Electrically conductive coating of an electrical component for electrically conductive contacting of a busbar located outside the coating

Abstract

Electrically conductive coating (100) of an electrical component (200) for electrically conductive contacting a first busbar (300) arranged outside the electrically conductive coating (100), the electrical component (200) comprising at least one cell with at least one structured layer system (201), wherein the at least one layer system (201) comprises a front electrode (202), a back electrode (203), and at least one photoactive layer (204), and the at least one photoactive layer (204) is arranged between the front electrode (202) and the back electrode (203), wherein the at least one layer system (201) is structured such that the back electrode (203) is interrupted by at least one groove (205),and at least the back electrode (203) of the at least one cell is coated with the electrically conductive coating (100) and the at least one trench (205) of the back electrode (203) is filled with the electrically conductive coating (100), wherein the electrically conductive coating (100) has a resistivity of 0.01 Ωm to 10000 Ωm, wherein the ratio of the electrical resistance between the back electrode (203) and the first busbar (300) of the electrically conductive coating (100) (RLayer) and the electrical resistance across the width of the trench (205) with the electrically conductive coating (100) (RGraben) is at least 1:1000, and wherein the electrically conductive coating (100) is formed on the back side of the electrical component (200) over the entire extent of the electrical component (200).

Description

[0001] The invention relates to an electrically conductive coating of an electrical component for electrically conductive contacting of a busbar arranged outside the coating, a use of such an electrically conductive coating, an electrical component with such an electrically conductive coating, and a method for coating an electrical component with such an electrically conductive coating.

[0002] The electrical component is, in particular, a photovoltaic element, for example, a CIS, CIGS, GaAs, or Si element, a perovskite element, or an organic photovoltaic element. Organic photovoltaic elements comprise a layered system consisting of a sequence of thin films with a front electrode, a back electrode, and at least one organic photoactive layer between the front electrode and the back electrode, which is preferably deposited under vacuum or processed from a solution. The basic structure of organic photoactive components is described, for example, in WO 2004 083 958 or WO 2011 138 021, wherein the organic photoactive layer can comprise polymers or small molecules. While polymers are characterized by the fact that they are not vaporizable and can therefore only be deposited from solutions, small molecules are usually vaporizable and can be deposited either from solution or by evaporation under vacuum.Electrical connection can be achieved through metal layers, transparent conductive oxides and / or transparent conductive polymers.

[0003] Organic photovoltaic cells exhibit a significantly reduced lifespan after direct contact with air, especially oxygen, and / or moisture, especially water. The layer system must therefore be protected from air and moisture, as otherwise the organic layer can be damaged. A protective layer is thus required to safeguard the electrical component.

[0004] Protective layers for the production of organic electrical components are known in the prior art. DE102015116418A1 discloses a protective layer and a method for applying the protective layer in a continuous roll-to-roll process for the production of a semi-finished product of organic electrical components, comprising a layer stack on a substrate film, wherein the protective layer protects the layer stack from environmental influences and damage caused by handling before and during final production.

[0005] However, a disadvantage of the prior art is that, in the case of an electrical component provided with a protective layer or encapsulated, particularly a photovoltaic element, the protective layer must be opened to allow the electric current to enter or exit the component, from an electrode to a busbar located outside the protective layer or encapsulation. Such an opening allows atmospheric oxygen or moisture to penetrate the interior of the electrical component.

[0006] The invention is therefore based on the objective of providing a coating which does not have the aforementioned disadvantages, in particular a protective layer on a layer system of an electrical component which does not have to be opened to contact electrodes of the layer system with a busbar located outside the coating, thereby preventing air and / or moisture from penetrating the layer system.

[0007] The problem is solved by the subject matter of the independent claims. Advantageous embodiments arise from the dependent claims.

[0008] The problem is solved in particular by providing an electrically conductive coating of an electrical component for electrically conductive contacting of a first busbar arranged outside the coating, the electrical component comprising at least one cell with at least one structured layer system, wherein the at least one layer system comprises a front electrode, a back electrode, and at least one photoactive layer, and the at least one photoactive layer is arranged between the front electrode and the back electrode, wherein the at least one layer system is structured such that the back electrode is interrupted by at least one trench, and at least the back electrode of the at least one cell is coated with the coating and the at least one trench of the back electrode is filled with the coating.The coating exhibits a specific resistance of 0.01 to 10000 m², where a ratio of the electrical resistance between the back electrode and the first busbar of the coating (R. Schicht ) and the electrical resistance across the width of the trench with the coating (R Graben ) is at least 1:1000.

[0009] According to the invention, the electrical resistance across the width of the at least one trench interrupting the back electrode is determined by the coating (R). Graben ) greater than the electrical resistance of the coating between the back electrode and the first busbar (R) SchichtAccording to the invention, the electric current does not flow through the trench filled with the coating because the electrical resistance, in particular the electrical resistance resulting from the geometric dimensions, is too high across the width of the trench. This promotes an electric current flow between the back electrode and the busbar. The invention preferably relates to a protective layer, in particular a winding protector, for protecting the electrical component and for electrically conductive contacting a busbar arranged outside the coating.

[0010] A coating is understood to be, in particular, a layer that provides protection, especially a barrier, against chemical compounds, impurities, moisture, and / or oxygen, especially atmospheric oxygen. A protective layer is also understood to be, in particular, a layer for increasing mechanical resistance, especially scratch resistance, and / or a filter layer, preferably a layer with a UV filter.

[0011] An electrical component is understood to be, in particular, a photovoltaic cell. The photovoltaic cell is preferably composed of several cells, which can be connected in series or in parallel. The multiple cells can be arranged and / or connected in the electrical component in various ways. The electrical component can be a semi-finished product or a finished product. In a preferred embodiment, an electrical component is understood to be a semi-finished product of an electrical component.

