover 5 caused to flow downwards into the space, which is in a vertical cross-section in the housing 20 is recess-shaped. In this case, part of the mixed fluid that comes out of the cleaning nozzle can 60 is ejected to the upper surface of the upper plate 53 flow, or the mixed liquid on which the centrifugal force is exerted and which is carried by the centrifugal table 30 If it is scattered radially, it can reach the upper surface of the upper plate. 53 Therefore, water can accumulate on the upper surface of the top plate. 53 collect what might be, as in the Fig. 4 or Fig. 5 shows the formation of a pool V.

[0051] Next, the spin-drying cleaning device will be used. 1 drying the workpiece W executed. During the drying of the workpiece. W For example, the first step will be to dry the upper surface. Wb executed. The cleaning nozzle 60 is by the horizontal means of motion 40 swivelled, and the ejection opening 600 the cleaning nozzle 60 is applied over the upper side of a central section of the workpiece W , which is through the spin table 30 held by a vacuum, arranged, whereupon the movement of the cleaning nozzle 60 is stopped. It should be noted that the cleaning nozzle 60 in such a way above the top side of the workpiece WIt can be pivoted so that it moves back and forth in a horizontal direction. Compressed air is supplied by the air source. 68 to the cleaning nozzle 60 The air is guided through the exhaust opening. 600 the cleaning nozzle 60 from towards a central section of the upper surface Wb of the workpiece W ejected. In addition, the ejection table 30 rotated at a predetermined rotational speed, so that the surface on the upper surface Wb of the workpiece W Remaining cleaning water through the air, which is emanates from the center of the upper surface Wb of the workpiece W from radially, and through the centrifugal force due to the rotation of the centrifugal table 30 is caused to move from a position on the upper surface Wb from flowing downwards into the space, which is recess-shaped in a vertical cross-section and is enclosed by the outer circumferential plate 200 , the inner circumferential plate 201 (see Fig. 4 and Fig. 5) and the base plate 202 of the case 20 is surrounded.

[0052] After the entire surface of the upper surface Wb of the workpiece W The circumferential edge has been dried over a predetermined period of time. Wd of the workpiece W The laminated wafer is dried in a positive way with air. This is because the cleaning water is often present in larger quantities at the peripheral edge. Wd is collected from the laminated wafer.

[0053] As in the Fig. 4 or Fig. As illustrated in 5, the cleaning nozzle 60 through the horizontal means of motion 40 pivoted, causing the ejection opening 600the cleaning nozzle 60 on the side where the scatter prevention section 7 is arranged, and above the upper side of the circumferential edge Wd of the spin table 30 held workpiece W is arranged, whereupon the movement of the cleaning nozzle 60 is stopped. Then air is drawn from the exhaust port. 600 the cleaning nozzle 60 ejected. Furthermore, during a rotation of the spin table... 30 Air is drawn to the entire circumference of the circumferential edge at a predetermined rotational speed. Wd of the workpiece W expelled.

[0054] This section discusses problematic aspects of a standard spin-drying cleaning device. 1B in the case of drying of the perimeter edge Wd of the workpiece W using air Fig. 6 and Fig. 7 briefly described. The ones in the Fig. 6 and Fig. 7 Cleaning device shown 1B differs from the spin cleaning device 1 in accordance with the present invention in that it does not include a scattering prevention section 7 the in Fig. 4 first embodiment or scatter prevention section shown 7A the in Fig. 5 shows the second embodiment.

[0055] If a positive cleaning of the circumferential edge Wd of the workpiece W with the mixing liquid by using the in Fig. 6 conventional spin cleaning device shown 1B is carried out, or in the similar case that a positive cleaning of the circumferential edge is performed. Wd of the workpiece W , as described above, with the mixing liquid by using the centrifugal cleaning device 1If carried out in accordance with the present invention, a portion of the cleaning nozzle can be removed. 60 ejected mixed liquid to the upper surface of the upper plate 53 flow, or the mixed liquid on which the centrifugal force is exerted and which is carried by the centrifugal table 30 and the workpiece W If the radially scattered particles are deposited, they can reach the upper surface of the upper plate. 53 fly. Therefore, it can occur on the upper surface of the upper plate. 53 Collecting water, which may be involved in the formation of a Fig. The 6 pools shown result in V.

[0056] Furthermore, if positive drying of the circumferential edge occurs Wd of the workpiece W with air by using the in Fig. 7 conventional spin cleaning device shown 1B is carried out, or in the similar case that positive drying of the circumferential edge is performed. Wd of the workpiece W after cleaning with air using the spin cleaning device described above 1 when carried out in accordance with the present invention, the spray from the ejection opening 600 the cleaning nozzle 60 expelled air the water in the pool V on the upper surface of the upper plate 53 the scatter prevention cover 5 , and the splashed water collects into drops and more drops on the dried upper surface. Wb of the workpiece W , which increases the upper surface Wb , as in Fig. 7 is shown, and is re-wetted.