[0012] The front side of an electrical component, particularly a photovoltaic element, is understood to be the side of the electrical component that is intended to face sunlight. Similarly, the back side of an electrical component, particularly a photovoltaic element, is understood to be the side of the electrical component that is intended to face away from sunlight.

[0013] A busbar, also known as a busbar, is understood to be, in particular, an arrangement that serves as a central distributor of electrical energy, electrically connected to incoming and outgoing lines, preferably to at least one front electrode and / or at least one back electrode of the photovoltaic cell. The busbar is particularly planar, designed as a ribbon, strip, or plate.

[0014] A busbar arranged outside the coating is understood in particular to be a busbar arranged on the coating on a side of the coating system opposite the coating system, especially a busbar arranged directly on the coating.

[0015] The electrically conductive coating protects the electrical component, in particular the layer system of the electrical component, from external influences without damaging the layer system of the electrical component, and additionally provides an electrically conductive contact between at least one front electrode and / or back electrode of the at least one cell of the electrical component and at least one busbar arranged outside the coating.

[0016] In a preferred embodiment of the invention, the electrical component has a substrate, wherein the layer system is arranged on the substrate.

[0017] In a preferred embodiment of the invention, the viscosity of the precursor, the matrix material, and / or the dopant, individually or as a mixture, is 0.1 mPas to 2000 mPas, preferably 0.1 mPas to 1000 mPas, preferably 1 mPas to 2000 mPas, preferably 1 mPas to 1000 mPas, preferably 1 mPas to 500 mPas, preferably 10 mPas to 2000 mPas, preferably 10 mPas to 1000 mPas, or preferably 10 mPas to 500 mPas. This ensures, in particular, that the coating is arranged on the electrical component in a form-fitting and / or material-bonded manner, and especially that the at least one groove is completely filled with the coating.

[0018] In a preferred embodiment of the invention, the layer system of the at least one cell is structured, in particular laser-structured, for interconnecting individual cells and for electrically separating individual cells.

[0019] Laser structuring of an electrical component, in particular of individual layers of a layer system and / or a complete layer system, is understood to mean, in particular, the interconnection of individual layers of the layer system and / or cells on an electrical component, or the electrical separation of cells. For the interconnection of individual cells, in particular, a front electrode of a first cell is electrically connected to a back electrode of a second cell. In a preferred embodiment of the invention, the electrical component, in particular the cells of the electrical component, are monolithically interconnected.

[0020] The width of the at least one trench is understood in particular to be a distance between two opposing parts of the back electrode at an electrically conductive interruption of the back electrode by the at least one trench.

[0021] In a preferred embodiment of the invention, the ratio of the width of the trench to the shortest distance between the busbar and the front electrode and / or back electrode is at least 1:10, preferably at least 1:20, preferably at least 1:30, or preferably at least 1:100.

[0022] In a preferred embodiment of the invention, the distance of the busbar from the at least one trench is from 100 µm to 100 mm, preferably from 100 µm to 10 mm, more preferably from 100 µm to 1 mm, or more preferably from 1 mm to 10 mm, based on the shortest distance of the busbar from the trench.

[0023] In a preferred embodiment of the invention, the coating is an electrically conductive winding protector. A winding protector is understood to be, in particular, a protective layer for protecting an electrical component from environmental influences and / or damage. After the coating has been applied as a winding protector, a coated electrical component can be transferred to a further system in which further processing steps are carried out.

[0024] In a preferred embodiment of the invention, the coating is arranged on the electrical component in a form-fitting and / or material-fitting manner; in particular, the at least one groove is filled with the coating in a form-fitting and / or material-fitting manner.

[0025] In a preferred embodiment of the invention, the at least one cell has a width of 5 mm to 50 mm, preferably of 10 mm to 30 mm.

[0026] In a preferred embodiment of the invention, a cell has a length of 5 cm to 20 m, preferably 50 cm to 20 m, or preferably 50 cm to 10 m.

[0027] In a preferred embodiment of the invention, the coating is at least largely transparent to light in the visible wavelength range, and in particular at least largely transparent.

[0028] In a particularly preferred embodiment of the invention, the at least one photoactive layer is formed from organic materials, preferably from small organic molecules or polymeric organic molecules, and especially preferably from small organic molecules. In a preferred embodiment of the invention, the organic photoactive layer is applied by evaporating small organic molecules.

[0029] Small molecules are understood to be, in particular, absorber materials that comprise a well-defined number of monomers, typically less than ten, and have a well-defined mass, typically less than 1500g / mol, preferably less than 1200g / mol, and are free from undefined, possibly reactive groups at the end of the molecular chain, such as may be present as a by-product of a polymerization chain reaction in polymers.

[0030] The electrically conductive coating of an electrical component according to the invention offers advantages compared to the prior art. Advantageously, the coating protects the layer system of the electrical component, particularly before and during final assembly, from environmental influences and damage, and simultaneously provides an electrically conductive contact between the layer system and the at least one busbar of the photovoltaic element. The specific conductivity of the coating is low enough that it does not affect a monolithic interconnection of the electrical component. At the same time, the specific conductivity of the coating is high enough that the resistance between the electrode and the busbar generates virtually no additional losses. Advantageously, the coating does not need to be subsequently opened to electrically contact the layer system with an externally arranged busbar.Advantageously, the service life of an electrical component is increased because there are no openings in the coating through which moisture can penetrate the layer system. Advantageously, no further process steps are necessary for electrically conductive contact with a busbar located outside the coating. Advantageously, the process can be integrated into a roll-to-roll process for manufacturing an electrical component.

[0031] A roll-to-roll process refers in particular to the production of flexible electrical components that are applied to a web of flexible plastic or metal films, especially in a continuous process. The roll-to-roll process is characterized, for example, by a continuous substrate, especially a plastic film such as PET or PEN. Materials are applied to this substrate to form electrical components, particularly by vapor deposition, printing, coating, sputtering, or plasma deposition.

[0032] According to a further development of the invention, it is provided that the ratio of the layer thickness of the coating to the width of the at least one trench is at least 1:10, preferably at least 1:20, preferably at least 1:30, preferably at least 1:100, preferably at least 1:1000, preferably 1:5 to 1:5000, preferably 1:10 to 1:10000, preferably 1:10 to 1:1000, preferably 1:20 to 1:500, or preferably 1:20 to 1:200.

[0033] According to a further development of the invention, the width of the at least one groove is 1 µm to 1 mm, preferably 10 µm to 1 mm, preferably 50 µm to 1 mm, preferably 1 µm to 400 µm, preferably 10 µm to 400 µm, or preferably 10 µm to 200 µm.

[0034] According to a further development of the invention, it is provided that the layer thickness of the coating is 100 nm to 100 µm, preferably 500 nm to 10 µm.

[0035] According to a further development of the invention, it is provided that the ratio of the layer thickness of the back electrode to the width of the first busbar is at least 1:10, preferably at least 1:30, preferably 1:5 to 1:5000, preferably 1:10 to 1:1000, or preferably 1:20 to 1:200.

[0036] According to a further development of the invention, the width of the first busbar is 0.1 cm to 30 cm, preferably 0.1 cm to 20 cm, preferably 0.1 cm to 10 cm, preferably 0.5 cm to 30 cm, preferably 0.5 cm to 20 cm, preferably 0.5 cm to 10 cm, preferably 0.5 cm to 5 cm, or preferably 1 cm to 3 cm.

[0037] According to a further development of the invention, the layer thickness of the back electrode is 10 nm to 1 µm, preferably 10 nm to 500 nm, preferably 20 nm to 500 nm, or preferably 50 nm to 500 nm.

[0038] In a preferred embodiment of the invention, the ratio of the width of the trench to the width of the busbar is at least 1:10, preferably at least 1:20, preferably at least 1:30, preferably at least 1:50, preferably at least 1:100, preferably at least 1:200, preferably at least 1:500, or preferably at least 1:1000.

[0039] According to a further development of the invention, the coating is provided to have a specific resistance of 0.1 to 1000 Ωm, preferably from 1 to 1000 Ωm, preferably from 1 to 500 Ωm, preferably from 1 to 200 Ωm, preferably from 10 to 1000 Ωm, preferably from 10 to 500 Ωm, preferably from 100 to 1000 Ωm, or preferably from 100 to 500 Ωm.

[0040] In a preferred embodiment of the invention, the coating has a specific conductivity of 100 to 0.0001 S / m, preferably of 10 to 0.001 S / m.

[0041] According to a further development of the invention, it is provided that the ratio of the electrical resistance between the back electrode and the first busbar of the coating (R) Schicht ) and the electrical resistance across the width of the trench with the coating (R Graben ) at least 1:100, preferably at least 1:500, preferably at least 1:1000, preferably at least 1:2000, preferably at least 1:5000, or preferably at least 1:10000, preferably from 1:100 to 1:100000, preferably from 1:1000 to 1:100000, or preferably from 1:10000 to 1:100000.

[0042] In a preferred embodiment of the invention, the layer system is structured such that the at least one photoactive layer is interrupted, and the front electrode and the back electrode of the at least one cell are electrically connected to each other via the interruption of the at least one photoactive layer, wherein the front electrode is electrically separated from the back electrode by the at least one trench. The front electrode is electrically contacted via a portion of the back electrode with a second busbar arranged outside the coating, wherein the electrical resistance from the back electrode through the at least one trench with the coating is greater than the electrical resistance through the coating between the front electrode and the second busbar.

[0043] In a preferred embodiment of the invention, the ratio of the electrical resistance between the front electrode and the second busbar of the coating (R) is Schicht ) and the electrical resistance across the width of the trench with the coating (R Graben ) at least 1:100, preferably at least 1:500, preferably at least 1:1000, preferably at least 1:2000, preferably at least 1:5000, or preferably at least 1:10000, preferably from 1:100 to 1:100000, preferably from 1:1000 to 1:100000, or preferably from 1:10000 to 1:100000.

[0044] In a preferred embodiment of the invention, the width of the second busbar is 0.1 cm to 30 cm, preferably 0.1 cm to 20 cm, preferably 0.1 cm to 10 cm, preferably 0.1 cm to 5 cm, preferably 0.5 cm to 30 cm, preferably 0.5 cm to 20 cm, preferably 0.5 cm to 10 cm, preferably 0.5 cm to 5 cm, preferably 1 cm to 10 cm, preferably 1 cm to 5 cm, or preferably 1 cm to 2 cm.

[0045] In a preferred embodiment of the invention, the ratio of the layer thickness of the back electrode to the width of the second busbar is at least 1:10, preferably at least 1:30, preferably 1:5 to 1:5000, preferably 1:10 to 1:1000, or preferably 1:20 to 1:200.

[0046] In a preferred embodiment of the invention, the distance between the first busbar and the second busbar is at least 150% of the width of the at least one trench, preferably at least 200%, preferably at least 300%, preferably at least 500%, or preferably at least 1000%.