[0057] On the other hand, in the Fig. 4 illustrated spin cleaning device 1 in accordance with the present invention, the scattering prevention section 7 designed to prevent the force of the cleaning nozzle from being exceeded60 the expelled air acts on the water that is on the upper surface of the upper plate 53 collects, and the scatter prevention section 7 The plate closes with an inclined surface. 70 one that differs from the opening 50 the scatter prevention cover 5 out in the direction of the circumferential edge of the upper plate 53 along the trajectory of the cleaning nozzle 60 extends and is located on the side of the opening. 50 is higher and on the side of the circumferential edge of the upper plate 53 is lower, and the drain opening 71 one that is located at the circumferential edge of the upper plate 53 is formed and through which the water flows from the lower end edge of the plate with an inclined surface. 70 drips down. This design ensures that at the time of drying, the perimeter edge... Wd of the workpiece W the power of the cleaning nozzle60 the expelled air can be caused to flow along the inclined surface (upper surface) of the inclined plate 70 to flow and is prevented from flowing onto Pool V on the upper surface of the upper plate 53 to prevent the air from splashing the water that has accumulated on the upper surface of the top plate. 53 collects. Therefore, it can prevent a situation from occurring in which the water droplets splashed by the air land again on the dried workpiece. W adhere. It should be noted that the surface of the plate has an inclined area. 70 It is an inclined surface and therefore water droplets and similar substances may accumulate during cleaning of the workpiece. W with the mixing liquid on the upper surface of the inclined plate 70 adhere and flow downwards to flow over the drain opening 71to be drained off. Consequently, the water droplets are released when the circumferential edge dries. Wd of the workpiece W with air not on the inclined surface of the plate with inclined surface 70 left behind, and the water is not splashed around in the air.

[0058] Furthermore, in the Fig. 5 illustrated spin cleaning device 1 in accordance with the present invention, the scattering prevention section 7A provided to prevent the force of the cleaning nozzle from being exceeded 60 expelled air acts on the water that is on the upper surface of the upper plate 53 is collected, and the scatter prevention section 7A is a porous element located on the upper plate 53 the scatter prevention cover 5 along the trajectory of the cleaning nozzle 60This arrangement ensures that at the time of drying, the perimeter edge Wd of the workpiece W the power of the cleaning nozzle 60 expelled air through the passage of air through the scattering prevention section 7A , which is the porous element, is weakened, and it is prevented that the air forcefully impacts the pool V on the upper surface of the top plate. 53 This prevents the water that collects on the upper surface of the top plate from... 53 It collects and is splashed through the air. Therefore, it prevents a situation where the water droplets splashed through the air land again on the dried workpiece. W adhere.

[0059] The spin-drying cleaning device is, of course, included. 1in accordance with the present invention, not to the examples which, in the first embodiment, represent the scattering prevention section. 7 or, in the second embodiment, the scatter prevention section 7A exhibits, is limited, and can be implemented in a variety of different ways within the scope of protection of the technical idea of ​​the present invention. Furthermore, the shapes of the components of the centrifugal cleaning device are 1 , which are illustrated in the attached drawings, and similar ones are not limited to those illustrated and can be appropriately modified in areas where the effects of the present invention can be produced.

[0060] The present invention is not limited to the details of the preferred embodiments described above. The scope of protection of the invention is defined by the attached claims, and all modifications and adaptations that fall within the equivalent scope of protection of the claims are therefore included in the invention.

Claims

[1] Spin-drying cleaning device comprising: a centrifugal table with a holding surface for holding a workpiece to be cleaned; a rotating means for turning the centrifugal table; a cleaning nozzle for ejecting a mixture of cleaning water and air onto the workpiece held by the centrifugal table; a horizontal motion device for moving the cleaning nozzle horizontally over an upper side of the centrifugal table; a scatter prevention cover surrounding the centrifugal table, through which the mixing fluid, which is radially scattered by the centrifugal table when a centrifugal force due to a rotation of the centrifugal table acts on the mixing fluid ejected from the cleaning nozzle onto the workpiece, is caused to flow downwards; and a lifting device for raising and lowering the scatter prevention cover in an axial direction of a shaft for rotating the centrifugal table, which includes scatter prevention coverage: an opening through which the spin table can pass, a ring-shaped border plate designed so that its section is inclined in a gradually increasing direction from the opening, a side plate which surrounds the rim plate and extends in a stroke direction of the centrifugal table, and an upper plate which connects the side plate and a lower end of the edging plate, the spin-cleaning device further comprises: A scatter prevention section that prevents the force of air ejected from the cleaning nozzle from acting on water that collects on an upper surface of the top plate of the scatter prevention cover, so that the water collecting on the upper surface of the top plate is not splashed when air is ejected from the cleaning nozzle to dry a circumferential edge of the workpiece after cleaning, during a series of cleaning and drying operations involving positioning the opening over an upper surface of the workpiece held by the centrifugal table, ejecting the mixed fluid from the cleaning nozzle to clean the workpiece, and then ejecting air from the cleaning nozzle to dry the workpiece. [2] Spin-drying cleaning device according to claim 1, wherein the scattering prevention section comprises: a plate with an inclined surface extending from the opening of the scatter prevention cover towards a circumferential edge of the upper plate along a trajectory of the cleaning nozzle across the upper plate, being higher on the opening side and lower on the circumferential edge side, and a drainage opening formed at the perimeter edge through which water drips from a lower end edge of the sloping plate. [3] Centrifugal cleaning device according to claim 1 or 2, wherein the scatter prevention section has a porous element arranged on the upper plate of the scatter prevention cover along a trajectory of the cleaning nozzle.