[0047] According to a further development of the invention, the at least one layer system is structured such that the structuring has a trench of a first type (P3) that electrically interrupts the back electrode, a trench of a second type (P1) that electrically interrupts the front electrode, and a trench of a third type (P2) that electrically interrupts the at least one photoactive layer, so that the front electrode and the back electrode of the at least one cell are electrically interconnected.

[0048] In a preferred embodiment of the invention, several cells of the photovoltaic element are arranged side by side and connected in series. Each cell has its own electrode and counter electrode, the series connection being effected by electrically connecting the electrode of one cell to the counter electrode of the next cell.

[0049] According to a further development of the invention, the coating is provided on a front side of the electrical component and / or on a back side of the electrical component; preferably, the coating is formed over the entire extent of the electrical component.

[0050] In a preferred embodiment of the invention, the coating is arranged over the entire surface of the electrical component.

[0051] According to a further development of the invention, the coating is formed from: a) at least one precursor selected from the group consisting of hexamethyldisiloxane (HMDSO), bis-trimethylsilymethane (BTMSM), tetraethyl orthosilicate (TEOS), hexamethyldisilazane (HMDSN), silane (SiH4), triethoxysilane (TriEOS), tetramethoxysilane (TMOS), tetramethylsilane (TMS), and trimethoxysilane (TriMOS), bis-diethylaminosilane (BTBAS), preferably using a reaction gas selected from nitrogen or oxygen; or b) at least one matrix material selected from a), silicon oxycarbides, preferably SiOC or SiOCH, or a SiOCH-like material, preferably silicon carboxynitrides (SiONCH), silicon carbonitrides (SiNCH), silicon nitrides (SiN), silicates (SiO2), and Al2O3; or c) at least one material selected from b) and at least one dopant, wherein the dopant is selected from the group consisting of diborane, trimethyl boron, and phosphine, or a TCO material, preferably selected from the group consisting of metal alkoxides, metal amides, preferably titanium alkoxide, in particular preferably titanium tetraisobutoxide, titanium tetraisoethoxide, and titanium tetraisomethoxide, titanium tetraisopropoxide (TTIP), TiCl4, dialkyl zinc, preferably dimethyl zinc or diethyl zinc (DEZN), tin chloride, tetramethyltin, tetraethyltin, ITO, In2O3, TiO2, ZnO, and SnO2.

[0052] In a particularly preferred embodiment of the invention, the matrix material of the coating is SiOCH or a SiOCH-like material. SiOCH is a silicon oxide (SiOx) that acquires organic properties by means of a carbon component; that is, the carbon component influences the chemical structure and the polymer-like, partially cross-linked chain structure. The material is more elastic and flexible than SiOx; it is a nanoporous material exhibiting flexible and elastic properties.

[0053] In a preferred embodiment of the invention, the coating comprises a carbon content greater than 15 at%, preferably greater than 20 at%, particularly preferably greater than 25 at%.

[0054] In a preferred embodiment of the invention, the coating has a proportion of the at least one dopant of 0.1 to 50 wt.%, preferably of 0.1 to 20 wt.%, preferably of 0.1 to 10 wt.%, preferably of 0.5 to 10 wt.%, preferably of 1 to 10 wt.%, preferably of 1 to 5 wt.%, or preferably of 1 to 3 wt.%, based on the total weight of the coating.

[0055] In a preferred embodiment of the invention, the coating has flexible properties, wherein the elasticity (modulus of elasticity) of the coating is from 80000 psi to 360000 psi, preferably from 100000 psi to 300000 psi, preferably from 120000 psi to 260000 psi, or preferably from 100000 psi to 200000 psi.

[0056] The object of the present invention is also achieved by providing a use of an electrically conductive coating according to the invention as a protective layer of an electrical component, in particular as winding protection, and for electrically conductive contacting at least one back electrode of a layer system with a first busbar of the electrical component, in particular according to one of the previously described embodiments.

[0057] The object of the present invention is also achieved by providing an electrical component with an electrically conductive coating according to the invention, particularly according to one of the previously described embodiments. This results in the electrical component having the advantages already described in connection with the electrically conductive coating and its use.The electrical component comprises at least one layer system with a front electrode, a back electrode, and at least one photoactive layer, wherein the at least one photoactive layer is arranged between the front electrode and the back electrode, and at least one busbar, wherein the coating is arranged between the at least one layer system and the at least one busbar, such that at least the back electrode is electrically conductively contacted with the at least one busbar, wherein the electrical component is preferably a photovoltaic element.

[0058] In a preferred embodiment of the invention, the electrical component is an organic electrical component, preferably an organic photovoltaic element (OPV), an OFET, an OLED or an organic photodetector.

[0059] In a preferred embodiment of the invention, the electrical component is a flexible electrical component. A flexible electrical component is understood to be, in particular, an electrical component that is bendable and / or stretchable within a certain range. In a preferred embodiment of the invention, the flexible electrical component is a flexible photovoltaic element, in particular a flexible organic photovoltaic element.

[0060] In a preferred embodiment of the invention, the electrical component is a semi-finished product; accordingly, the electrical component onto which the coating is applied is a semi-finished product for the manufacture of a finished electrical component.

[0061] A semi-finished product is understood to be, in particular, a preliminary stage of an electrical component that requires at least one further processing step to obtain a finished electrical component. Preferably, a semi-finished product is understood to be an electrical component, especially a photovoltaic cell, that does not yet have a protective layer or not all protective layers and / or is not yet encapsulated. In contrast, after final production, the electrical component is preferably provided with all protective layers and / or encapsulated, and in particular equipped with the necessary connections for electrical contact.

[0062] The object of the present invention is also achieved by providing a method for coating an electrical component with an electrically conductive coating according to the invention, particularly according to one of the embodiments described above. The method for coating an electrical component offers, in particular, the advantages already described in connection with the electrically conductive coating, the use of the electrically conductive coating, and the electrical component with the electrically conductive coating. The method comprises the following steps: a) Providing an electrical component comprising at least one cell with at least one structured layer system, comprising a front electrode, a back electrode and at least one photoactive layer arranged between the front electrode and the back electrode, wherein the back electrode is interrupted by at least one trench; b) Applying at least one precursor, matrix material and / or dopant simultaneously or as a mixture by means of a deposition process or a pressure process at least to the back electrode and into the at least one trench of the back electrode, so that at least the back electrode is completely covered; and c) Maintaining the coating.

[0063] According to a further development of the invention, it is provided that after step c) at least one first busbar is applied to the coating in a step d).

[0064] In a preferred embodiment of the invention, the process is carried out using a roll-to-roll method, preferably a continuous roll-to-roll method. In a roll-to-roll method, the substrate is wound onto a roll and thus continuously feeds into a closed system. There, the layered system is formed. Preferably, the layered system is manufactured under vacuum. If the electrical component is a semi-finished product, it can be processed further.

[0065] In a preferred embodiment of the invention, at least one process step of the process, preferably at least step b), is carried out under a protective gas, preferably nitrogen or argon.

[0066] In a preferred embodiment of the invention, the deposition method is an atomic layer deposition (ALD) method, a plasma-enhanced atomic layer deposition (PEALD) method, a plasmaless atomic layer deposition (PLALD) method, a chemical vapor deposition (CVD) method, a plasma-enhanced vapor deposition (PECVD) method, a microwave PECVD method, a plasmaless vapor deposition (PLCVD) method, or a hollow cathode method.

[0067] In a preferred embodiment of the invention, the printing method is a screen printing method, a plotting method, an inkjet printing method, a 3D printing method, a slot nozzle method, a comma bar method, or a squeegee method.

[0068] In a preferred embodiment of the invention, the coating pressure is less than 50 Pa, preferably less than 10 Pa, and particularly preferably less than 5 Pa.

[0069] In a preferred embodiment of the invention, the coating is cured after application in step b) by means of UV curing, dual curing, thermal curing, and / or a reaction gas.

[0070] In a preferred embodiment of the invention, the proportion of the reaction gas to the total volume of the at least one precursor and reaction gas is greater than 4 vol%, preferably greater than 6 vol%, and less than 20 vol%, preferably less than 10 vol%.

[0071] In a preferred embodiment of the invention, the coating is applied at a temperature of the electrical component or the layer system of -20°C to 110°C, preferably from -10°C to 50°C, preferably from 0°C to 60°C, preferably from 5°C to 40°C, preferably from 5°C to 30°C, preferably from 10°C to 50°C, preferably from 20°C to 40°C, or preferably from 30°C to 50°C.

[0072] The invention is explained in more detail below with reference to the drawings. The exemplary embodiments relate in particular to an electrical component manufactured using a roll-to-roll process. The drawings show: Fig. 1 a schematic representation of an embodiment of a layer system of an electrical component in cross-section; Fig. 2 a schematic representation of an embodiment of a structured layer system of an electronic component; Fig. 3 a schematic representation of an embodiment of an electrical component with an electrically conductive coating in cross-section; and Fig. 4 A schematic representation of an embodiment of a method for producing an electrically conductive coating of an electrical component in a flow diagram. Examples of implementation

[0073] Fig. Figure 1 shows a schematic representation of an embodiment of a layer system 201 of an electrical component 200 in cross-section.

[0074] In this embodiment, the electrical component 200 is a photovoltaic element. The photovoltaic element consists of a sequence of thin layers with the layer system 201, including at least one photoactive layer 204, which are preferably deposited in a vacuum or processed from a solution. The electrical connection is made via electrodes, e.g., by metal layers, transparent conductive oxides, and / or transparent conductive polymers.

[0075] The photovoltaic element has a substrate 221, e.g. made of glass, on which a layer system 201 is located. The layer system 201 comprises a front electrode 202, which e.g. has ITO, an n-doped electron transport layer 223, and a photoactive layer 204. Above this is a p-doped hole transport layer 225, and a back electrode 203 made of aluminum.

[0076] In this embodiment, the photoactive layer 204 is an organic photoactive layer with a donor / acceptor system of small molecules.

[0077] Fig. Figure 2 shows a schematic representation of an embodiment of a structured layer system 201 of an electronic component 200. Identical and functionally equivalent elements are provided with the same reference numerals, so that reference is made to the preceding description.

[0078] In this embodiment, the provided substrate 221 is coated and structured with a layer of a front electrode 202, forming the grooves 206 (P1). Subsequently, at least the photoactive layer 204 is applied to the front electrode 202. The application of individual layers can be carried out, at least partially, by a printing process, preferably by an injection, screen printing, gravure printing, or flexographic printing process, or by evaporating the materials to be applied in a vacuum. The at least one photoactive layer 204 is structured, forming the grooves 207 (P2). The layer of the back electrode 203 is applied to the structured photoactive layer 204 and structured, forming the grooves 205 (P3). In this embodiment, the electrical component 200 is a photovoltaic element.

[0079] An embodiment of a structuring of a layer system 201 of an electrical component 200 with the structurings P1, P2, and P3 is shown in Fig. Figure 2 shows the structure as follows: a trench 205 of the first type (P3), which interrupts a layer of a front electrode 202; a trench 206 of the second type (P1), which interrupts a layer of a back electrode 203; and a trench 207 of the third type (P2), which interrupts a photoactive layer 204. The trenches 207 of the third type (P2) are filled with an electrically conductive material for electrical contact between the back electrode 203 and the front electrode 202. This allows the front electrode 202 to pass through the photoactive layer 204 in an electrically conductive manner.

[0080] The structuring of the layer system 201, in particular the front electrode 202, the back electrode 203, and the at least one photoactive layer 204, can be carried out by means of laser ablation, electron or ion beam ablation, scribing or shadow masks.

[0081] The following parameters can be used for structuring P1 / P2 / P3 using a laser: P1: 1030 nm wavelength and 50 µm linewidth; P2: 515 nm wavelength and 50 µm linewidth; and P3: 1030 nm wavelength and 100 µm linewidth. In this embodiment, the width of the trench 205 of type P3 is 100 µm and the width of the busbar 300 is 14 mm.

[0082] In one embodiment, the substrate 221 is a film, for example a PET film. The individual layers of the layer system 201 of the photovoltaic element 300 are applied to the substrate 221 and structured (see Fig. 3) The layers can be applied, for example, using a PECVD process.

[0083] Fig. Figure 3 shows a schematic cross-sectional representation of an embodiment of an electrical component 200 with an electrically conductive coating 100. Identical and functionally equivalent elements are designated with the same reference numerals, so reference is made to the preceding description.

[0084] In this embodiment, the electrical component 200 is a photovoltaic element. The electrical component 200 has a structured layer system 201.

[0085] The electrically conductive coating 100 of an electrical component 200 for electrically conductive contacting a first busbar 300 arranged outside the coating 100 comprises at least one cell with at least one structured layer system 201, wherein the at least one layer system 201 comprises a front electrode 202, a back electrode 203, and at least one photoactive layer 204, the at least one photoactive layer 204 being arranged between the front electrode 202 and the back electrode 203. The at least one layer system 201 is structured such that the back electrode 203 is interrupted by at least one groove 205, and at least the back electrode 203 of the at least one cell is coated with the coating 100 and the at least one groove 205 of the back electrode 203 is filled with the coating 100.The coating 100 has a specific resistance of 0.01 to 10000 Ω, where a ratio of the electrical resistance between the back electrode 203 and the first busbar 300 of the coating 100 (R. Schicht ) and the electrical resistance across the width of the trench 205 with the coating 100 (R Graben ) is at least 1:1000.

[0086] The electrically conductive coating 100 protects the electrical component 200, in particular the at least one layer system 201 of the electrical component 200, from environmental influences and damage before, during, and after final assembly, and simultaneously provides an electrically conductive contact between the layer system 201, in particular at least one electrode 202, 203 of the layer system 201, and a busbar 300 located outside the coating 100. By dimensioning the P3 trench (205) in relation to the layer thickness of the coating 100 and the specific resistance of the coating 100, the electrical resistance between the busbar 300 and the back electrode 203 is low enough to allow contact with the back electrode (203), and the electrical resistance between the busbar 300 and the front electrode 202 is high enough to avoid significant losses of a generated electric current.

[0087] In one embodiment of the invention, the ratio of the layer thickness of the coating 100 to the width of the at least one trench 205 is at least 1:10, preferably at least 1:30, preferably 1:5 to 1:5000, preferably 1:10 to 1:1000, or preferably 1:20 to 1:200.

[0088] In a further embodiment of the invention, the width of the at least one trench is 1 µm to 1 mm, preferably 10 µm to 400 µm, and the thickness of the coating is 100 nm to 100 µm, preferably 500 nm to 10 µm.

[0089] In a further embodiment of the invention, the ratio of the layer thickness of the back electrode 203 to the width of the first busbar 300 is at least 1:10, preferably at least 1:30, preferably 1:5 to 1:5000, preferably 1:10 to 1:1000, or preferably 1:20 to 1:200.

[0090] In a further embodiment of the invention, the width of the first busbar 300 is 0.1 cm to 10 cm, preferably 0.5 cm to 5 cm, or preferably 1 cm to 3 cm.

[0091] In a further embodiment of the invention, the layer thickness of the back electrode is 203 10 nm to 1 µm, preferably 20 nm to 500 nm.

[0092] In a further embodiment of the invention, the coating 100 has a specific resistance of 0.1 to 1000 Ωm, preferably of 1 to 500 Ωm, or preferably of 10 to 500 Ωm.

[0093] In a further embodiment of the invention, the ratio of the electrical resistance between the back electrode 203 and the first busbar 300 of the coating 100 is (R Schicht ) and the electrical resistance across the width of the trench 205 with the coating 100 (R Graben) at least 1:5000, preferably at least 1:10000, preferably from 1:1000 to 1:100000, or preferably from 1:10000 to 1:100000.

[0094] In a further embodiment of the invention, the at least one layer system 201 is structured such that the structuring has a trench 205 of a first type (P3) which electrically interrupts the back electrode 203, a trench 206 of a second type (P1) which electrically interrupts the front electrode 202, and a trench 207 of a third type (P2) which electrically interrupts the at least one photoactive layer 204, so that the front electrode 202 and the back electrode 203 of the at least one cell are electrically interconnected.

[0095] In a further embodiment of the invention, the coating 100 is formed on a front side of the electrical component 200 and / or on a back side of the electrical component 200; preferably, the coating is formed over the entire extent of the electrical component 200.

[0096] In a further embodiment of the invention, the coating 100 is formed from: a) at least one precursor selected from the group consisting of hexamethyldisiloxane (HMDSO), bis-trimethylsilymethane (BTMSM), tetraethyl orthosilicate (TEOS), hexamethyldisilazane (HMDSN), silane (SiH4), triethoxysilane (TriEOS), tetramethoxysilane (TMOS), tetramethylsilane (TMS), and trimethoxysilane (TriMOS), bis-diethylaminosilane (BTBAS), preferably using a reaction gas selected from nitrogen or oxygen; or b) at least one matrix material selected from a), silicon oxycarbides, preferably SiOC or SiOCH, or a SiOCH-like material, preferably silicon carboxynitrides (SiONCH), silicon carbonitrides (SiNCH), silicon nitrides (SiN), silicates (SiO2), and Al2O3; or c) at least one material selected from b) and at least one dopant, wherein the dopant is selected from the group consisting of diborane, trimethyl boron, and phosphine, or a TCO material, preferably selected from the group consisting of metal alkoxides, metal amides, preferably titanium alkoxide, in particular preferably titanium tetraisobutoxide, titanium tetraisoethoxide, and titanium tetraisomethoxide, titanium tetraisopropoxide (TTIP), TiCl4, dialkyl zinc, preferably dimethyl zinc or diethyl zinc (DEZN), tin chloride, tetramethyltin, tetraethyltin, ITO, In2O3, TiO2, ZnO, and SnO2.

[0097] The electrically conductive coating 100 can be used as a protective layer of an electrical component 200, in particular as winding protection, and for electrically conductive contacting of at least one back electrode 203 of a layer system 201 with a first busbar 300 of the electrical component 200.

[0098] In a further embodiment of the invention, the coating 100 has an elasticity of 80000 psi to 360000 psi, preferably from 100000 psi to 300000 psi, preferably from 120000 psi to 260000 psi, or preferably from 100000 psi to 200000 psi.

[0099] The electrical component 200 with the electrically conductive coating 100 comprises at least one layer system 201 with a front electrode 202, a back electrode 203, and at least one photoactive layer 204, wherein the at least one photoactive layer 204 is arranged between the front electrode 202 and the back electrode 203, and at least one busbar 300, wherein the coating 100 is arranged between the at least one layer system 201 and the at least one busbar 300, such that at least the back electrode 203 is in electrically conductive contact with the at least one busbar 300. In this embodiment, the electrical component 200 is a photovoltaic element.

[0100] In one embodiment of the invention, the electrical component 200 is an organic electrical component 200, preferably an organic photovoltaic element (OPV), an OFET, an OLED or an organic photodetector.

[0101] Fig. Figure 4 shows a schematic representation of an embodiment of a method for producing an electrically conductive coating 100 of an electrical component 200 in a flowchart. Identical and functionally equivalent elements are designated with the same reference numerals, so reference is made to the preceding description.

[0102] The electrically conductive coating 100 of an electronic component 200 can be produced by a number of methods. In one embodiment of the invention, the method for coating the electronic component 200 with the electrically conductive coating 100 comprises the following steps: a) Providing an electrical component 200 with at least one cell having at least one structured layer system 201, comprising a front electrode 202, a back electrode 203, and at least one photoactive layer 204 arranged between the front electrode 202 and the back electrode 203, wherein the back electrode 203 is interrupted by at least one trench 205; b) Applying at least one precursor, one matrix material and / or one dopant simultaneously or as a mixture by means of a deposition process or a pressure process at least to the back electrode 203 and into the at least one groove 205 of the back electrode 203, so that at least the back electrode 203 is completely covered; and c) Obtaining the coating 100.

[0103] This protects the electrical component 200, in particular the layer system 201 of the electrical component 200, from environmental influences and damage during further processing or use. The method for coating the electronic component 200 with the electrically conductive coating 100 can be used, in particular, in a roll-to-roll process.

[0104] The structured layer system 201 can be obtained, for example, by laser structuring after the application of the individual layers, in particular the layer of the front electrode 202, the at least one photoactive layer 204 and the layer of the back electrode 203.

[0105] In a further embodiment of the invention, after step c), at least one first busbar 300 is applied to the coating 100 in a step d).

[0106] In a further embodiment of the invention, the process is carried out in a roll-to-roll process, preferably a continuous roll-to-roll process.

[0107] In one embodiment, the electrically conductive coating 100 is applied completely to the back electrode 203 or to the entire electrical component 200. For this purpose, the precursor hexamethyldisiloxane (HMDSO) is deposited onto the electrical component 200 using a PECVD process in a gas volume flow of 150 sccm, the precursor tetraisopropyltitanium (TTIP) in a gas volume flow of 1-15 sccm, and oxygen in a gas volume flow of 2000 sccm. Argon is used as the carrier gas. The materials are deposited until an 800 nm thick layer is obtained as a mixed layer. The electrical component 200 is kept at 5°C during material deposition. To form the coating 100, radical / ionized species (e.g., O2+, O, Si2O(CH3)5) are generated in situ by plasma excitation. In the PECVD process, the electrical plasma power is 10.5 kW and the working pressure is 5 Pa.

[0108] In another embodiment, the coating 100 is obtained in a PVD process using two materials by applying an insulator and a TCO matrix material (ZnO, TiO2, SnO2) by evaporation. In this process, an insulating material, e.g., SiO2, is co-evaporated with a TCO matrix material, e.g., TiO2, onto the electrical component 200.

[0109] In another embodiment, the coating 100 is obtained in an ALD process with an insulator and a TCO matrix material (ZnO, TiO2, SnO2). QUOTES INCLUDED IN THE DESCRIPTION

[0000] This list of documents cited by the applicant was automatically generated and is included solely for the reader's convenience. The list is not part of the German patent or utility model application. The DPMA accepts no liability for any errors or omissions. Cited patent literature

[0000] WO 2004083958

[0002] WO 2011138021

[0002] DE 102015116418 A1

[0004]

Claims

[1] Electrically conductive coating (100) of an electrical component (200) for electrically conductive contacting a first busbar (300) arranged outside the coating (100), the electrical component (200) comprising at least one cell with at least one structured layer system (201), wherein the at least one layer system (201) comprises a front electrode (202), a back electrode (203), and at least one photoactive layer (204), and the at least one photoactive layer (204) is arranged between the front electrode (202) and the back electrode (203), wherein the at least one layer system (201) is structured such that the back electrode (203) is interrupted by at least one groove (205), and at least the back electrode (203) of the at least one cell is coated with the coating (100) and the at least one groove (205) of the back electrode (203) is filled with the coating (100), characterized by, that the coating (100) has a specific resistance of 0.01 to 10000 Ω, wherein a ratio of the electrical resistance between the back electrode (203) and the first busbar (300) of the coating (100) (R Schicht ) and the electrical resistance across the width of the trench (205) with the coating (100) (R Graben ) is at least 1:1000. [2] Electrically conductive coating (100) according to claim 1, wherein the ratio of the layer thickness of the coating (100) to the width of the at least one trench (205) is at least 1:10, preferably 1:10 to 1:1000, and / or the width of the at least one trench (205) is 1 µm to 1 mm, and the layer thickness of the coating (100) is 100 nm to 100 µm. [3] Electrically conductive coating (100) according to claim 1 or 2, wherein the ratio of the thickness of the back electrode (203) to the width of the first busbar (300) is at least 1:10, preferably 1:10 to 1:1000, and / or the width of the first busbar (300) is 0.1 cm to 10 cm, and the thickness of the back electrode (203) is 10 nm to 1 µm. [4] Electrically conductive coating (100) according to any of the preceding claims, wherein the coating (100) has a specific resistance of 0.1 to 1000 Ωm, and / or the ratio of the electrical resistance between the back electrode (203) and the first busbar (300) of the coating (100) (R Schicht ) and the electrical resistance across the width of the trench (205) with the coating (100) (R Graben ) is at least 1:5000. [5] Electrically conductive coating (100) according to one of the preceding claims, wherein the at least one layer system (201) is structured such that the structuring has a trench (205) of a first type (P3) which electrically interrupts the back electrode (203), a trench (206) of a second type (P1) which electrically interrupts the front electrode (202), and a trench (207) of a third type (P2) which electrically interrupts the at least one photoactive layer (204), such that the front electrode (202) and the back electrode (203) of the at least one cell are electrically interconnected. [6] Electrically conductive coating (100) according to one of the preceding claims, wherein the coating (100) is formed on a front side of the electrical component (200) and / or on a back side of the electrical component (200), preferably the coating (100) is formed over the entire extent of the electrical component (200). [7] Electrically conductive coating (100) according to any one of the preceding claims, wherein the coating (100) is formed from: a) at least one precursor selected from the group consisting of hexamethyldisiloxane (HMDSO), bis-trimethylsilymethane (BTMSM), tetraethyl orthosilicate (TEOS), hexamethyldisilazane (HMDSN), silane (SiH4), triethoxysilane (TriEOS), tetramethoxysilane (TMOS), tetramethylsilane (TMS), and trimethoxysilane (TriMOS), bis-diethylaminosilane (BTBAS), preferably using a reaction gas selected from nitrogen or oxygen; or b) at least one matrix material selected from a), silicon oxycarbides, preferably SiOC or SiOCH, or a SiOCH-like material, preferably silicon carboxynitrides (SiONCH), silicon carbonitrides (SiNCH), silicon nitrides (SiN), silicates (SiO2), and Al2O3; or c) at least one material selected from b) and at least one dopant, wherein the dopant is selected from the group consisting of diborane, trimethyl boron, and phosphine, or a TCO material, preferably selected from the group consisting of metal alkoxides, metal amides, preferably titanium alkoxide, in particular preferably titanium tetraisobutoxide, titanium tetraisoethoxide, and titanium tetraisomethoxide, titanium tetraisopropoxide (TTIP), TiCl4, dialkyl zinc, preferably dimethyl zinc or diethyl zinc (DEZN), tin chloride, tetramethyltin, tetraethyltin, ITO, In2O3, TiO2, ZnO, and SnO2. [8] Use of the electrically conductive coating (100) according to any one of claims 1 to 7 as a protective layer of an electrical component (200), in particular as winding protection, and for electrically conductive contacting at least one back electrode (203) of a layer system (201) with a first busbar (300) of the electrical component (200), wherein the coating (100) preferably has an elasticity of 80000 psi to 360000 psi. [9] Electrical component (200), preferably a flexible electrical component (200), with an electrically conductive coating (100) according to one of claims 1 to 7, and at least one layer system (201) comprising a front electrode (202), a back electrode (203), and at least one photoactive layer (204), wherein the at least one photoactive layer (204) is arranged between the front electrode (202) and the back electrode (203), and at least one busbar (300), wherein the coating (100) is arranged between the at least one layer system (201) and the at least one busbar (300), such that at least the back electrode (203) is electrically conductively contacted with the at least one busbar (300), wherein the electrical component (200) is preferably a photovoltaic element. [10] Method for coating an electrical component (200) with an electrically conductive coating (100) according to any one of claims 1 to 7, preferably in a roll-to-roll process, comprising the following steps: a) Providing an electrical component (200) with at least one cell having at least one structured layer system (201), comprising a front electrode (202), a back electrode (203), and at least one photoactive layer (204) arranged between the front electrode (202) and the back electrode (203), wherein the back electrode (203) is interrupted by at least one trench (205); b) Applying at least one precursor, matrix material and / or dopant simultaneously or as a mixture by means of a deposition process or a pressure process at least to the back electrode (203) and into the at least one trench (205) of the back electrode (203), such that at least the back electrode (203) is completely covered; and c) Maintaining the coating (100).

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